The invention provides a preparation process for a high-
silicon super-hard PVD
coating. The preparation process comprises the following steps: I, pre-
processing a workpiece surface; II, clamping and loading a workpiece; III, performing vacuum-pumping on a furnace chamber; IV, heating the workpiece; V,
etching and cleaning a target material and the workpiece; VI, preparing a high-
silicon coating; VII, cooling the workpiece. The preparation process is used for obtaining the high-
silicon super-hard PVD
coating by controlling vacuum degree of a film-coating furnace chamber, bias
voltage of a base body, a flow rate of
nitrogen gas, target current and the like, wherein the flow rate of the reaction gas
nitrogen gas (N2) ranges from 130 sccm to 210 sccm, the bias
voltage of the base body ranges from 40 V to 120 V, and the vacuum degree of the furnace chamber ranges from 0.005 mbar to 0.060 mbar. By changing the element components of the coating, high silicon element content is obtained, so that the coating has characteristics of relatively high strength,
hardness,
wear resistance, high-temperature stability and
corrosion resistance. A coating tool prepared by the process can be used for
cutting a material with
hardness of HRC65, and has relatively good using performances in comparison with a conventional coating.