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11912 results about "Low density" patented technology

Data processing apparatus and method

A data processing apparatus communicates data bits on a predetermined number of sub-carrier signals of an Orthogonal Frequency Division Multiplexed (OFDM) symbol. The data processing apparatus comprises a parity interleaver operable to perform parity interleaving on Low Density Parity Check (LDPC) encoded data bits obtained by performing LDPC encoding according to a parity check matrix of an LDPC code including a parity matrix corresponding to parity bits of the LDPC code, the parity matrix having a stepwise structure, so that a parity bit of the LDPC encoded data bits is interleaved to a different parity bit position. A mapping unit maps the parity interleaved bits onto data symbols corresponding to modulation symbols of a modulation scheme of the OFDM sub-carrier signals. A symbol interleaver is arranged in operation to read-into a symbol interleaver memory the predetermined number of data symbols for mapping onto the OFDM sub-carrier signals, and to read-out of the interleaver memory the data symbols for the OFDM sub-carriers to effect the mapping, the read-out being in a different order than the read-in, the order being determined from a set of addresses, with the effect that the data symbols are interleaved on the sub-carrier signals. The set of addresses are generated by an address generator which has been optimised to interleave the data symbols on to the sub-carrier signals of the OFDM carrier signals for a given operating mode of the OFDM system, such as a 32K operating mode for DVB-T2 or DVB-C2.
Owner:SATURN LICENSING LLC

Differential silicon oxide etch

A method of etching exposed silicon oxide on patterned heterogeneous structures is described and includes a gas phase etch created from a remote plasma etch. The remote plasma excites a fluorine-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents combine with water vapor. Reactants thereby produced etch the patterned heterogeneous structures to remove two separate regions of differing silicon oxide at different etch rates. The methods may be used to remove low density silicon oxide while removing less high density silicon oxide.
Owner:APPLIED MATERIALS INC

Adaptive error correction codes for data storage systems

ActiveUS20140115427A1Error detection/correctionUnequal/adaptive error protectionConcatenated error correction codeData encoding
A data storage system configured to adaptively code data is disclosed. In one embodiment, a data storage system controller determines a common memory page size, such as an E-page size, for a non-volatile memory array. Based on the common memory page size, the controller selects a low-density parity-check (LDPC) code word length from a plurality of pre-defined LDPC code word lengths. The controller determines LDPC coding parameters for coding data written to or read from the memory array based on the selected LDPC code word length. By using the plurality of pre-defined LDPC code word lengths, the data storage system can support multiple non-volatile memory page formats, including memory page formats in which the common memory page size does not equal any LDPC code word length of the plurality of pre-defined LDPC code word lengths. Flexibility and efficiency of data coding can thereby be achieved.
Owner:WESTERN DIGITAL TECH INC
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