Three-dimensional Cu2S@ZnO nanometer heterostructure semiconductor material and preparation method thereof
A nano-heterostructure, semiconductor technology, applied in the direction of nanotechnology, nanotechnology, chemical instruments and methods, etc., can solve the problems of inapplicability to large-scale industrial production, high production costs, harsh reaction conditions, etc., and meet the requirements of reducing equipment , low cost and simple method
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0029] In this example, the three-dimensional Cu 2 The specific preparation steps of SZnO nano-heterostructure semiconductor material are as follows:
[0030] a. Mix 0.5g of cuprous chloride, 0.4g of thiourea and 0.25g of PVP, dissolve in 40mL of 95% ethanol and stir thoroughly for 30 minutes.
[0031] b. Then transfer the mixed solution into a 50mL reaction kettle, place the reaction kettle in a vacuum oven and heat it at 180°C for 6h, when the reaction is finished and cool to room temperature, collect the black reaction product and wash it repeatedly with absolute ethanol and deionized water several times.
[0032] c. Dry the pure sample in a vacuum oven at 60°C for use. Among them, the sample here refers to Cu 2 S sample, that is, the prepared flower-like Cu 2 S nanostructured substrate materials.
[0033] d. Add 10mL of urea solution (2M) dropwise to 10mL of ZnCl (0.5M), then dissolve it in 80mL of deionized water, stir the mixed solution magnetically for 30min and th...
PUM
Property | Measurement | Unit |
---|---|---|
diameter | aaaaa | aaaaa |
diameter | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com