133408 results about "Nozzle" patented technology

The invention relates to a non-smokable electronic spray cigarette which only comprises nicotine without harmful tar. The cigarette includes a smoke mouth integer comprised with a shell, a cell, a high frequency ionzer, nicotine solution storage and its container, control circuit, a display screen, a human contact sensor, a piezoelectric supersound atomizer, a high temperature vaporization nozzle and attachments, an electro-thermal vaporization nozzle installed in the air suction end of the shell goes through an electric control pump or a valve with a measuring chamber and a liquid storage container which contains nicotine solution and is connected to the electric control pump or a valve with a one-way flow valve, the control circuit plate has four export ends individually connected with the high frequency ionizer, electric heater, pump or valve and the display screen, a human resistence sensor and an air flow sensor are connected to the input end of the control circuit. The advantages of the present invention are smoking without tar, reducing the cancerogenic risk, the user still feel smoking and experiercing the excitement, the cigarette is no need to be lit and is no fire danger.

An external mixer assembly is provided which externally mixes and delivers a first and a second component of a biological adhesive to tissues or organs for sealing wounds, stopping bleeding and the like. The first and second components are mixed immediately after exiting from separate outlet ports disposed in fluid communication with component reservoirs. In on embodiment, the external mixer assembly includes a housing having a housing head for enclosing therein a first reservoir containing the first component, and a second reservoir containing the second component. The housing further includes a discharge nozzle defining a longitudinal axis for enclosing therein a conduit assembly having a first and a second conduit in communication with the first and second reservoir, respectively. A deflector assembly is connected to the discharge nozzle. The deflector assembly includes a deflector plate to provide a space for initial mixing of the first and second components. The deflector plate is oriented in generally parallel juxtaposed relation distal to the distal face of the discharge nozzle. The first and second components are preferably fibrinogen and thrombin which intermix to form a fibrin sealant.

An electronic cigarette is provided. The electronic cigarette includes a casing having an inhalation hole and a substantially cylindrical configuration, ejection means (first ejection means) provided in the casing and at least one ejection head. Pressure in a cavity filled with a liquid flavor generating medium is changed by driving an actuator to eject the flavor generating medium as droplets from a nozzle in communication with the cavity. Control means provided in the casing controls the driving of the ejection means.

An air powered wrench device with a pivotable head and associated method of using. The device comprises a handle pivotally attached to an arm. The handle comprises a housing, an air intake nozzle, an air driven motor, a drive shaft, a ball bearing collar, a universal joint, an on / off button, a trigger switch, a directional throw switch, a lock pin, a spring, and a pivot post. The arm is pivotally attached to the handle via the pivot post. The arm includes: an outer casing, an extension rod, a ball bearing sleeve, a first pawl gear, a second pawl gear, and a bit connector. The method of using the device comprises the steps of adjoining, affixing, aligning, allowing, enshrouding, getting, moving, obtaining, putting, rotating, shifting, squeezing, and tightening.

Liquid is supplied by a supply mechanism to a space between a lens and a wafer via a supply nozzle on one side of the lens, and the liquid is recovered by a recovery mechanism via a recovery pipe on the other side of the lens. When the supply and the recovery of the liquid are performed in parallel, a predetermined amount of liquid (exchanged at all times) is held between the lens and the substrate on the stage. Accordingly, when exposure (pattern transfer on the substrate) is performed in this state, an immersion method is applied and a pattern is transferred with good precision onto the substrate. In addition, in the case the liquid leaks out from under the lower edge of a peripheral wall, the liquid that could not be recovered is recovered by an auxiliary recovery mechanism via a slit. And, by such operations, the substrate is freed from the residual liquid on the substrate.

A method of and apparatus for providing tunable gas injection in a plasma processing system (10, 10′). The apparatus includes a gas injection manifold (50) having a pressurizable plenum (150) and an array of adjustable nozzle units (250), or an array of non-adjustable nozzles (502, 602), through which gas from the plenum can flow into the interior region (40) of a plasma reactor chamber (14) capable of containing a plasma (41). The adjustable nozzle units include a nozzle plug (160) arranged within a nozzle bore (166). A variety of different nozzle units are disclosed. The nozzle plugs are axially translatable to adjust the flow of gas therethrough. In one embodiment, the nozzle plugs are attached to a plug plate (154), which is displacable relative to an injection plate (124) via displacement actuators (170) connecting the two plates. The displacement actuators are controlled by a displacement actuator control unit (180), which is in electronic communication with a plasma processing system control unit (80). The gas flow into the chamber interior region is preferably controlled by monitoring the pressure in the plenum and in the chamber and adjusting the nozzle units accordingly. Where the nozzle units are not adjustable, a portion of the nozzles are sized to a first flow condition, and another portion of the nozzles are sized to a second flow condition.

An apparatus to manufacture a semiconductor, in which distribution of process gases supplied to a reaction region in a reaction chamber is uniform, includes a gas supply nozzle to supply process gases to a semiconductor substrate in the reaction chamber, wherein the gas supply nozzle includes a first supply channel formed in a longitudinal direction, and first outlet channels formed at an outlet of the first supply channel such that the first outlet channels are inclined with respect to the direction of the first supply channel at a designated angle to diffuse the process gas supplied through the first supply channel.

A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam source includes a discharge cavity having a first width and a nozzle extending outwardly therefrom to emit the ion beam. The aperture or outlet of the nozzle has a second width, which second width is less than the first width. An ionizable gas is introduced to the discharge cavity. At least one electrode connected to the AC power supply, alternatively serving as an anode or a cathode, is capable of supporting at least one magnetron discharge region within the discharge cavity when serving as a cathode electrode. A plurality of magnets generally facing one another, are disposed adjacent each discharge cavity to create a magnetic field null region within the discharge cavity.

Systems and methods treat fractured or diseased bone by deploying more than a single therapeutic tool into the bone. In one arrangement, the systems and methods deploy an expandable body in association with a bone cement nozzle into the bone, such that both occupy the bone interior at the same time. In another arrangement, the systems and methods deploy multiple expandable bodies, which occupy the bone interior volume simultaneously. Expansion of the bodies form cavity or cavities in cancellous bone in the interior bone volume.

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.

A tobacco solution atomizing device for electronic cigarette is disclosed the device comprises an atomizer installed in a fixing sleeve; a suction nozzle component and electrode connectors coupled on respective ends of the fixing sleeve, wherein the electrode connectors comprises a positive electrode connector and a negative electrode connector; the atomizer comprising a glass fiber tube, a glass fiber yarn, a heating coil, a cotton cloth layer and a synthetic fiber layer, wherein the glass fiber yarn is insert into the heating coil which is then located inside the glass fiber tube; the ends of the glass fiber silk and two wires which are used to electronically connect the heating coil to the positive and negative electrode connectors extends outward through the glass fiber tube; the cotton cloth layer enwraps the outside wall of the glass fiber tube and reveal ends of the glass fiber yarn are pressed tightly between the cotton cloth layer and the glass fiber tube; a synthetic fiber layer is filled within the annular shape space between the cotton cloth layer and the fixing sleeve for holding the tobacco solution.

A method of operating a substrate processing chamber that includes, prior to a substrate processing operation, flowing a seasoning gas comprising silane and oxygen into said chamber at a flow ratio of greater than or equal to about 1.6:1 oxygen to silane to deposit a silicon oxide film over at least one aluminum nitride nozzle exposed to an interior portion of the chamber. Also, a substrate processing system that includes a housing, a gas delivery system for introducing a seasoning gas into a vacuum chamber, where the gas delivery system comprises one or more aluminum nitride nozzles exposed to the vacuum chamber, a controller and a memory having a program having instructions for controlling the gas delivery system to flow a seasoning gas that has an oxygen to silane ratio greater than or equal to about 1.6:1 to deposit a silicon oxide film on the aluminum nitride nozzles.

A system, apparatus, and method for filling a display panel having first and second plates, with liquid crystal material, includes a nozzle for depositing a layer of liquid crystal material over a surface of a first plate of the panel, a scanning arm, coupled to the nozzle, for uniformly forming the layer of liquid crystal material over the surface of the first plate of the panel, and an attachment mechanism for placing the second plate over the first plate having the liquid crystal material thereover, thereby to form the display panel.

A method of operating a substrate processing chamber that includes, prior to a substrate processing operation, flowing a seasoning gas comprising silane and oxygen into said chamber at a flow ratio of greater than or equal to about 1.6:1 oxygen to silane to deposit a silicon oxide film over at least one aluminum nitride nozzle exposed to an interior portion of the chamber. Also, a substrate processing system that includes a housing, a gas delivery system for introducing a seasoning gas into a vacuum chamber, where the gas delivery system comprises one or more aluminum nitride nozzles exposed to the vacuum chamber, a controller and a memory having a program having instructions for controlling the gas delivery system to flow a seasoning gas that has an oxygen to silane ratio greater than or equal to about 1.6:1 to deposit a silicon oxide film on the aluminum nitride nozzles.

A substrate processing apparatus that enables a state of plasma over a substrate to be maintained in a desired state easily. A plasma processing apparatus 10 that has therein a camber 11, a stage 12, and a processing gas introducing nozzle 38 carries out etching on a wafer W. The chamber 11 houses the wafer W. The stage 12 is disposed in the chamber 11 and the wafer W is mounted thereon. The processing gas introducing nozzle 38 is a projecting body that projects out into the chamber 11, and has therein a plurality of processing gas introducing holes 56 that open out in different directions to one another.

A UV irradiation apparatus for processing a semiconductor substrate includes: a UV lamp unit; a reaction chamber disposed under the UV lamp unit; a gas ring with nozzles serving as a first electrode between the UV lamp unit and the reaction chamber; a transmission window supported by the gas ring; an RF shield which covers a surface of the transmission window facing the UV lamp unit; a second electrode disposed in the reaction chamber for generating a plasma between the first and second electrodes; and an RF power source for supplying RF power to one of the first or second electrode.

A method of operating a substrate processing chamber that includes, prior to a substrate processing operation, flowing a seasoning gas comprising silane and oxygen into said chamber at a flow ratio of greater than or equal to about 1.6:1 oxygen to silane to deposit a silicon oxide film over at least one aluminum nitride nozzle exposed to an interior portion of the chamber. Also, a substrate processing system that includes a housing, a gas delivery system for introducing a seasoning gas into a vacuum chamber, where the gas delivery system comprises one or more aluminum nitride nozzles exposed to the vacuum chamber, a controller and a memory having a program having instructions for controlling the gas delivery system to flow a seasoning gas that has an oxygen to silane ratio greater than or equal to about 1.6:1 to deposit a silicon oxide film on the aluminum nitride nozzles.

A high density plasma chemical vapor deposition apparatus includes an upper gas supply nozzle which includes a nozzle body, a gas supply passage formed vertically in the nozzle body, a nozzle cover attached to a lower surface of the horizontal portion of the nozzle body, and a plurality of gas inlets formed through the nozzle cover to uniformly supply the processing gas towards a semiconductor wafer within the processing chamber.

An apparatus for treating a thin film on a substrate includes a stage on which the substrate is disposed. A gas shield faces the substrate. An energy source irradiates a part of the substrate with light emitted therefrom through a retention space of the gas shield. A dispense unit includes a pin nozzle that injects a reaction gas towards the part of the substrate.

The invention relates to an impulse chamber which can be used for expelling an amount of a fluid compound at a high pressure. The impulse chamber comprises a variable-volume impulse chamber adapted for containing a volume of a flowable drug, an outlet nozzle in fluid communication with the impulse chamber and being adapted to be arranged against the skin of a subject, and a fluid inlet in fluid communication with the impulse chamber. The impulse chamber is defined substantially by a deformable chamber portion, such that deformation thereof reduces the volume of the cavity. In an exemplary embodiment the compressible chamber portion is in the form of an elastomeric tube, this providing a simple, yet reliable and cost-effective impulse chamber unit.

An inkjet printing arrangement having a series of nozzles for the ejection of ink wherein the nozzle rims are formed as a result of the deposition of a rim material layer and a subsequent planar etching of the material layer so as to form the nozzle rim. The planar etching can comprise chemical-mechanical planarization of the rim material layer and any associated sacrificial layers.

Contamination of a substrate can be prevented or suppressed. A substrate processing apparatus includes a reaction tube having an inner space divided by a barrier wall into a film forming space and a plasma generating space. When a desired film is formed on a substrate placed inside the reaction tube, first and second processing gases are supplied to the reaction tube through nozzles. On the other hand, when a part of the reaction tube constituting the plasma generating space is coated with a film, second and third processing gases are supplied to the plasma generating space through the nozzle.

A pyrolytic reactor comprising a fuel injection zone, a combustion zone adjacent to the fuel injections zone, an expansion zone adjacent to the combustion zone, a feedstock injection zone comprising a plurality of injection nozzles and disposed adjacent to the expansion zone, a mixing zone configured to mix a carrier stream and feed material and disposed adjacent to the feedstock injection zone, and a reaction zone adjacent to the mixing zone. The plurality of injection nozzles are radially distributed in a first assembly defining a first plane transverse to the feedstock injection zone and in a second assembly transverse to the feedstock injection zone.

A nasal assembly for delivering breathable gas to a patient includes a frame having an integrally formed first connector portion. A nozzle assembly includes a gusset or base portion and a pair of nozzles. At least one inlet conduit is structured to deliver breathable gas into the frame and nozzle assembly for breathing by the patient. A pair of second connector portions are removably and rotatably connected to respective first connector portions of the frame and are in communication with respective inlet conduits, e.g., directly or via angle connectors. A headgear assembly is removably connected to the pair of second connector portions and / or the angle connectors so as to maintain the frame and the nozzle assembly in a desired adjusted position on the patient's face.

An inhaler for multiple dosed administration of a pharmacological dry powder consists externally of a housing (100,150) and of a protective cap (950) which can be removed from a special mouthpiece (900) fitted on the housing. Arranged on the inside there are a slide rail (200), a dosing slide (300), a shutter (400), a carriage (500), a funnel arrangement (600), a counter device (700), a valve shield (800) and a valve guide (850). Removal of the protective cap (950) initiates the dosing, with a dose received in the dosing cavity (302) being transported to the mouth-piece (900) by means of the dosing slide (300). Only upon application of a defined minimum intensity of inhalation is the shutter (400) moved by the suctioned valve shield (800), as a result of which the dose is released for inhalation. Completed with an electronic module and a controllable nozzle, all inhalation-relevant data can be recorded and the flow conditions regulated.

A nasal assembly for delivering breathable gas to a patient includes a frame having an integrally formed first connector portion. A nozzle assembly includes a gusset or base portion and a pair of nozzles. At least one inlet conduit is structured to deliver breathable gas into the frame and nozzle assembly for breathing by the patient. A pair of second connector portions are removably and rotatably connected to respective first connector portions of the frame and are in communication with respective inlet conduits, e.g., directly or via angle connectors. A headgear assembly is removably connected to the pair of second connector portions and / or the angle connectors so as to maintain the frame and the nozzle assembly in a desired adjusted position on the patient's face.

Provided is a processing container formed of a reaction tube and a manifold that supports the reaction tube from below, and adapted to process a substrate inside, a nozzle adapted to supply a processing gas to the substrate, and a connecting portion adapted to erect the nozzle inside the processing container. The connecting portion includes (1) a fixing portion formed of a cylindrical portion inserted into an introduction portion provided at the manifold, and a flange plate formed at an end portion of the cylindrical portion, and (2) a detachable portion formed of an elbow engaged with the flange plate, and an installation portion in which the nozzle is installed.