27153 results about "Water vapor" patented technology

An imaging system for a vehicle includes a camera module positionable at the vehicle and a control. The camera module includes a plastic housing that houses an image sensor, which is operable to capture images of a scene occurring exteriorly of the vehicle. The control is operable to process images captured by the image sensor. The portions of the housing may be laser welded or sonic welded together to substantially seal the image sensor and associated components within the plastic housing. The housing may include a ventilation portion that is at least partially permeable to water vapor to allow water vapor to pass therethrough while substantially precluding passage of water droplets and / or other contaminants. The housing may be movable at the vehicle between a stored position and an operational position, where the image sensor may be directed toward the exterior scene.

Embodiments of the invention provide methods for depositing dielectric materials on substrates during vapor deposition processes, such as atomic layer deposition (ALD). In one example, a method includes sequentially exposing a substrate to a hafnium precursor and an oxidizing gas to deposit a hafnium oxide material thereon. In another example, a hafnium silicate material is deposited by sequentially exposing a substrate to the oxidizing gas and a process gas containing a hafnium precursor and a silicon precursor. The oxidizing gas usually contains water vapor formed by flowing a hydrogen source gas and an oxygen source gas through a water vapor generator. In another example, a method includes sequentially exposing a substrate to the oxidizing gas and at least one precursor to deposit hafnium oxide, zirconium oxide, lanthanum oxide, tantalum oxide, titanium oxide, aluminum oxide, silicon oxide, aluminates thereof, silicates thereof, derivatives thereof or combinations thereof.

The invention provides a plastic ampoule filled with medicinal liquid, which has the functions of blocking gas, water vapor and light and preventing drug penetration, absorption and adsorption, and a preparation method thereof. The plastic ampoule 10 for filling medicinal solution of the present invention comprises a container main body 11, a fused portion 13 closing its opening 12 and a holding portion 14 connected thereto for twisting. The ampoule 10 is formed using a parison having two or more layers, at least one of which is a material selected from the group consisting of gas transmission, water vapor transmission, light transmission, drug transmission and A functional layer that prevents at least one of drug absorption and adsorption properties. That is, the parison is extruded from a multi-layer blow mold, clamped by the lower parting die to form the main body part 11 of the container, and after filling the liquid medicine 15 therein, the opening part 12 is clamped by the upper parting die to form a fusion joint. Part 13 and holding part 14, thereby making the product of the present invention.

An imaging system for a vehicle includes a camera module positionable at the vehicle and a control. The camera module includes a plastic housing that houses an image sensor, which is operable to capture images of a scene occurring exteriorly of the vehicle. The control is operable to process images captured by the image sensor. The portions of the housing may be laser welded or sonic welded together to substantially seal the image sensor and associated components within the plastic housing. The housing may include a ventilation portion that is at least partially permeable to water vapor to allow water vapor to pass therethrough while substantially precluding passage of water droplets and / or other contaminants. The housing may be movable at the vehicle between a stored position and an operational position, where the image sensor may be directed toward the exterior scene.

Embodiments of the invention provide apparatuses and methods for depositing materials on substrates during vapor deposition processes, such as atomic layer deposition (ALD). In one embodiment, a chamber contains a substrate support with a receiving surface and a chamber lid containing an expanding channel formed within a thermally insulating material. The chamber further includes at least one conduit coupled to a gas inlet within the expanding channel and positioned to provide a gas flow through the expanding channel in a circular direction, such as a vortex, a helix, a spiral or derivatives thereof. The expanding channel may be formed directly within the chamber lid or formed within a funnel liner attached thereon. The chamber may contain a retaining ring, an upper process liner, a lower process liner or a slip valve liner. Liners usually have a polished surface finish and contain a thermally insulating material such as fused quartz or ceramic. In an alternative embodiment, a deposition system contains a catalytic water vapor generator connected to an ALD chamber.

Metal films are deposited with uniform thickness and excellent step coverage. Copper metal films were deposited on heated substrates by the reaction of alternating doses of copper(I) NN′-diisopropylacetamidinate vapor and hydrogen gas. Cobalt metal films were deposited on heated substrates by the reaction of alternating doses of cobalt(II) bis(N,N′-diisopropylacetamidinate) vapor and hydrogen gas. Nitrides and oxides of these metals can be formed by replacing the hydrogen with ammonia or water vapor, respectively. The films have very uniform thickness and excellent step coverage in narrow holes. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices.

Embodiments of the invention provide methods for forming a material on a substrate which includes exposing a plurality of substrates within a batch process chamber to a first oxidizing gas during a pretreatment process, exposing the substrates sequentially to a precursor and a second oxidizing gas during an ALD cycle and repeating the ALD cycle to form a material on the substrates. In a preferred example, a hafnium precursor is used during the ALD process to form a hafnium-containing material, such as hafnium oxide. In one example, the first and second oxidizing gases are the same oxidizing gases. In a preferred example, the first and second oxidizing gases are different oxidizing gases, such that the pretreatment process contains ozone and the ALD process contains water vapor.

Embodiments of the invention provide methods for forming a material on a substrate which includes exposing a plurality of substrates within a batch process chamber to a first oxidizing gas during a pretreatment process, exposing the substrates sequentially to a precursor and a second oxidizing gas during an ALD cycle and repeating the ALD cycle to form a material on the substrates. In a preferred example, a hafnium precursor is used during the ALD process to form a hafnium-containing material, such as hafnium oxide. In one example, the first and second oxidizing gases are the same oxidizing gases. In a preferred example, the first and second oxidizing gases are different oxidizing gases, such that the pretreatment process contains ozone and the ALD process contains water vapor.

A multilayered material is provided which includes a substrate and a silicon-containing film formed on the substrate, wherein the silicon-containing film has a nitrogen-rich area including silicon atoms and nitrogen atoms, or silicon atoms, nitrogen atoms, and an oxygen atoms and the nitrogen-rich area is formed by irradiating a polysilazane film formed on the substrate with an energy beam in an atmosphere not substantially including oxygen or water vapor and denaturing at least a part of the polysilazane film. A method of producing the multilayered material is also provided.

A respiratory apparatus for delivering breathable gas to a patient includes a flow generator that generates a supply of pressurised gas to be delivered to the patient; a humidifier for vaporising water and delivering water vapor to humidify the gas; a gas flow path leading from the flow generator to the humidifier and from the humidifier to a patient interface; and a heater in thermal contact with the gas and / or the water, wherein the heater comprises an elongate heating filament in the form of a tape. A humidifier for respiratory apparatus includes a first respiratory gas passage for receiving gas from a flow generator, a humidifier chamber, a second respiratory gas passage for delivering humidified gas to a patient interface, and a heater in thermal contact with the gas and / or the water, wherein the heater comprises an elongate heating filament extending along at least part of both said first and second respiratory gas passages. A conduit for use in a respiratory apparatus for delivering breathable gas to a patient includes a tube; a helical rib on an outer surface of the tube; and a plurality of wires supported by the helical rib in contact with the outer surface of the tube.

A PAP system for delivering breathable gas to a patient includes a flow generator to generate a supply of breathable gas to be delivered to the patient; a humidifier including a heating plate to vaporize water and deliver water vapor to humidify the supply of breathable gas; a heated tube configured to heat and deliver the humidified supply of breathable gas to the patient; a power supply configured to supply power to the heating plate and the heated tube; and a controller configured to control the power supply to prevent overheating of the heating plate and the heated tube.

A PAP system for delivering breathable gas to a patient includes a flow generator to generate a supply of breathable gas to be delivered to the patient; a humidifier including a heating plate to vaporize water and deliver water vapor to humidify the supply of breathable gas; a heated tube configured to heat and deliver the humidified supply of breathable gas to the patient; a power supply configured to supply power to the heating plate and the heated tube; and a controller configured to control the power supply to prevent overheating of the heating plate and the heated tube.

The present invention provides a method and system for efficiently producing hydrogen that can be supplied to a fuel cell. The method and system of the present invention produces hydrogen in a reforming reactor using a hydrocarbon stream and water vapor stream as reactants. The hydrogen produced is purified in a hydrogen separating membrane to form a retentate stream and purified hydrogen stream. The purified hydrogen can then be fed to a fuel cell where electrical energy is produced and a fuel cell exhaust stream containing water vapor and oxygen depleted air is emitted. In one embodiment of the present invention, a means and method is provided for recycling a portion of the retentate stream to the reforming reactor for increased hydrogen yields. In another embodiment, a combustor is provided for combusting a second portion of the retentate stream to provide heat to the reforming reaction or other reactants. In a preferred embodiment, the combustion is carried out in the presence of at least a portion of the oxygen depleted air stream from the fuel cell. Thus, the system and method of the present invention advantageously uses products generated from the system to enhance the overall efficiency of the system.

A method of etching exposed silicon oxide on patterned heterogeneous structures is described and includes a remote plasma etch formed from a fluorine-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents combine with water vapor. The chemical reaction resulting from the combination produces reactants which etch the patterned heterogeneous structures to produce, in embodiments, a thin residual structure exhibiting little deformation. The methods may be used to conformally trim silicon oxide while removing little or no silicon, polysilicon, silicon nitride, titanium or titanium nitride. In an exemplary embodiment, the etch processes described herein have been found to remove mold oxide around a thin cylindrical conducting structure without causing the cylindrical structure to significantly deform.

Metal films are deposited with uniform thickness and excellent step coverage. Copper metal films were deposited on heated substrates by the reaction of alternating doses of copper(I) NN′-diispropylacetamidinate vapor and hydrogen gas. Cobalt metal films were deposited on heated substrates b the reaction of alternating doses of cobalt(II) bis(N,N′-diispropylacetamidinate) vapor and hydrogen gas. Nitrides and oxides of these metals can be formed by replacing the hydrogen with ammonia or water vapor, respectively. The films have very uniform thickness and excellent step coverage in narrow holes. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices.

The present invention provides a method and apparatus for sterilizing articles using an ozone-containing gas, where condensation of water from the sterilization atmosphere during the sterilization process is substantially prevented. The inventive sterilization method includes providing a sterilization chamber and placing an article into the sterilization chamber. The sterilization chamber is sealed prior to equalizing the temperature of the article and the atmosphere in the sterilization chamber. A vacuum is applied to achieve a preselected vacuum pressure in the sterilization chamber. Once the vacuum pressure is set, water vapour is supplied to the sterilization chamber. Ozone-containing gas is then supplied to the sterilization chamber and the sterilization chamber remains sealed for a preselected treatment period, where the sterilization chamber remains sealed throughout the whole process. Finally, vacuum in the sterilization chamber is released.

Biodegradable polymer blends suitable for laminate coatings, wraps and other packaging materials manufactured from at least one "hard" biopolymer and at least one "soft" biopolymer. "Hard" biopolymers tend to be more brittle and rigid and typically have a glass transition temperature greater than about 10° C. "Soft" biopolymers tend to be more flexible and pliable and typically have a glass transition temperature less than about 0° C. While hard and soft polymers each possess certain intrinsic benefits, certain blends of hard and soft polymers have been discovered which possess synergistic properties superior to those of either hard or soft polymers by themselves. Biodegradable polymers include polyesters, polyesteramides and thermoplastically processable starch. The polymer blends may optionally include an inorganic filler. Films and sheets made from the polymer blends may be textured so as to increase the bulk hand feel. Wraps will typically be manufactured so as to have good "dead-fold" properties so as to remain in a wrapped position and not spring back to an "unwrapped" and planar form. Laminate films will typically have good water vapor barrier properties as measured by the their Water Vapor Permeability Coefficient (WVPC).

A plasma etch process for etching a porous carbon-doped silicon oxide dielectric layer using a photoresist mask is carried out first in an etch reactor by performing a fluorocarbon based etch process on the workpiece to etch exposed portions of the dielectric layer while depositing protective fluorocarbon polymer on the photoresist mask. Then, in an ashing reactor, polymer and photoresist are removed by heating the workpiece to over 100 degrees C., exposing a peripheral portion of the backside of said workpiece, and providing products from a plasma of a hydrogen process gas to reduce carbon contained in polymer and photoresist on said workpiece until the polymer has been removed from a backside of said workpiece. The process gas preferably contains both hydrogen gas and water vapor, although the primary constituent is hydrogen gas. The wafer (workpiece) backside may be exposed by extending the wafer lift pins.

A method for depositing a dielectric film on a substrate includes positioning a plurality of substrates in a process chamber, heating the process chamber to a deposition temperature between 400° C. and less than 650° C., flowing a first process gas comprising water vapor into the process chamber, flowing a second process gas comprising dichlorosilane (DCS) into the process chamber, establishing a gas pressure of less than 2 Torr, and reacting the first and second process gases to thermally deposit a silicon oxide film on the plurality of substrates. One embodiment further includes flowing a third process gas comprising nitric oxide (NO) gas into the process chamber while flowing the first process gas and the second process gas; and reacting the oxide film with the third process gas to form a silicon oxynitride film on the substrate.

An oxygen-free hydrogen plasma ashing process particularly useful for low-k dielectric materials based on hydrogenated silicon oxycarbide materials. The main ashing step includes exposing a previously etched dielectric layer to a plasma of hydrogen and optional nitrogen, a larger amount of water vapor, and a yet larger amount of argon or helium. Especially for porous low-k dielectrics, the main ashing plasma additionally contains a hydrocarbon gas such as methane. The main ashing may be preceded by a short surface treatment by a plasma of a hydrogen-containing reducing gas such as hydrogen and optional nitrogen.

An instrument and method for applying thermal energy to targeted tissue. An instrument and method for tissue thermotherapy. In one embodiment, a method includes providing a vapor source comprising a pump configured for providing a flow of liquid media from a liquid media source into a vaporization chamber having a heating mechanism, actuating the pump to provide the liquid into the vaporization chamber, applying energy from the heating mechanism to convert a substantially water liquid media into a minimum water vapor level for causing an intended effect in tissue. For examples such levels can comprise at least 60% water vapor, at least 70% water vapor, at least 80% water vapor or at least 90% water vapor for causing an intended effect in tissue.

A method of etching exposed silicon oxide on patterned heterogeneous structures is described and includes a gas phase etch created from a remote plasma etch. The remote plasma excites a fluorine-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents combine with water vapor. Reactants thereby produced etch the patterned heterogeneous structures to remove two separate regions of differing silicon oxide at different etch rates. The methods may be used to remove low density silicon oxide while removing less high density silicon oxide.

A method of etching exposed silicon oxide on patterned heterogeneous structures is described and includes a remote plasma etch formed from a fluorine-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents combine with water vapor. The chemical reaction resulting from the combination produces reactants which etch the patterned heterogeneous structures to produce, in embodiments, a thin residual structure exhibiting little deformation. The methods may be used to conformally trim silicon oxide while removing little or no silicon, polysilicon, silicon nitride, titanium or titanium nitride. In an exemplary embodiment, the etch processes described herein have been found to remove mold oxide around a thin cylindrical conducting structure without causing the cylindrical structure to significantly deform.

A method of etching exposed silicon oxide on patterned heterogeneous structures is described and includes a gas phase etch created from a remote plasma etch. The remote plasma excites a fluorine-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents combine with water vapor. Reactants thereby produced etch the patterned heterogeneous structures to remove two separate regions of differing silicon oxide at different etch rates. The methods may be used to remove low density silicon oxide while removing less high density silicon oxide.

The invention relates to a coated article having enhanced reversible thermal properties. The coated article comprises a substrate having a surface and a coating covering a portion of the surface and comprising a polymeric material and a temperature regulating material dispersed in the polymeric material. The coating is formed with a plurality of regions of discontinuity that are separated from one another and expose a remaining portion of the surface to provide improved flexibility, softness, air permeability, or water vapor transport properties. The coated article may be used in apparel, footwear, medical products, containers and packagings, building materials, appliances, and other products.

A process to produce terephthalic acid is provided, the process including the steps of: providing a feed stream comprising a dialkyl substituted aromatic and in an organic acid solvent: contacting the feed stream with an oxidant, the oxidant containing at least 50% by volume oxygen and at an oxygen partial pressure of at least 1 psia, at a temperature between about 80 DEG C. and about 130 DEG C., in the presence of a catalyst system comprising zirconium and cobalt, wherein the contacting is done in a stirred tank reactor; removing from the stirred tank reactor a vapor stream comprising the organic acid, water vapor and unreacted oxidant; condensing at least a portion of the organic acid and water from the vapor stream; separating at least a portion of the water from the organic acid back to the stirred tank reactor; returning at least a portion of the condensed organic acid back to the stirred tank reactor; continuously recovering from the stirred tank reactor a product comprising a diacid substituted aromatic; isolating solid crystals of diacid substituted aromatic from the reactor product; and recovering from the solid crystals a diacid substituted aromatic having a purity of preferably at least 97% by weight.

Humidifier apparatus for a respiratory apparatus includes a housing providing a gas flow path, a heater apparatus, and a water supply distribution member configured and arranged to deliver water vapour to the gas flow path. The water distribution member is provided to the housing and in thermal communication with the heater apparatus.