An apparatus constructed with a plural of independent reactors for depositing thin films is provided. The apparatus includes a chamber consisting of a base plate, a chamber wall and a chamber cover. A plural of identical and independent reactors are mounted inside the chamber, and each reactor has two parts; a reactor
lower body and a reactor upper body, where the reactor upper body is fixed to the chamber cover and the reactor
lower body is fixed to the base plate and moves up and down, thereby the up position of the reactor
lower body makes a contact with the reactor upper body and thus providing a vacuum-tight
processing space. Since a plural of identical and independent reactors are used, the
processing steps and conditions developed for a single
substrate type of reactor can be used for multiple reactors with minor adjustments, by utilizing a relatively symmetrical process
gas supply inlet tube and process gas inlet tube and process gas exhaust tube arrangements. Such an arrangement also leads to high
throughput, low cost and compact designs with tight footprints.