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319results about How to "Low growth temperature" patented technology

Atomic layer deposition of metallic contacts, gates and diffusion barriers

ActiveUS20050042865A1High conformalityLow growth-temperaturesSolid-state devicesSemiconductor/solid-state device manufacturingSilicon nitrideNitrogen
The present invention provides metallic films containing a Group IVB or VB metal, silicon and optionally nitrogen by utilizing atomic layer deposition (ALD). In particularly, the present invention provides a low temperature thermal ALD method of forming metallic silicides and a plasma-enhanced atomic layer deposition (PE-ALD) method of forming metallic silicon nitride film. The methods of the present invention are capable of forming metallic films having a thickness of a monolayer or less on the surface of a substrate. The metallic films provided in the present invention can be used for contact metallization, metal gates or as a diffusion barrier.
Owner:GLOBALFOUNDRIES US INC

Solar blind ultraviolet photoelectric detector based on amorphous gallium oxide film and preparation method thereof

The invention discloses a solar blind ultraviolet photoelectric detector based on an amorphous gallium oxide film and a preparation method thereof, and belongs to the technical field of photoelectricdetectors. The method comprises the steps that the crystal face (0001) Al2O3 is adopted as a substrate, and the substrate is cleaned; then, the cleaned substrate is fed into a settling chamber, a radio frequency magnetic control sputtering technology is applied to the substrate to grow a gallium oxide film; finally, a hollow interdigital mask plate is used for shielding on the amorphous gallium oxide film, a direct current magnetic control sputtering method is adopted for sputtering an interdigital metal electrode on the interdigital mask plate to obtain the solar blind ultraviolet photoelectric detector, the structure is an MSM type sandwiched structure, and the Al2O3 substrate, the amorphous gallium oxide film material and the Ti/Au interdigital metal electrode are arranged from bottom to top. The manufacturing technology is simple, the repeatability is good, dark current is small, the stability is high, the response speed is high, the ultraviolet visible restrain ratio is high, andthe detector conforms to the energy-saving and emission-reducing theory, is suitable for large-scale production, and has the wide development prospect.
Owner:BEIJING UNIV OF POSTS & TELECOMM

Manufacturing method for cilicon epitaxial wafer for 6'' VDMOS tube

The present invention relates to a preparation method of silicon epitaxial wafer for power VDMOS tube. Firstly, selection and usage of substrate are important, the selected substrate not only can meet the requirements for device, but also can meet the requirements for epitaxy. Its preparation method includes the following steps: selecting proper gas corrosion flow and gas corrosion time, reducing concentration of gas corrosion impurity in epitaxial reactor so as to reduce self-doping in epitaxial growth process; first layer epitaxial growth, on the substrate surface with high concentration utilizing lower temperature to grow a layer of purity epitaxial layer, encapsulating substrate surface and edge, controlling its growth temperature, growth rate and epitaxial time so as to make encapsulating layer obtain ideal effect, at the same time, selecting proper epitaxial condition to make the deformation of epitaxial wafer be minimum; and second layer epitaxial growth, utilizing tower temperature to grow a layer of epitaxial layer whose resistivity and thickness can meet requirements for device.
Owner:NANJING GUOSHENG ELECTRONICS

Method for self-assembly growth of three-dimensional ordered polyporous material

ActiveCN101429049AOvercoming the disadvantage of not being able to self-assemble large-size colloidal spheres synergisticallyWill not affect the flowCeramicwareEvaporationSolvent
The invention relates to a method for self-assembly growth of three-dimensional orderly porous materials, which is a method for self-assembly growth of multi-component material colloid crystals with single structures or composite structures and three-dimensional orderly porous membranes by combining assistant acceleration of evaporation through characteristic infrared light and the control of the boiling temperature of a solvent by decompression. The method basically overcomes the defect that the prior method is not suitable for the situations of overlarge colloid particles, overhigh boiling point of the solvent in a colloidal solution system, no high temperature resistance of the colloid particles, incapability of completing crystal growth and so on when the prior method is applied to cooperated self-assembly growth of the multi-component colloid crystals and three-dimensional orderly porous materials of the multi-component colloid crystals. The method has the characteristics of high efficiency, easy control, simple operation and good repeatability, can grow the high-quality multi-component colloid crystals and the three-dimensional orderly porous membranes, and is suitable for self-assembly and cooperated self-assembly of multi-component colloid particle mixed systems with various particle diameters and various varieties.
Owner:INST OF PHYSICS - CHINESE ACAD OF SCI

Perovskite battery based on nanometer oxide electron transfer layer

The invention discloses a perovskite battery based on a nanometer oxide electron transfer layer. According to the structure, the perovskite battery comprises a first electrode, the nanometer oxide electron transfer layer, a perovskite structure light absorption layer, a hole transporting layer and a counter electrode. A two-dimension nanometer structure is a nanoscale titanium dioxide film and a zinc oxide film or a multiple-layer film based on titanium dioxide, zinc oxide and aluminum oxide. A one-dimension nanometer structure is nanoscale titanium dioxide and zinc oxide which are in the shape of a tube or a wire or a rod or a composite nanoscale structure which is in the shape of a tube or a wire or a rod and based on titanium dioxide, zinc oxide and aluminum oxide. The perovskite battery based on the nanometer oxide electron transfer layer has the advantages that the manufacturing process is simple, the growth temperature of the nanometer oxide electron transfer layer is low, and the quality of the nanometer oxide electron transfer layer is high; in addition, the perovskite battery based on the nanometer oxide electron transfer layer can be used in not only a hard substrate but also a flexible substrate.
Owner:SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI

Three-dimensional Cu2S@ZnO nanometer heterostructure semiconductor material and preparation method thereof

The invention discloses a three-dimensional Cu2S@ZnO nanometer heterostructure semiconductor material. The three-dimensional Cu2S@ZnO nanometer heterostructure semiconductor material comprises ZnO nanometer-particle crystals and a CU2S nanometer-flower structure substrate material, wherein the ZnO nanometer-particle crystals are uniformly covered on the CU2S nanometer-flower structure substrate material; the CU2S nanometer-flower structure substrate material consists of Cu2S nanometer-sheets; and a P-N junction is formed at the interface of the ZnO nanometer-particle crystals and the Cu2S nanometer-flower structure. The invention further discloses a preparation method of the three-dimensional Cu2S@ZnO nanometer heterostructure semiconductor material. The preparation method comprises the following steps of: synthesizing the Cu2S nanometer-flower crystals and ZnO nanometer-particle crystals by adopting a hydrothermal synthesis method, respectively; and uniformly compounding the ZnO nanometer particles on the Cu2S nanometer-sheets by using PEI (Polyether Imide) as an auxiliary material to obtain the three-dimensional Cu2S@ZnO nanometer heterostructure semiconductor material. The three-dimensional Cu2S@ZnO nanometer heterostructure semiconductor material has the advantages of being low in cost, low in growth temperature, high in repeatability and the like, and also has great development application potential in the on-spot emission field and the photo-catalysis field.
Owner:EAST CHINA NORMAL UNIV

Method of preparing three-dimensional graphene glass composite

The invention discloses a method of preparing a three-dimensional graphene glass composite, which comprises the steps of providing a glass substrate, and directly growing graphene on the surface of the glass substrate by a plasma-enhanced chemical vapor deposition method. Compared with graphene glass prepared by the traditional transfer and oxidation reduction method, the preparation method is simple; cohesion with the glass substrate is high; vertical height control of a graphene nanosheet is precise; and the repeatability is high. In addition, the preparation method adopts the most common soda lime glass in daily life of people, so that compared with quartz glass and sapphire glass used in other experiments, the cost is greatly lowered. The method can realize uniform, controllable and quick preparation of graphene glass below the glass softening point temperature (600 DEG C), requires no catalyst, greatly simplifies a preparation growth technology of the graphene glass, and provides a premise for a subsequent industrial application.
Owner:PEKING UNIV

Gallium nitride-based light emitting diode epitaxial wafer and manufacturing method thereof

The invention discloses a gallium nitride-based light emitting diode epitaxial wafer and a manufacturing method thereof, and belongs to the field of a semiconductor technology. The gallium nitride-based light emitting diode epitaxial wafer comprises a sapphire substrate, and an AlN buffer layer, a 3D nucleating layer, a non-doped GaN layer, an N type layer, a multi-quantum-well layer, an electronbarrier layer and a high-temperature P type layer which are laminated on the sapphire substrate in sequence; the 3D nucleating layer comprises a first sub layer and a second sub layer; the first sub layer is a GaN layer grown at a temperature of 800-1,100 DEG C; and the second sub layer is a GaN layer grown at a temperature of 1,000-1,200 DEG C. The lower the growth temperature of the first sub layer is, the formed crystal particles are smaller and more intensive; the crystal particles are stretched and deformed to close gaps to lower surface energy, so that tensile stress is generated, and the epitaxial wafer is to be concave, thereby improving warping and improving wavelength concentration degree; and the temperature of the second sub layer is higher, the surface energy of the crystal particles is lower, so that it is ensured that warping of the whole epitaxial wafer is not caused, thereby improving the photoelectric performance of the LED chip.
Owner:HC SEMITEK SUZHOU

Calcium germinate nanowire and preparation method thereof

The invention provides a calcium germinate nanowire and a preparation method thereof, and belongs to the technical field of nano material preparation. The calcium germinate nanowire provided by the invention is prepared from monocrystalline calcium germinate with the diameter of between 20 to 100nm and the length of more than 100 mu m. In the preparation method, different calcium sources and germanium dioxide are taken as raw materials, and water is taken as a solvent, wherein the calcium sources are calcium acetate, calcium chloride or nitrate of lime; a molar ratio of calcium to germanium in the raw materials is 2:1; the preparation method comprises the following steps of: putting the germanium dioxide and the calcium-containing raw material into a stirrer, and adding the water and stirring; and placing mixed solution obtained after stirring into a sealed container, and then preserving the heat for 1 to 24 hours at the temperature of between 100 and 200 DEG C to obtain a white fluffy product, namely the calcium germinate nanowire. In the invention, the nontoxic germanium dioxide and the different calcium sources are used, and the water is taken as the solvent, so that the raw materials and the preparation process do not pollute the environment, and the preparation method accords with a development direction of the modern industry with the environmental-friendly requirement, and can realize environmental-friendly mass preparation for the calcium germinate nanowire.
Owner:ANHUI UNIVERSITY OF TECHNOLOGY
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