The invention provides a microfabrication process for a micro capacitor based on a cobaltosic oxide nano structure. The micro capacitor microfabrication process includes the steps of mask manufacturing, ultraviolet photolithography, physical vapor deposition, stripping flotation and fast annealing treatment, the photosensitive property of photoresist is used, a sample with photoresist microstructural patterns is manufactured through mask manufacturing, ultraviolet photolithography and semiconductor machining processes, and the micro capacitor based on the cobaltosic oxide nano structure is manufactured through physical vapor deposition, stripping flotation and fast annealing treatment. The optimal process based on fast annealing and oxidizing is provided to manufacture the patterned cobaltosic oxide nanowire microstructure, the process fuses and uses related technologies in the semiconductor field and a micro-nano structure synthesizing method, the process is concise, the related technologies are mature, the process can be applied to mass production, and the obtained cobaltosic oxide nanowire microstructure is high in chemical stability and electrochemical performance.