Method and apparatus for growing three-dimensional photon crystal film by pressure-reducing self-assembling

A photonic crystal and self-assembly technology, which is applied in crystal growth, single crystal growth, chemical instruments and methods, etc., to achieve the effect of wide application range and increased crystal growth speed

Inactive Publication Date: 2007-03-28
INST OF PHYSICS - CHINESE ACAD OF SCI
View PDF0 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to overcome the disadvantages of self-assembly and growth of three-dimensional photonic crystal films in the prior art, which are not suitable for situations where the colloidal particles are too large or the boiling point of the solvent in the colloidal solution system is too high or the colloidal particles are not resistant to high temperatures, and the growth time is too long , thereby providing a high-efficiency, easy-to-control, simple-to-operate, high-quality grown photonic crystal, good repeatability, self-assembled three-dimensional photonic crystal thin-film growth method that is suitable for any particle size and type of colloidal particles, decompression control solvent boiling point temperature and device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and apparatus for growing three-dimensional photon crystal film by pressure-reducing self-assembling
  • Method and apparatus for growing three-dimensional photon crystal film by pressure-reducing self-assembling

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1、235

[0036] Example 1. Preparation of 235nm three-dimensional polystyrene photonic crystal film

[0037] The preparation of the photonic crystal film is carried out on the device for self-assembled growth of the three-dimensional photonic crystal film provided by the present invention. The device is shown in Figure 1, including: a growth deposition bottle 1, a constant temperature device 2 installed outside, and a glass slide 3 fixed in the growth deposition bottle 1, wherein the growth deposition bottle is a sealed , The deposition bottle connected with the vacuum pumping system 6 through the vacuum pumping pipe joint 4 and the pumping pipe 5. The constant temperature device can be various conventional constant temperature heating devices.

[0038] On the above device, using the method of combining constant temperature and pressure reduction provided by the present invention to self-assemble and grow a 235nm three-dimensional polystyrene colloidal photonic crystal, the specific steps ...

Embodiment 2～9

[0046] Examples 2-9. Preparation of a series of polystyrene three-dimensional photonic crystal films with different particle diameters

[0047] According to the method in Example 1, a series of polystyrene three-dimensional photonic crystal films with different particle diameters were prepared, and the growth temperature and pressure are as listed in Table 1.

[0048] The transmittance spectrum of the series of polystyrene photonic crystal films along the direction of the crystal (111) was measured. The transmittance in the band gap and conduction band and the maximum slope of the band edge are listed in Table 1.

[0049] Table 1. Polystyrene three-dimensional photonic crystal films with different particle sizes and their optical properties

[0050]

Embodiment 10～13

[0051] Examples 10-13. Preparation of a series of silicon dioxide three-dimensional photonic crystal films with different particle diameters

[0052] According to the method in Example 1, using a mixed solution of ethanol and water of silica, the volume ratio of ethanol and water is 1:9, and a series of three-dimensional silica photonic crystal films with different particle diameters are prepared. The growth parameters are shown in the table. 2 listed.

[0053] The transmittance spectrum of incident light along the crystal (111) direction of this series of silicon dioxide photonic crystal films was measured. The transmittance in the band gap and conduction band and the maximum slope of the band edge are listed in Table 2.

[0054] Table 2. Silica three-dimensional photonic crystal films with different particle sizes and their optical properties

[0055]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
Login to view more

Abstract

The invention relates to a decompression self assembly growth method for 3D photons crystal film that takes 1-2 hours self assembly growth to monodisperse colloidal solution used for photons crystal at 8-90 degree centigrade and 0.5-50kPa to gain 3D photons crystal film. The invention also supplies a self assembly growth 3D photons crystal film device that includes a growth deposition bulb, thermostatic apparatus, and slide. The feature is that the deposition bulb is a sealed and connecting to vacuuming system through vacuuming joint and vacuuming pipe. The method could grow 1cm length, 5-20 layers colloid particle thickness 3D photons crystal film in a short time, and the optical quality is very good.

Description

Technical field [0001] The invention relates to a method and a device for growing a three-dimensional photonic crystal film by self-assembly under reduced pressure. Background technique [0002] The concept of photonic crystal was independently proposed by E. Yablonovich and S. John in 1987. It is an artificial crystal formed by periodically arranging two or more materials with different dielectric functions in space. The photonic crystal has a photonic band gap and can adjust the propagation state of photons in it. This unique function makes it have a wide range of application prospects in the field of integrated photonic devices and optical communications. [0003] The preparation methods of photonic crystals mainly include micro-machining and etching techniques, methods of using multi-beam interference to generate periodic distribution of light intensity, and self-assembly methods of particles including electrostatic self-organized growth method and gravity sedimentation metho...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C18/00C30B7/02
Inventor 孟庆波郑中玉
Owner INST OF PHYSICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap