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16652 results about "Molybdenum" patented technology
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Molybdenum is a chemical element with the symbol Mo and atomic number 42. The name is from Neo-Latin molybdaenum, from Ancient Greek Μόλυβδος molybdos, meaning lead, since its ores were confused with lead ores. Molybdenum minerals have been known throughout history, but the element was discovered (in the sense of differentiating it as a new entity from the mineral salts of other metals) in 1778 by Carl Wilhelm Scheele. The metal was first isolated in 1781 by Peter Jacob Hjelm.
Method of forming metal layer using atomic layer deposition and semiconductor device having the metal layer as barrier metal layer or upper or lower electrode of capacitor
InactiveUS6287965B1High thermal resistantEasy to adjustSemiconductor/solid-state device manufacturingCapacitorsNiobiumDevice material
A method of forming a metal layer having excellent thermal and oxidation resistant characteristics using atomic layer deposition is provided. The metal layer includes a reactive metal (A), an element (B) for the amorphous combination between the reactive metal (A) and nitrogen (N), and nitrogen (N). The reactive metal (A) may be titanium (Ti), tantalum (Ta), tungsten (W), zirconium (Zr), hafnium (Hf), molybdenum (Mo) or niobium (Nb). The amorphous combination element (B) may be aluminum (Al), silicon (Si) or boron (B). The metal layer is formed by alternately injecting pulsed source gases for the elements (A, B and N) into a chamber according to atomic layer deposition to thereby alternately stack atomic layers. Accordingly, the composition ratio of a nitrogen compound (A-B-N) of the metal layer can be desirably adjusted just by appropriately determining the number of injection pulses of each source gas. According to the composition ratio, a desirable electrical conductivity and resistance of the metal layer can be accurately obtained. The atomic layers are individually deposited, thereby realizing excellent step coverage even in a complex and compact region. A metal layer formed by atomic layer deposition can be employed as a barrier metal layer, a lower electrode or an upper electrode in a semiconductor device.
Owner:SAMSUNG ELECTRONICS CO LTD
Lubricating Composition Containing Ashfree Antiwear Agent Based on Hydroxypolycarboxylic Acid Derivative and a Molybdenum Compound
InactiveUS20100197536A1Reducing and preventing emissionImprove fuel economyAdditivesMolybdenum sulfidesAntioxidantAcid derivative
The invention provides a lubricating composition containing an oil of lubricating viscosity, an oil soluble molybdenum compound, and an ashless antiwear agent. The invention further provides for a new antioxidant. The lubricating composition is suitable for lubricating an internal combustion engine.
Owner:THE LUBRIZOL CORP
Niobium suboxide powder
ActiveUS20050013765A1High currentReduce residual currentOxide/hydroxide preparationLiquid electrolytic capacitorsCapacitorTungsten
A niobium suboxide powder comprising 100 to 600 ppm of magnesium is described. The niobium suboxide powder may (alternatively or in addition to 100 to 600 ppm of magnesium) further include 50 to 400 ppm of molybdenum and / or tungsten. The niobium suboxide powder is suitable for the production of: capacitors having an insulator layer of niobium pentoxide; capacitor anodes produced from the niobium suboxide powder; and corresponding capacitors.
Owner:TANIOBIS GMBH
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
ActiveUS20190067094A1Semiconductor/solid-state device detailsSolid-state devicesGas phaseDielectric surface
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process are disclosed. The methods may include: providing a substrate comprising a dielectric surface into a reaction chamber; depositing a nucleation film directly on the dielectric surface; and depositing a molybdenum metal film directly on the nucleation film, wherein depositing the molybdenum metal film includes: contacting the substrate with a first vapor phase reactant comprising a molybdenum halide precursor; and contacting the substrate with a second vapor phase reactant comprising a reducing agent precursor. Semiconductor device structures including a molybdenum metal film disposed over a surface of a dielectric material with an intermediate nucleation film are also disclosed.
Owner:ASM IP HLDG BV
Methods for filling a gap feature on a substrate surface and related semiconductor device structures
PendingUS20190067014A1Semiconductor/solid-state device detailsSolid-state devicesDeposition processSubstrate surface
Methods for filling a gap feature on a substrate surface are disclosure. The methods may include: providing a substrate comprising one or more gap features into a reaction chamber; and partially filling the one or more gap features with a molybdenum metal film by a cyclical deposition-etch process, wherein a unit cycle of the cyclical deposition-etch process comprises: partially filling the one or more gap features with a molybdenum metal film by a performing at least one unit cycle of a first cyclical deposition process; and partially etching the molybdenum metal film. The methods may also include: filling the one or more gap features with molybdenum metal film by performing at least one unit cycle of a second cyclical deposition process. Semiconductor device structures including a gap fill molybdenum metal film disposed in one or more gap features in or on a surface of a substrate formed by the methods of the disclosure are also disclosed.
Owner:ASM IP HLDG BV
Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
A method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process is disclosed. The method may include: contacting the substrate with a first vapor phase reactant comprising a metalorganic precursor, the metalorganic precursor comprising a metal selected from the group consisting of a cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof. The method may also include; contacting the substrate with a second vapor phase reactant comprising ruthenium tetroxide (RuO4); wherein the ruthenium-containing film comprises a ruthenium-metal alloy. Semiconductor device structures including ruthenium-metal alloys deposited by the methods of the disclosure are also disclosed.
Owner:ASM IP HLDG BV
Methods for forming a semiconductor device structure and related semiconductor device structures
Methods for forming a semiconductor device structure are provided. The methods may include forming a molybdenum nitride film on a substrate by atomic layer deposition by contacting the substrate with a first vapor phase reactant comprising a molybdenum halide precursor, contacting the substrate with a second vapor phase reactant comprise a nitrogen precursor, and contacting the substrate with a third vapor phase reactant comprising a reducing precursor. The methods provided may also include forming a gate electrode structure comprising the molybdenum nitride film, the gate electrode structure having an effective work function greater than approximately 5.0 eV. Semiconductor device structures including molybdenum nitride films are also provided.
Owner:ASM IP HLDG BV
Methods for depositing a molybdenum metal film on a dielectric surface of a substrate and related semiconductor device structures
PendingUS20190067003A1Semiconductor/solid-state device detailsSolid-state devicesGas phaseDielectric surface
Methods for depositing a molybdenum metal film directly on a dielectric material surface of a substrate by a cyclical deposition process are disclosed. The methods may include: providing a substrate comprising a dielectric surface into a reaction chamber; and depositing a molybdenum metal film directly on the dielectric surface, wherein depositing comprises: contacting the substrate with a first vapor phase reactant comprising a molybdenum halide precursor; and contacting the substrate with a second vapor phase reactant comprising a reducing agent precursor. Semiconductor device structures including a molybdenum metal film disposed directly on a surface of a dielectric material deposited by the methods of the disclosure are also disclosed.
Owner:ASM IP HLDG BV
Vapor deposition of tungsten nitride
ActiveUS20060125099A1Uniform thicknessImprove efficiencyMirrorsSemiconductor/solid-state device detailsElectrical conductorGas phase
Tungsten nitride films were deposited on heated substrates by the reaction of vapors of tungsten bis(alkylimide)bis(dialkylamide) and a Lewis base or a hydrogen plasma. For example, vapors of tungsten bis(tert-butylimide)bis(dimethylamide) and ammonia gas supplied in alternate doses to surfaces heated to 300° C. produced coatings of tungsten nitride having very uniform thickness and excellent step coverage in holes with aspect ratios up to at least 40:1. The films are metallic and good electrical conductors. Suitable applications in microelectronics include barriers to the diffusion of copper and electrodes for capacitors. Similar processes deposit molybdenum nitride, which is suitable for layers alternating with silicon in X-ray mirrors.
Owner:PRESIDENT & FELLOWS OF HARVARD COLLEGE
Spin-transfer torque magnetic random access memory having magnetic tunnel junction with perpendicular magnetic anisotropy
A spin-torque transfer memory random access memory (STTMRAM) element includes a fixed layer formed on top of a substrate and a a tunnel layer formed upon the fixed layer and a composite free layer formed upon the tunnel barrier layer and made of an iron platinum alloy with at least one of X or Y material, X being from a group consisting of: boron (B), phosphorous (P), carbon (C), and nitride (N) and Y being from a group consisting of: tantalum (Ta), titanium (Ti), niobium (Nb), zirconium (Zr), tungsten (W), silicon (Si), copper (Cu), silver (Ag), aluminum (Al), chromium (Cr), tin (Sn), lead (Pb), antimony (Sb), hafnium (Hf) and bismuth (Bi), molybdenum (Mo) or rhodium (Ru), the magnetization direction of each of the composite free layer and fixed layer being substantially perpendicular to the plane of the substrate.
Owner:AVALANCHE TECH
Passivating solution and surface treatment method for galvanized material
InactiveCN101608306AImprove corrosion resistanceMeet the requirements of the RoHS directiveMetallic material coating processesChromium freeAlcohol
The invention relates to a passivating solution which is aqueous solution containing water-soluble molybdic compound, boric acid, water-soluble organic matter and silica sol, wherein the water-soluble organic matter is a mixture of alcohol and organic carboxylic acid. The invention also provides a surface treatment method for a galvanized material, which comprises the following step: enabling the passivating solution to be in contact with a galvanized material. A galvanized layer can be passivated by the contact between the passivating solution and the galvanized material so as to enable the galvanized material to have excellent corrosion resistance. In addition, the paint composition is chromium free and meets the requirements of a RoHS instruction.
Owner:PANGANG GROUP VANADIUM TITANIUM & RESOURCES +3
A kind of aluminum alloy material and preparation method thereof
Owner:GUANGDONG XINYI ALUMINUM ALLOY CABLE
Lead free reduced ricochet limited penetration projectile
A frangible projectile with a specific gravity similar to a lead projectile. The projectile comprises 34-94%, by weight, binder. The binder comprises poly ether block amide resin. The projectile further comprises 6-66%, by weight, ballast. The ballast comprises at least one member selected from a group consisting of tungsten, tungsten carbide, molybdenum, tantalum, ferro-tungsten, copper, bismuth, iron, steel, brass, aluminum bronze, beryllium copper, tin, aluminum, titanium, zinc, nickel silver alloy, cupronickel and nickel. The projectile can be prepared with a particularly preferred specific gravity of 5-14 and more preferably 11-11.5.
Owner:ACCUTEC USA
Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
Owner:ASM IP HLDG BV
Earth-boring bits
ActiveUS20050247491A1Low melting pointLowered melting point of the binder facilitates proper infiltration of the massDrill bitsCutting machinesBorideNiobium
Owner:BAKER HUGHES INC +1
Earth-boring bits
InactiveUS20050211475A1Low melting pointLowered melting point of the binder facilitates proper infiltration of the massDrill bitsMetal-working drilling toolsBorideNiobium
The present invention relates to compositions and methods for forming a bit body for an earth-boring bit. The bit body may comprise hard particles, wherein the hard particles comprise at least one carbide, nitride, boride, and oxide and solid solutions thereof, and a binder binding together the hard particles. The binder may comprise at least one metal selected from cobalt, nickel, and iron, and at least one melting point reducing constituent selected from a transition metal carbide in the range of 30 to 60 weight percent, boron up to 10 weight percent, silicon up to 20 weight percent, chromium up to 20 weight percent, and manganese up to 25 weight percent, wherein the weight percentages are based on the total weight of the binder. In addition, the hard particles may comprise at least one of (i) cast carbide (WC+W2C) particles, (ii) transition metal carbide particles selected from the carbides of titanium, chromium, vanadium, zirconium, hafnium, tantalum, molybdenum, niobium, and tungsten, and (iii) sintered cemented carbide particles.
Owner:ATI PROPERTIES +1
Preparation of recombinant factor VIII in a protein free medium
InactiveUS6171825B1Eliminate and at least greatly reduce riskImprove productivityFactor VIICulture processFactor iiManganese
Recombinant Factor VIII can be produced in relatively large quantities on a continuous basis from mammalian cells in the absence of any animal-derived proteins such as albumin by culturing the cells in a protein free medium supplemented with polyol copolymers, preferably in the presence of trace metals such as copper. In very preferred embodiments, the medium includes a polyglycol known as Pluronic F-68, copper sulfate, ferrous sulfate / EDTA complex, and salts of trace metals such as manganese, molybdenum, silicon, lithium and chromium. With an alternative medium which included trace copper ions alone (without polyol copolymers) we were also able to enhance the productivity of Factor VIII in recombinant cells such as BHK cells that are genetically engineered to express Factor VIII.
Owner:BAYER HEALTHCARE LLC +1
Austenoferritic stainless steel having a very low nickel content and a high tensile elongation
InactiveUS6096441ALow nickel contentImproved general propertyHeat treatment process controlElectric furnaceSulfurManganese
An austenoferritic stainless steel with high tensile elongation includes iron and the following elements in the indicated weight amounts based on total weight: carbon<0.04% 0.4%<silicon<1.2% 2%<manganese<4% 0.1%<nickel<1% 18%<chromium<22% 0.05%<copper<4% sulfur<0.03% phosphorus<0.1% 0.1%<nitrogen<0.3% molybdenum<3% the steel having a two-phase structure of austenite and ferrite and comprising between 30% and 70% of austenite, wherein Creq=Cr %+Mo %+1.5 Si % Nieq=Ni %+0.33 Cu %+0.5 Mn %+30 C %+30 N % and Creq / Nieq is from 2.3 to 2.75, and wherein IM=551-805(C+N)%-8.52 Si %-8.57 Mn %-12.51 Cr %-36 Ni %-34.5 Cu %-14 Mo %, IM being from 40 to 115.
Owner:UGITECH
Slag oil hydro-demetallization catalyst and its preparing method
ActiveCN1782031AImprove performanceEasy to operateRefining to eliminate hetero atomsAluminum CarbonateAlumina hydrate
The slag oil hydrodemetallizing catalyst contains a kind of double-peak hole alumina carrier and supported Mo and / or W and Ni and / or Co metal components. The double-peak hole alumina carrier has pore volume of 0.8-1.6 ml / g, specific surface area 150-350 sq m / g, pore volume fraction of 10-30 nm size holes in 40-90 % and pore volume fraction of 100-2000 nm size holes in 10-60 %, and is prepared through mixing alumina hydrate and ammonium aluminum carbonate, forming and roasting. The slag oil hydrodemetallizing catalyst has simple preparation process and high hydrodemetallizing performance.
Owner:CHINA PETROLEUM & CHEM CORP +1
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
ActiveUS20210151352A1Semiconductor/solid-state device detailsSolid-state devicesDevice materialPhysical chemistry
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process are disclosed. The methods may include: providing a substrate comprising a dielectric surface into a reaction chamber; depositing a nucleation film directly on the dielectric surface; and depositing a molybdenum metal film directly on the nucleation film, wherein depositing the molybdenum metal film includes: contacting the substrate with a first vapor phase reactant comprising a molybdenum halide precursor; and contacting the substrate with a second vapor phase reactant comprising a reducing agent precursor. Semiconductor device structures including a molybdenum metal film disposed over a surface of a dielectric material with an intermediate nucleation film are also disclosed.
Owner:ASM IP HLDG BV
Infrared reflective color pigment
InactiveUS6454848B2Reduce heat buildupReduce energy costsInorganic pigment treatmentCoatingsIndiumCobalt
Owner:FERRO CORP
Iron-based ionic liquid catalysts for hydroprocessing carbonaceous feeds
InactiveUS6139723AIncrease hydrocracking ability of catalystIndirect and direct heating destructive distillationCatalyst activation/preparationLiquid productIron salts
A highly dispersed iron-based ionic liquid or liquid-gel catalyst which may be anion-modified and metals-promoted has high catalytic activity, and is useful for hydrocracking / hydrogenation reactions for carbonaceous feed materials. The catalyst is produced by aqueous precipitation from saturated iron salt solutions such as ferric sulfate and ferric alum, and may be modified during preparation with anionic sulfate (SO42-) and promoted with small percentages of at least one active metal such as cobalt, molybdenum, palladium, platinum, nickel, or tungsten or mixtures thereof. The resulting catalyst may be used in a preferred ionic liquid form or in a liquid-gel form, and either fluidic form can be easily mixed and reacted with carbonaceous feed materials such as coal, heavy petroleum fractions, mixed plastic waste, or mixtures thereof. The invention includes methods for making the ionic liquid or liquid-gel catalyst, and processes for using the fluidic catalysts for hydroprocessing the carbonaceous feed materials to produce desirable low-boiling hydrocarbon liquid products.
Owner:HEADWATERS CTL
Methods for forming a polycrystalline molybdenum film over a surface of a substrate and related structures including a polycrystalline molybdenum film
Methods for forming a polycrystalline molybdenum film over a surface of a substrate are disclosed. The methods may include: providing a substrate into a reaction chamber; depositing a nucleation film directly on an exposed surface of the substrate, wherein the nucleation film comprises one of a metal oxide nucleation film or a metal nitride nucleation film; and depositing a polycrystalline molybdenum film directly on the nucleation film; wherein the polycrystalline molybdenum film comprises a plurality of molybdenum crystallites having an average crystallite size of less than 80 Å. Structures including a polycrystalline molybdenum film disposed over a surface of a substrate with an intermediate nucleation film are also disclosed.
Owner:ASM IP HLDG BV
Processes for making ethanol from acetic acid
InactiveUS20100197985A1High selectivityPreparation by oxo-reaction and reductionEthylene productionCeriumCobalt
A process for selective formation of ethanol from acetic acid by hydrogenating acetic acid in the presence of first metal, a silicaceous support, and at least one support modifier. Preferably, the first metal is selected from the group consisting of copper, iron, cobalt, nickel, ruthenium, rhodium, palladium, osmium, iridium, platinum, titanium, zinc, chromium, rhenium, molybdenum, and tungsten. In addition the catalyst may comprise a second metal preferably selected from the group consisting of copper, molybdenum, tin, chromium, iron, cobalt, vanadium, tungsten, palladium, platinum, lanthanum, cerium, manganese, ruthenium, rhenium, gold, and nickel.
Owner:CELANESE INT CORP
Methods for forming a semiconductor device structure and related semiconductor device structures
ActiveUS10734497B2TransistorSemiconductor/solid-state device manufacturingChemical physicsDevice material
Owner:ASM IP HLDG BV
High surface area sol-gel route prepared hydrogenation catalysts
InactiveUS6686310B1Good dispersionImprove uniformityCatalyst activation/preparationMetal/metal-oxides/metal-hydroxide catalystsRheniumSilicon oxide
This invention concerns novel compositions, useful as hydrogenation catalyst, said compositions comprising metals and metal ions such as ruthenium (Ru) or palladium (Pd) dispersed in and distributed throughout a matrix comprising an inorganic or silicon oxide network. The catalyst may be prepared by the sol-gel method; a solution of at least one catalytic metal compound is added to a solution of at least one metal alkoxide selected from Al, Ti, Nb, Zr, Ta, Si and other inorganic alkoxides, and then gelling the mixture. Promotors such as rhenium (Re), molybdenum (Mo) and tin (Sn) may be added. The catalyst may be used in the reduction of metallic acid or gamma-butyrolactone to tetrahydrofuran (THF) and 1,4-butanediol (BDO).
Owner:EI DU PONT DE NEMOURS & CO
Piston ring
InactiveUS6325385B1Good sliding propertiesRelieve pressurePiston ringsBraking action transmissionCarbon filmDiamond-like carbon
Owner:TEIKOKU PISTON RING CO LTD
Carbon nanotube particulates, compositions and use thereof
InactiveUS20050002851A1Suitable for useMaterial nanotechnologyNanoinformaticsParticulatesContact time
A method for making carbon nanotube particulates involves providing a catalyst comprising catalytic metals, such as iron and molybdenum or metals from Group VIB or Group VIIIB elements, on a support material, such as magnesia, and contacting the catalyst with a gaseous carbon-containing feedstock, such as methane, at a sufficient temperature and for a sufficient contact time to make small-diameter carbon nanotubes having one or more walls and outer wall diameters of less than about 3 nm. Removal of the support material from the carbon nanotubes yields particulates of enmeshed carbon nanotubes that retain an approximate three-dimensional shape and size of the particulate support that was removed. The carbon nanotube particulates can comprise ropes of carbon nanotubes. The carbon nanotube particulates disperse well in polymers and show high conductivity in polymers at low loadings. As electrical emitters, the carbon nanotube particulates exhibit very low “turn on” emission field.
Owner:UNIDYM
Metal alloy for medical devices and implants
InactiveUS20080312740A1Maintain good propertiesImprove uniformityStentsHeart valvesNiobiumBiocompatibility Testing
Owner:ABBOTT IRELAND
Zinc Ion-Exchanging Energy Storage Device
ActiveUS20160301096A1Quick releaseRapid depositionHybrid capacitor electrolytesAlkaline accumulatorsChemical treatmentZinc metal
A zinc ion-exchanging battery device comprising: (A) a cathode comprising two cathode active materials (a zinc ion intercalation compound and a surface-mediating material); (B) an anode containing zinc metal or zinc alloy; (C) a porous separator disposed between the cathode and the anode; and (D) an electrolyte containing zinc ions that are exchanged between the cathode and the anode during battery charge / discharge. The zinc ion intercalation compound is selected from chemically treated carbon or graphite material having an expanded inter-graphene spacing d002 of at least 0.5 nm, or an oxide, carbide, dichalcogenide, trichalcogenide, sulfide, selenide, or telluride of niobium, zirconium, molybdenum, hafnium, tantalum, tungsten, titanium, vanadium, chromium, cobalt, manganese, iron, nickel, or a combination thereof. The surface-mediating material contains exfoliated graphite or multiple single-layer sheets or multi-layer platelets of a graphene material.
Owner:GLOBAL GRAPHENE GRP INC
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