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130 results about "Charged species" patented technology
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Charged species. A chemical entity in which the overall total of electrons is unequal to the overall total of protons.
Method for reducing dielectric constant of film using direct plasma of hydrogen
ActiveUS8551892B2Low dielectric constantMaintain mechanical strengthElectric shock equipmentsSemiconductor/solid-state device detailsDielectricCapacitance
A method for reducing a dielectric constant of a film includes (i) forming a dielectric film on a substrate; (ii) treating a surface of the film without film formation, and (III) curing the film. Step (i) includes providing a dielectric film containing a porous matrix and a porogen on a substrate, step (ii) includes, prior to or subsequent to step (iii), treating the dielectric film with charged species of hydrogen generated by capacitively-coupled plasma without film deposition to reduce a dielectric constant of the dielectric film, and step (iii) includes UV-curing the dielectric film to remove at least partially the porogen from the film.
Owner:ASM JAPAN
Organic devices, organic electroluminescent devices and organic solar cells
ActiveUS20060008740A1Reduce harmLower barrier heightElectric discharge tubesElectroluminescent light sourcesOrganic solar cellSimple Organic Compounds
An organic device, including an organic compound having charge-transporting ability (i.e., transporting holes and / or electrons) and / or including organic light emissive molecules capable of emitting at least one of fluorescent light or phosphorescent light, has a charge transfer complex-contained layer including a charge transfer complex formed upon contact of an organic hole-transporting compound and molybdenum trioxide via a manner of lamination or mixing thereof, so that the organic hole-transporting compound is in a state of radical cation (i.e., positively charged species) in the charge transfer complex-contained layer.
Owner:MITSUBISHI HEAVY IND LTD +1
Nf3/h2 remote plasma process with high etch selectivity of psg/bpsg over thermal oxide and low density surface defects
InactiveUS20100099263A1Fast etchElectric discharge tubesSemiconductor/solid-state device manufacturingHydrogenRemote plasma
A method and apparatus for selectively etching doped semiconductor oxides faster than undoped oxides. The method comprises applying dissociative energy to a mixture of nitrogen trifluoride and hydrogen gas remotely, flowing the activated gas toward a processing chamber to allow time for charged species to be extinguished, and applying the activated gas to the substrate. Reducing the ratio of hydrogen to nitrogen trifluoride increases etch selectivity. A similar process may be used to smooth surface defects in a silicon surface.
Owner:APPLIED MATERIALS INC
Dry-etch for silicon-and-carbon-containing films
InactiveUS20130034968A1Reduces and substantially eliminates numberMaterial removalSemiconductor/solid-state device manufacturingRemote plasmaSilicon oxide
A method of etching exposed silicon-and-carbon-containing material on patterned heterogeneous structures is described and includes a remote plasma etch formed from a fluorine-containing precursor and an oxygen-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents react with the exposed regions of silicon-and-carbon-containing material. The plasmas effluents react with the patterned heterogeneous structures to selectively remove silicon-and-carbon-containing material from the exposed silicon-and-carbon-containing material regions while very slowly removing other exposed materials. The silicon-and-carbon-containing material selectivity results partly from the presence of an ion suppression element positioned between the remote plasma and the substrate processing region. The ion suppression element reduces or substantially eliminates the number of ionically-charged species that reach the substrate. The methods may be used to selectively remove silicon-and-carbon-containing material at more than twenty times the rate of silicon oxide.
Owner:APPLIED MATERIALS INC
Method and Apparatus Using Electric Field for Improved Biological Assays
ActiveUS20090032401A1Avoid corrosionIncrease electric fieldElectrostatic separatorsSludge treatmentPresent methodEngineering
Disclosed are a method and apparatus that use an electric field for improved biological assays. The electric field is applied across a device having wells, which receive reactants, which carry a charge. The device thus uses a controllable voltage source between the first and second electrodes, which is controllable to provide a positive charge and a negative charge to a given electrode. By controlled use of the electric field charged species in a fluid in a fluid channel are directed into or out of the well by an electric field between the electrodes. The present method involves the transport of fluids, as in a microfluidic device, and the electric field-induced movement of reactive species according to various assay procedures, such as DNA sequencing, synthesis or the like.
Owner:THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIV
Dry-etch selectivity
InactiveUS20140141621A1Reduce the numberElectric discharge tubesSemiconductor/solid-state device manufacturingRemote plasmaProcess region
A method of etching exposed patterned heterogeneous structures is described and includes a remote plasma etch formed from a reactive precursor. The plasma power is pulsed rather than left on continuously. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents selectively remove one material faster than another. The etch selectivity results from the pulsing of the plasma power to the remote plasma region, which has been found to suppress the number of ionically-charged species that reach the substrate. The etch selectivity may also result from the presence of an ion suppression element positioned between a portion of the remote plasma and the substrate processing region.
Owner:APPLIED MATERIALS INC
Silicon-carbon-nitride selective etch
ActiveUS20140080310A1Faster rateElectric discharge tubesSemiconductor/solid-state device manufacturingRemote plasmaRegioselectivity
A method of etching exposed silicon-nitrogen-and-carbon-containing material on patterned heterogeneous structures is described and includes a remote plasma etch formed from a fluorine-containing precursor and an oxygen-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents react with the exposed regions of silicon-nitrogen-and-carbon-containing material. The plasma effluents react with the patterned heterogeneous structures to selectively remove silicon-nitrogen-and-carbon-containing material from the exposed silicon-nitrogen-and-carbon-containing material regions while very slowly removing selected other exposed materials. The silicon-nitrogen-and-carbon-containing material selectivity results partly from the presence of an ion suppression element positioned between the remote plasma and the substrate processing region. The ion suppression element controls the number of ionically-charged species that reach the substrate. The methods may be used to selectively remove silicon-nitrogen-and-carbon-containing material at a faster rate than exposed silicon oxide or exposed silicon nitride.
Owner:APPLIED MATERIALS INC
Dry-etch for selective oxidation removal
ActiveUS9064816B2Reduces and substantially eliminates numberMaterial removalElectric discharge tubesDecorative surface effectsSurface reactionRemote plasma
Methods of selectively etching tungsten oxide relative to tungsten, silicon oxide, silicon nitride and / or titanium nitride are described. The methods include a remote plasma etch formed from a fluorine-containing precursor and / or hydrogen (H2). Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents react with the tungsten oxide. The plasmas effluents react with exposed surfaces and selectively remove tungsten oxide while very slowly removing other exposed materials. In some embodiments, the tungsten oxide selectivity results partly from the presence of an ion suppression element positioned between the remote plasma and the substrate processing region. The ion suppression element reduces or substantially eliminates the number of ionically-charged species that reach the substrate.
Owner:APPLIED MATERIALS INC
Dry-etch for silicon-and-carbon-containing films
InactiveUS8771536B2Reduces and substantially eliminates numberMaterial removalDecorative surface effectsSemiconductor/solid-state device manufacturingRemote plasmaRegioselectivity
A method of etching exposed silicon-and-carbon-containing material on patterned heterogeneous structures is described and includes a remote plasma etch formed from a fluorine-containing precursor and an oxygen-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents react with the exposed regions of silicon-and-carbon-containing material. The plasmas effluents react with the patterned heterogeneous structures to selectively remove silicon-and-carbon-containing material from the exposed silicon-and-carbon-containing material regions while very slowly removing other exposed materials. The silicon-and-carbon-containing material selectivity results partly from the presence of an ion suppression element positioned between the remote plasma and the substrate processing region. The ion suppression element reduces or substantially eliminates the number of ionically-charged species that reach the substrate. The methods may be used to selectively remove silicon-and-carbon-containing material at more than twenty times the rate of silicon oxide.
Owner:APPLIED MATERIALS INC
Dry-etch selectivity
Owner:APPLIED MATERIALS INC
Replaceable flow-through capacitors for removing charged species from liquids
InactiveUS6462935B1Material nanotechnologyWater treatment parameter controlCapacitanceCapacitive deionization
A free-standing flow-through capacitor (FTC) is constructed by concentrically winding two electrodes and two dividers into a hollow-center roll. A liquid-feeding pipe is inserted to the central opening for delivering fluids to the FTC. Nanoparticles of hydrated iron compound with Fe3O4 as the main component or its composite powders are used as the active materials for the electrodes. With channels crated by the dividers assembled in the roll, fluids injected from the feed pipe are confined inside the FTC, and flow outwardly and transversely through the entire length of the electrodes. Under an application of a low DC voltage to the electrodes, charged species are adsorbed and removed from the treated liquids as soon as they are in contact with the electrodes. Capacitive deionization using FTC of the present invention is applicable to waste-streams reduction, water purification and desalination at low costs and easy operation.
Owner:SHIUE LIH REN
Silicon-carbon-nitride selective etch
ActiveUS9390937B2Faster rateElectric discharge tubesSemiconductor/solid-state device manufacturingRemote plasmaCarbon nitride
A method of etching exposed silicon-nitrogen-and-carbon-containing material on patterned heterogeneous structures is described and includes a remote plasma etch formed from a fluorine-containing precursor and an oxygen-containing precursor. Plasma effluents from the remote plasma are flowed into a substrate processing region where the plasma effluents react with the exposed regions of silicon-nitrogen-and-carbon-containing material. The plasma effluents react with the patterned heterogeneous structures to selectively remove silicon-nitrogen-and-carbon-containing material from the exposed silicon-nitrogen-and-carbon-containing material regions while very slowly removing selected other exposed materials. The silicon-nitrogen-and-carbon-containing material selectivity results partly from the presence of an ion suppression element positioned between the remote plasma and the substrate processing region. The ion suppression element controls the number of ionically-charged species that reach the substrate. The methods may be used to selectively remove silicon-nitrogen-and-carbon-containing material at a faster rate than exposed silicon oxide or exposed silicon nitride.
Owner:APPLIED MATERIALS INC
Memory device with active passive layers
InactiveUS6838720B2Improve read and write speedLong-term data retentionTransistorNanoinformaticsActive layerElectron mobility
A memory including memory cells having active and passive layers may store multiple information bits. The active layer may include an organic polymer that has a variable resistance based on the movement of charged species (ions or ions and electrons) between the passive layer and the active layer. The passive layer may be a super-ionic material that has high ion and electron mobility. The active layer may be self-assembled from a monomer in a liquid or gas.
Owner:SPANSION LLC
Charged droplet sprayers
ActiveUS20050258360A1Improve performanceOptimize charged droplet spray performanceMembranesSemi-permeable membranesSprayerElectric field
Charged droplet spray is formed from a solution with all or a portion of the charged droplet spray current generated from reduction or oxidation (redox) reactions occurring on surfaces removed from the first or sample solution flow path. In one embodiment of the invention, two solution flow channels are separated by a semipermeable membrane. A first or sample solution flowing through the first solution flow channel exchanges cation or anion charged species through the semipermeable membrane with a second solution or gas flowing through the second flow channel. Charge exchange is driven by the electric field applied at the charged droplet sprayer sample solution outlet. Redox reactions occur at an electrode surface in contact with the second solution. The invention increases the control and range of the Electrospray ionization process during ES / MS operation. Alternative embodiments of the invention provide for conducting redox reactions on conductive surfaces removed from the first or sample solution flow path but not separated by semipermeable membranes.
Owner:PERKINELMER U S LLC
Method and apparatus using electric field for improved biological assays
ActiveUS8277628B2Quality improvementEfficient removalElectrostatic separatorsSludge treatmentPresent methodEngineering
Disclosed are a method and apparatus that use an electric field for improved biological assays. The electric field is applied across a device having wells, which receive reactants, which carry a charge. The device thus uses a controllable voltage source between the first and second electrodes, which is controllable to provide a positive charge and a negative charge to a given electrode. By controlled use of the electric field charged species in a fluid in a fluid channel are directed into or out of the well by an electric field between the electrodes. The present method involves the transport of fluids, as in a microfluidic device, and the electric field-induced movement of reactive species according to various assay procedures, such as DNA sequencing, synthesis or the like.
Owner:THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIV
Method and apparatus for improving nitrogen profile during plasma nitridation
InactiveUS20070049048A1Electric discharge tubesSemiconductor/solid-state device manufacturingNitrogenManufactured apparatus
A semiconductor manufacturing apparatus and process for forming a nitrided dielectric film includes generating a plasma source (44) over a wafer structure (46), where the plasma source (44) includes neutral species (such as nitrogen atoms) and charged species (such as nitrogen ions) that are formed in an inductively coupled plasma reactor. Before the charged species in the plasma (44) can penetrate the wafer structure (46), an electrically connected mesh structure (45, 47) between the plasma source (44) and wafer structure (46) blocks the charged species. In addition or in the alternative, a magnetic field (69) aligned in parallel with the surface of the wafer structure (66) is established in close proximity to the wafer structure (66) in order to trap the charged species. By removing charged species, an improved, narrower nitrogen concentration profile is obtained.
Owner:FREESCALE SEMICON INC
Graphene-coated diamond particles, compositions and intermediate structures comprising same, and methods of forming graphene-coated diamond particles and polycrystalline compacts
InactiveUS20120102843A1Pigmenting treatmentLiquid surface applicatorsCvd grapheneIntermediate structure
Coated diamond particles have solid diamond cores and at least one graphene layer. Methods of forming coated diamond particles include coating diamond particles with a charged species and coating the diamond particles with a graphene layer. A composition includes a substance and a plurality of coated diamond particles dispersed within the substance. An intermediate structure includes a hard polycrystalline material comprising a first plurality of diamond particles and a second plurality of diamond particles. The first plurality of diamond particles and the second plurality of diamond particles are interspersed. A method of forming a polycrystalline compact includes catalyzing the fox of inter-granular bonds between adjacent particles of a plurality of diamond particles having at least one graphene layer.
Owner:BAKER HUGHES INC
Organic devices, organic electroluminescent devices and organic solar cells
ActiveUS8101857B2Lower barrier heightSolid-state devicesSemiconductor/solid-state device manufacturingOrganic devicesOrganic solar cell
An organic device, including an organic compound having charge-transporting ability (i.e., transporting holes and / or electrons) and / or including organic light emissive molecules capable of emitting at least one of fluorescent light or phosphorescent light, has a charge transfer complex-contained layer including a charge transfer complex formed upon contact of an organic hole-transporting compound and molybdenum trioxide via a manner of lamination or mixing thereof, so that the organic hole-transporting compound is in a state of radical cation (i.e., positively charged species) in the charge transfer complex-contained layer.
Owner:MITSUBISHI HEAVY IND LTD +1
Atmospheric pressure ion source performance enhancement
InactiveUS20090095899A1Increases Electrospray MS signalReduce signalingParticle spectrometer methodsIsotope separationPerformance enhancementGas phase
Electrospray ionization sources interfaced to mass spectrometers have become widely used tools in analytical applications. Processes occurring in Electrospray (ES) ionization generally include the addition or removal of a charged species such as H+ or other cation to effect ionization of a sample species. Electrospray includes ionization processes that occur in the liquid and gas phase and in both phases ionization processes require a source or sink for such charged species. Electrolyte species, that aid in oxidation or reduction reactions occurring in Electrospray ionization, are added to sample solutions in many analytical applications to increase the ion signal amplitude generated in Electrospray and detected by a mass spectrometer (MS) Electrolyte species that may be required to enhance an upstream sample preparation or separation process may be less compatible with the downstream ES processes and cause reduction in MS signal New Electrolytes have been found that increase positive and negative polarity analyte ion signal measured in ESMS analysis when compared with analyte ESMS signal achieved using more conventional electrolytes The new electrolyte species increase ES MS signal when added directly to a sample solution or when added to a second solution flow in an Electrospray membrane probe. It has also been found that running the ES membrane probe with specific Electrolytes in the second solution of the ES membrane probe have been found to enhance ESMS signal compared to using the same electrolytes directly in the sample solution being Electrosprayed The new electrolytes can be added to a reagent ion source configured in a combination Atmospheric pressure ion source to improve ionization efficiency.
Owner:WHITEHOUSE CRAIG M +2
Magnetic confinement of a plasma
InactiveUS8092605B2Liquid surface applicatorsElectric discharge tubesPlasma confinementProcess conditions
Owner:APPLIED MATERIALS INC
Emulsion compositions
The present invention relates to particle stabilizing compositions suitable for use in fabric care products, home care products, diapers, incontinence articles, feminine care products, pharmaceuticals, oral care products, antiperspirants, deodorants, personal cleansing products, skin care products and hair care products comprising: a) an emulsion comprising from about 1% to about 99% by weight of the emulsion of an internal phase and from about 1% to about 99% by weight of the emulsion of an external phase; b) a charged species that is present in the emulsion; and c) charged insoluble solid particles which are dispersed in the emulsion wherein the charged species possesses a charge which is opposed to that of the charged insoluble solid particles and wherein essentially all of the charged species and charged insoluble solid particles accumulate at the interface of the emulsion and wherein Brownian motion is not exhibited by the charged insoluble solid particles.
Owner:THE PROCTER & GAMBLE COMPANY
Charged droplet sprayers
ActiveUS7232992B2Improve performanceMinimize and eliminate occurrenceMembranesSemi-permeable membranesESI mass spectrometrySprayer
Charged droplet spray is formed from a solution with all or a portion of the charged droplet spray current generated from reduction or oxidation (redox) reactions occurring on surfaces removed from the first or sample solution flow path. In one embodiment of the invention, two solution flow channels are separated by a semipermeable membrane. A first or sample solution flowing through the first solution flow channel exchanges cation or anion charged species through the semipermeable membrane with a second solution or gas flowing through the second flow channel. Charge exchange is driven by the electric field applied at the charged droplet sprayer sample solution outlet. Redox reactions occur at an electrode surface in contact with the second solution. The invention increases the control and range of the Electrospray ionization process during ES / MS operation. Alternative embodiments of the invention provide for conducting redox reactions on conductive surfaces removed from the first or sample solution flow path but not separated by semipermeable membranes.
Owner:PERKINELMER U S LLC
Laser desorption ion source
ActiveUS7087898B2Improve efficiencyImprove ionizationTime-of-flight spectrometersSamples introduction/extractionDesorptionMass analyzer
Atmospheric pressure, intermediate pressure and vacuum laser desorption ionization methods and ion sources are configured to increase ionization efficiency and the efficiency of transmitting ions to a mass to charge analyzer or ion mobility analyzer. An electric field is applied in the region of a sample target to accumulate ions generated from a local ion source on a solid or liquid phase sample prior to applying a laser desorption pulse. The electric field is changed just prior to or during the desorption laser pulse to promote the desorption of charged species and improve the ionization efficiency of desorbed sample species. After a delay, the electric field may be further changed to optimize focusing and transmission of ions into a mass spectrometer or ion mobility analyzer. Charged species may also be added to the region of the laser desorbed sample plume to promote ion-molecule reactions between the added ions and desorbed neutral sample species, increasing desorbed sample ionization efficiency and / or creating desired product ion species. The cycling of electric field changes is repeated in a timed sequence with one or more desorption laser pulse occurring per electric field change cycle. Embodiments of the invention comprise atmospheric pressure, intermediate pressure and vacuum pressure laser desorption ionization source methods and devices for increasing the analytical flexibility and improving the sensitivity of mass spectrometric analysis.
Owner:PERKINELMER HEALTH SCIENCES INC +1
Atomic layer etching using metastables formed from an inert gas
ActiveCN103748658AElectric discharge tubesSemiconductor/solid-state device manufacturingAtomic physicsGas formation
Substrate processing systems and methods for etching an atomic layer are disclosed. The methods and systems are configured to introducing a first gas into the chamber, the gas being an etchant gas suitable for etching the layer and allowing the first gas to be present in the chamber for a period of time sufficient to cause adsorption of at least some of the first gas into the layer. The first gas is substantially replaced in the chamber with an inert gas, and metastables are then generated from the inert gas to etch the layer with the metastables while substantially preventing the plasma charged species from etching the layer.
Owner:LAM RES CORP
High rate, continuous deposition of high quality amorphous, nanocrystalline, microcrystalline or polycrystalline materials
InactiveUS20080090022A1Quality improvementSignificant rate of depositionChemical vapor deposition coatingPlasma techniqueEnergy transferHigh rate
Owner:ENERGY CONVERSION DEVICES INC
Separation Of Virus And/Or Protein From Nucleic Acids By Primary Amines
InactiveUS20120077249A1Significant and effective capacityIon-exchange process apparatusSsRNA viruses negative-senseAmine ligandsVirus
Owner:MILLIPORE CORP
Laser desorption ion source
InactiveUS7816646B1Improve efficiencyImprove ionizationSamples introduction/extractionIsotope separationMass analyzerMass spectrography
Owner:PERKINELMER HEALTH SCIENCES INC +1
Atmospheric pressure ion source performance enhancement
InactiveUS20090095900A1Increases Electrospray MS signalMaximize analyte signalParticle spectrometer methodsIsotope separationPerformance enhancementGas phase
Electrospray ionization sources interfaced to mass spectrometers have become widely used tools in analytical applications. Processes occurring in Electrospray (ES) ionization generally include the addition or removal of a charged species such as H+ or other cation to effect ionization of a sample species. Electrospray includes ionization processes that occur in the liquid and gas phase and in both phases ionization processes require a source or sink for such charged species. Electrolyte species, that aid in oxidation or reduction reactions occurring in Electrospray ionization, are added to sample solutions in many analytical applications to increase the ion signal amplitude generated in Electrospray and detected by a mass spectrometer (MS) Electrolyte species that may be required to enhance an upstream sample preparation or separation process may be less compatible with the downstream ES processes and cause reduction in MS signal. New Electrolytes have been found that increase positive and negative polarity analyte ion signal measured in ESMS analysis when compared with analyte ESMS signal achieved using more conventional electrolytes. The new electrolyte species increase ES MS signal when added directly to a sample solution or when added to a second solution flow in an Electrospray membrane probe. It has also been found that running the ES membrane probe with specific Electrolytes in the second solution of the ES membrane probe have been found to enhance ESMS signal compared to using the same electrolytes directly in the sample solution being Electrosprayed. The new electrolytes can be added to a reagent ion source configured in a combination Atmospheric pressure ion source to improve ionization efficiency.
Owner:PERKINELMER HEALTH SCIENCES INC
Nitrosated and nitrosylated phosphodiestrase inhibitor compounds, compositions and their uses
Disclosed are nitrosated and / or nitrosylated phosphodiesterase inhibitors having the formula NOn-PDE inhibitor where n is 1 or 2. The invention also provides compositions comprising such compounds in a pharmaceutically acceptable carrier. The invention also provides a composition comprising a therapeutically effective amount of an phosphodiesterase inhibitor (PDE inhibitor), which can optionally be substituted with at least one NO or NO2 moiety, and one to ten fold molar excess of a compound that donates, transfers or releases nitrogen monoxide as a charged species, i.e., nitrosonium (NO+) or nitroxyl (NO-), or as the neutral species, nitric oxide (NO.) or which stimulates endogenous EDRF production. The invention also provides compositions comprising such compounds in a pharmaceutically acceptable carrier. The invention also provides methods for treating sexual dysfunctions in males and females.
Owner:NITROMED
Nitrosated and nitrosylated compounds and compositions and their use for treating respiratory disorders
Disclosed are (i) compounds of a steroid, a β-agonist, an anticholinergic, a mast cell stabilizer and a phosphodiesterase (PDE) inhibitor directly or indirectly linked to a NO or NO2 group or a group which stimulates endogenous production of NO or EDRF in vivo; (ii) compositions of steroids, β-agonists, anticholinergics, mast cell stabilizers and PDE inhibitors, which can optionally be substituted with at least one NO or NO2 moiety or a group which stimulates endogenous production of NO or EDRF in vivo, and a compound that donates, transfers or releases nitric oxide as a charged species, i.e., nitrosonium (NO+) or nitroxyl (NO−), or as the neutral species, nitric oxide (NO.) or that stimulates endogenous production of NO or EDRF in vivo; and (iii) uses for them in preventing and / or treating respiratory disorders.
Owner:ARBOR PHARMA LLC
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