24462 results about "Chromium" patented technology

A chromic luminescent composition and method for fabricating the composition are disclosed. The chromic luminescent composition comprises at least one or more non-luminescent materials and one or more luminescent materials. The one or more non-luminescent materials having absorption spectra that at least partially overlap with the spectrum of incident electromagnetic radiation. The one or more luminescent materials convert at least a portion of energy of incident electromagnetic radiation to a lower energy wavelength. The one or more non-luminescent materials and the one or more luminescent materials are selected such that, when subsequently exposed to incident electromagnetic radiation, color and brightness are substantially modulated through absorption and emission as a function of incident electromagnetic radiation. Also disclosed are a chromic luminescent textile and a method for fabricating the textile.

A method for etching a chromium layer is provided herein. In one embodiment, a method for etching a chromium layer includes providing a filmstack in an etching chamber, the filmstack having a chromium layer partially exposed through a patterned layer, providing at least one halogen containing process gas to a processing chamber, biasing the layer disposed on a substrate support in the processing chamber with a plurality of power pulses less than 600 Watts, and etching the chromium layer through a patterned mask. The method for plasma etching a chromium layer described herein is particularly suitable for fabricating photomasks.

A method for preparing 2,3,3,3-tetrafluoroprop-1-ene comprising (a) providing a starting composition comprising at least one compound having a structure selected from Formulae I, II and III:CX2═CCl—CH2X  (Formula I)CX3—CCl═CH2  (Formula II)CX3—CHCl—CH2X  (Formula III)wherein X is independently selected from F, Cl, Br, and I, provided that at least one X is not fluorine;(b) contacting said starting composition with a first fluorinating agent to produce a first intermediate composition comprising 2-chloro-3,3,3-trifluoropropene and a first chlorine-containing byproduct; (c) contacting said first intermediate composition with a second fluorinating agent to produce a second intermediate composition comprising 2-chloro-1,1,1,2-tetrafluoropropane and a second chlorine-containing byproduct; and (d) catalytically dehydrochlorinating at least a portion of said 2-chloro-1,1,1,2-tetrafluoropropane to produce a reaction product comprising 2,3,3,3-tetrafluoroprop-1-ene.

The present invention relates to compositions and methods for forming a bit body for an earth-boring bit. The bit body may comprise hard particles, wherein the hard particles comprise at least one carbide, nitride, boride, and oxide and solid solutions thereof, and a binder binding together the hard particles. The binder may comprise at least one metal selected from cobalt, nickel, and iron, and, optionally, at least one melting point reducing constituent selected from a transition metal carbide in the range of 30 to 60 weight percent, boron up to 10 weight percent, silicon up to 20 weight percent, chromium up to 20 weight percent, and manganese up to 25 weight percent, wherein the weight percentages are based on the total weight of the binder. In addition, the hard particles may comprise at least one of (i) cast carbide (WC+W2C) particles, (ii) transition metal carbide particles selected from the carbides of titanium, chromium, vanadium, zirconium, hafnium, tantalum, molybdenum, niobium, and tungsten, and (iii) sintered cemented carbide particles.

In a solar cell having p doped regions and n doped regions alternately formed in a surface of a semiconductor wafer in offset levels through use of masking and etching techniques, metal contacts are made to the p regions and n regions by first forming a base layer contacting the p doped regions and n doped regions which functions as an antireflection layer, and then forming a barrier layer, such as titanium tungsten or chromium, and a conductive layer such as copper over the barrier layer. Preferably the conductive layer is a plating layer and the thickness thereof can be increased by plating.

An implantable medical device and methods for making the implantable medical device are disclosed. The implantable medical device includes a substrate. At least a portion of the substrate is coated with a first layer including a polymer containing a drug. A barrier overlies the first layer. The barrier significantly reduces the rate of release of the drug from the polymer, thereby sustaining release of the drug from the medical device for a longer time.The barrier may be a homogeneous layer overlying the first layer, or a number of discrete deposits over the first layer. Alternatively, the barrier may be intermixed with an outer portion of the first layer. The barrier material is biocompatible, and typically has a thickness ranging from about 50 angstroms to about 20,000 microns. Suitable materials for the barrier include, but are not limited to, inorganic compounds, such as inorganic silicides, oxides, nitrides, carbides, as well as pure metals such as aluminum, chromium, gold, hafnium, iridium, niobium, palladium, platinum, tantalum, titanium, tungsten, zirconium, and alloys of these metals. The barriers disclosed may be applied to the first layer by several techniques, depending on the material being applied. Exemplary deposition techniques include physical vapor deposition, alkoxide hydrolysis, and electroless plating.The implantable device may be a stent or a graft, among other possibilities.

An improved aluminum lithium alloy comprising 0.1 to 2.5 wt. % Li, 2.5 to 5.5 wt. % Cu, 0.2 to 1.0 wt. % Mg, 0.2 to 0.8 wt. % Ag, 0.2 to 0.8 wt. % Mn, up to 0.4 wt. % Zr or other grain refiner such as chromium, titanium, hafnium, scandium or vanadium, the balance aluminum. The present alloy exhibits an improved combination of strength and fracture toughness, over any thickness range. The present invention is further directed to methods for preparing and using Al—Li alloys as well as to products comprising the same.

A metallic coating for use in a high temperature application is created from a nickel base alloy containing from 5.0 to 10.5 wt % aluminum, from 4.0 to 15 wt % chromium, from 2.0 to 8.0 wt % tungsten, from 3.0 to 10 wt % tantalum, and the balance nickel. The metallic coating has particular utility in protecting single crystal superalloys used in high temperature applications such as turbine engine components.

A process for the simultaneous trimerization and tetramerization of olefinic monomers , wherein the process comprises contacting at least one olefinic monomer with catalyst system comprising : a) a source of chromium, molybdenum or tungsten; b) a ligand having the general formula (I) ; (R<1>)2P-X-P (R<1>)m(R<2>)n wherein : X is a bridging group of the formula -N(R<3>)-, wherein R<3> is selected from hydrogen, a hydrocarbyl group, a substituted hydrocarbyl group, a heterohydrocarbyl group, a substituted heterohydrocarbyl group, a silyl group or derivative thereof; the R<1> groups are independently selected from an optionally substituted aromatic group bearing a polar substituent on at least one of the ortho-positions; and the R<2> groups are independently selected from hydrocarbyl, substituted hydrocarbyl, heterohydrocarbyl and substituted heterohydrocarbyl groups and c) a cocatalyst. The present invention further relates to a process for the simultaneous trimerization and tetramerization of ethylene to 1-hexene and 1-octene.