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Laminated transparent electrode and preparation method thereof

A transparent electrode, lamination technology, applied in cable/conductor manufacturing, circuits, electrical components, etc., can solve the problems of weak adsorption force, large connection resistance, unsatisfactory transparent electrode materials and technology, etc., to achieve smooth surface, resistivity Effects of low, low preparation and growth temperatures

Inactive Publication Date: 2015-04-08
NORTHEAST NORMAL UNIVERSITY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the metal nanowires dispersed on the transparent substrate through the coating process have weak adsorption to the substrate, and the connection resistance between adjacent nanowires is relatively large, which often requires additional thermal annealing or laser treatment to improve its Conductivity
[0003] To sum up: new transparent electrodes need to have high electrical conductivity and light transmittance, and should be prepared at the lowest possible cost of raw materials and processes, but the current transparent electrode materials and technologies are still unsatisfactory

Method used

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  • Laminated transparent electrode and preparation method thereof
  • Laminated transparent electrode and preparation method thereof
  • Laminated transparent electrode and preparation method thereof

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Embodiment

[0050] 1. First, degrease and clean the 4cm×4cm glass substrate according to the standard chemical cleaning procedure, and the cleaning agent used is a commercial common glass cleaning agent. After rinsing with deionized water, dry it in an oven at 150°C before use.

[0051] 2. At room temperature, utilize magnetron sputtering equipment to deposit a titanium dioxide film on the above-mentioned clean glass substrate. Wherein, the deposition power is 200 watts, the gas used for deposition is a mixture of argon and oxygen, and the corresponding flow ratio is 3:1. The deposition time is 2 minutes, and the thickness of the formed titanium dioxide film is 8nm;

[0052] 3. Deposit a 80nm copper layer on the surface of the titanium dioxide film by vacuum evaporation; when evaporating, the temperature of the glass substrate is controlled at 200°C by a heater. Film thickness can be controlled by film thickness monitoring device;

[0053] 4. Place the glass substrate on which the copp...

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Abstract

The invention provides a laminated transparent electrode and a preparation method thereof. The laminated transparent electrode sequentially comprises a transparent substrate, a first-layer metal oxide film on the transparent substrate, a metal nanowire network layer on the first-layer metal oxide film, and a second-layer metal oxide film covering the metal nanowire network layer and the first-layer metal oxide film not covered by the metal nanowire network layer. A preparation method of the metal nanowire network layer comprises the steps of preparing a metal film layer on the first-layer metal oxide film, preparing a high-polymer nanofiber network on the metal film layer by using an electrostatic spinning technique, removing the metal film that is not covered by the high-polymer nanofiber network through etching by taking high-polymer nanofiber as a mask, and removing the high-polymer nanofiber network. The laminated transparent electrode has the advantages of high light transmissivity, low resistivity, firm contact with the substrate, smooth surface, low preparation and growth temperature, low cost and the like, and can be widely applied to various organic and inorganic photoelectric devices.

Description

technical field [0001] The invention belongs to the field of electrode preparation, and in particular relates to a laminated transparent electrode and a preparation method thereof. Background technique [0002] Optoelectronic devices such as touch screens, flat panel displays, and solar cells, which are widely used at present, all require transparent electrodes with good light transmission and conductivity. For transparent electrodes, surface resistance and light transmittance are the two main parameters that determine their quality and application. For example: the transparent electrode of a high-performance touch screen requires its light transmittance to be greater than 95%, but its surface resistance is allowed to be between 400Ω / □ and 600Ω / □; while solar cells and large-area displays require the surface resistance of transparent electrodes to be less than 20Ω / □. Traditional transparent electrodes mainly refer to doped metal oxides. Among them, ITO occupies more than ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14H01B13/00H01L31/0224H01L31/18
CPCY02P70/50
Inventor 马剑钢李鹏闫兴振徐海阳张昕彤刘益春
Owner NORTHEAST NORMAL UNIVERSITY
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