2188 results about "Electron mobility" patented technology

A semiconductor device improves the electron mobility in the n-channel MOSFET and reduces the bend or warp of the semiconductor substrate or wafer. The fist nitride layer having a tensile stress is formed on the substrate to cover the n-channel MOSFET. The tensile stress of the first nitride layer serves to relax a compressive stress existing in the channel region. The second nitride layer having an actual compressive stress is formed on the substrate to cover the p-channel MOSFET. The first and second nitride layers serve to decrease bend or warp of the substrate. Preferably, the first nitride layer is a nitride layer of Si formed by a LPCVD process, and the second nitride layer is a nitride layer of Si formed by a PECVD process.

Disclosed is an SRAM cell on an SOI, bulk or HOT wafer with two pass-gate n-FETs, two pull-up p-FETs and two pull-down n-FETs and the associated methods of making the SRAM cell. The pass-gate FETs and pull-down FETs are non-planar fully depleted finFETs or trigate FETs. The pull-down FETs comprise non-planar partially depleted three-gated FETs having a greater channel width and a greater gate length and, thus, a greater drive current relative to the pass-gate and pull-up FETs. Additionally, for optimal electron mobility and hole mobility, respectively, the channels of the n-FETs and p-FETs can comprise semiconductors with different crystalline orientations.

A fluorine treatment that can shape the electric field profile in electronic devices in 1, 2, or 3 dimensions is disclosed. A method to increase the breakdown voltage of AlGaN/GaN high electron mobility transistors, by the introduction of a controlled amount of dispersion into the device, is also disclosed. This dispersion is large enough to reduce the peak electric field in the channel, but low enough in order not to cause a significant decrease in the output power of the device. In this design, the whole transistor is passivated against dispersion with the exception of a small region 50 to 100 nm wide right next to the drain side of the gate. In that region, surface traps cause limited amounts of dispersion, that will spread the high electric field under the gate edge, therefore increasing the breakdown voltage. Three different methods to introduce dispersion in the 50 nm closest to the gate are described: (1) introduction of a small gap between the passivation and the gate metal, (2) gradually reducing the thickness of the passivation, and (3) gradually reducing the thickness of the AlGaN cap layer in the region close the gate.

A memory including memory cells having active and passive layers may store multiple information bits. The active layer may include an organic polymer that has a variable resistance based on the movement of charged species (ions or ions and electrons) between the passive layer and the active layer. The passive layer may be a super-ionic material that has high ion and electron mobility. The active layer may be self-assembled from a monomer in a liquid or gas.

There is provided a thin film transistor (TFT) capable of improving electron mobility and minimizing the occurrence of hysteresis due to traps. The TFT includes a channel layer and a gate insulating layer, wherein the channel layer is made of an oxide semiconductor. In the TFT, the gate insulating layer includes one or more first dielectric layer and a second dielectric layer, and the first dielectric layer has a dielectric constant different from that of the second dielectric layer.

A silicon-made low-forward-voltage Schottky barrier diode is serially combined with a high-antivoltage-strength high-electron-mobility transistor made from a nitride semiconductor that is wider in bandgap than silicon. The Schottky barrier diode has its anode connected to the gate, and its cathode to the source, of the HEMT. This HEMT is normally on. The reverse voltage withstanding capability of the complete device depends upon that between the drain and gate of the HEMT.

A dispersion-free high electron mobility transistor (HEMT), comprised of a substrate; a semi-insulating buffer layer, comprised of gallium nitride (GaN) or aluminum gallium nitride (AlGaN), deposited on the substrate, an AlGaN barrier layer, with an aluminum (Al) mole fraction larger than that of the semi-insulating buffer layer, deposited on the semi-insulating buffer layer, an n-type doped graded AlGaN layer deposited on the AlGaN barrier layer, wherein an Al mole fraction is decreased from a bottom of the n-type doped graded AlGaN layer to a top of the n-type doped graded AlGaN layer, and a cap layer, comprised of GaN or AlGaN with an Al mole fraction smaller than that of the AlGaN barrier layer, deposited on the n-type doped graded AlGaN layer.

The invention relates to a semiconductor structure and method of manufacturing and more particularly to a CMOS device with at least one embedded SiGe layer in the source/drain region of the PFET, and at least one embedded SiGe layer in the channel region of the NFET. In one embodiment, the structure of the invention enhances the electron mobility in the NFET device, and further enhances the hole mobility in the PFET device. Additionally, by using the fabrication methods and hence achieving the final structure of the invention, it is also possible to construct a PFET and NFET each with embedded SiGe layers on the same substrate.

The organic EL device of the present invention includes a plurality of organic compound-containing layers provided between a cathode and an anode. Of two of the organic compound-containing layers adjacent to each other, one layer positioned nearer the anode has electron mobility lower than that of the other layer positioned nearer the cathode. Accordingly, the organic EL device of the present invention has a high luminous efficiency and a long half-life of the initial luminance.

A p-type MOSFET of a CMOS structure has a silicon-germanium alloy channel to which a longitudinal compressive stress is applied by embedded epitaxial silicon-germanium alloy source and drain regions comprising a silicon-germanium alloy having a higher concentration of germanium than the channel of the p-type MOSFET. An n-type MOSFET of the CMOS structure has a silicon-germanium alloy channel to which a longitudinal tensile stress is applied by embedded epitaxial silicon source and drain regions comprising silicon. The silicon-germanium alloy channel in the p-type MOSFET provides enhanced hole mobility, while the silicon-germanium alloy channel in the n-type MOSFET provides enhanced electron mobility, thereby providing performance improvement to both the p-type MOSFET and the n-type MOSFET.

An active matrix LED display apparatus and a fabrication method thereof are provided. The active matrix LED display apparatus enables to miniaturize pixel by a formation of wiring on bottom layer and an assembly of each block through each eutectic layer into each transistor block receptor and/or each LED block receptor formed according to each color element unit, and to be embodied with high luminance, low power consumption, high reliability and superior optical property by assembling a transistor block having high electron mobility. And the fabricating method of the present invention enables to make efficiently an AM-LED display apparatus at room temperature in a short time by using different shapes of receptor and block depending on the function of a transistor and/or on the color of an LED.

The invention discloses a spirofluorene xanthene material and a preparation method and an application method thereof, and relates to application of the material in the fields such as organic electroluminescence, photovoltaic cell, organic electrical storage, organic nonlinear optics, chemical and biological sensing, organic laser and so on. The material has the following structure. The material has the advantages that (1) the material is prepared through a one pot process and has simple steps and mild conditions; (2) the material has the advantages of spirobifluorene materials, and shows high thermal stability and vitrification temperature; and (3) the material has high hole or electron mobility and so on. An electroluminescent device prepared by utilizing the material achieves satisfactory results in aspects such as illumination, luminous efficiency, voltage withstand stability and so on.

A semiconductor device having a metal insulator semiconductor field effect transistor (MISFET) with increased electron mobility and enhanced hole mobility is disclosed. In this semiconductor device, a p-type well layer and an n-type well layer are formed in a surface portion of a silicon substrate. A nitrogen-nondoped n-channel interface layer and a nitrogen-free n-channel high dielectric constant gate insulation film plus an n-channel gate electrode are formed in an n-channel MISFET as partitioned by an element isolation region. And, n-type source/drain diffusion layers are provided. In a p-channel MISFET, a nitrogen-doped p-channel interface layer, a nitrogen-added p-channel high dielectric gate insulation film and a p-channel gate electrode are formed along with p-channel source/drain diffusion layers as provided therein. A method of fabricating this semiconductor device is also disclosed.

The present invention recites a new method for manufacturing Group III-N field-effect devices, such as HEMT, MOSHFET, MISHFET devices or MESFET devices, grown by Metal-Organic Vapor Phase Expitaxy, with higher performance (power), by covering the surface with a thin SiN layer on the top AlGaN layer, in the reactor where the growth takes place at high temperature, prior cooling down the structure and loading the sample out of the reactor, as well as a method to produce some HEMT transistors on those heterostructures, by depositing the contact on the surface without any removal of the SiN layer by MOCVD. The present invention recites also a device.

Provided are a display substrate and a display device including the same. The display substrate includes: gate wiring; a first semiconductor pattern formed on the gate wiring and having a first energy bandgap; a second semiconductor pattern formed on the first semiconductor pattern and having a second energy bandgap which is greater than the first energy bandgap; data wiring formed on the first semiconductor pattern; and a pixel electrode electrically connected to the data wiring. Because the second energy bandgap is larger than the first energy bandgap, a quantum well is formed in the first semiconductor pattern, enhancing electron mobility therein.

Binary Group III-nitride high electron mobility transistors (HEMTs) and methods of fabricating binary Group III-nitride HEMTs are provided. In some embodiments, the binary Group III-nitride HEMTs include a first binary Group III-nitride barrier layer, a binary Group III-nitride channel layer on the first barrier layer; and a second binary Group III-nitride barrier layer on the channel layer. In some embodiments, the binary Group III-nitride HEMTs include a first AIN barrier layer, a GaN channel layer and a second AlN barrier layer.