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A miniature current heating rapid annealing furnace and heating fixture

A heating fixture and annealing furnace technology, applied in electric furnace heating, lighting and heating equipment, furnaces and other directions, can solve the problems of slow heating, large volume and high energy consumption of annealing furnaces, achieve rapid heating, high flexibility, and improve thermal energy utilization rate effect

Active Publication Date: 2021-08-03
JIANGSU UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Based on this, the present invention provides a new type of micro-current heating rapid annealing furnace, which uses the Joule heat generated when a large current passes through the sample to perform rapid annealing, and is used to solve the problems of slow temperature rise, large volume, high energy consumption, and high cost

Method used

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  • A miniature current heating rapid annealing furnace and heating fixture
  • A miniature current heating rapid annealing furnace and heating fixture
  • A miniature current heating rapid annealing furnace and heating fixture

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Embodiment Construction

[0031] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0032] Such as figure 1 It is a two-dimensional schematic diagram of the current heating rapid annealing furnace of the present invention, including an observation window 1, a protective cover 2, a heating fixture 3, a support column 4, a support plate 5, a connecting wire 6, a vacuum-sealed electrode flange 7, a heating electrode positive electrode 8, Heating electrode negative pole 9, bolt 10, air intake pipe 11, flow meter 12, air intake valve 13, air release pipe 14, air release valve 15, air outlet pipe 16, base 17, insulating ceramics 18, DC power cord 19, air outlet valve 20.

[0033] The vacuum cavity is connected by the protective cover 2 and the vacuum-sealed electrode flange 7 through the CF flange, which can reach a high vacuum level. Further, the upper side of the protective cover 2 is provided with an observation window ...

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Abstract

The invention discloses a micro-current heating rapid annealing furnace and a heating fixture, which belong to the technical field of heat treatment equipment and mainly include: a vacuum cavity, a heating system, an air outlet pipeline, an air inlet pipeline and a gas discharge pipeline. The heating system consists of an alumina support plate, a current heating fixture and a heating electrode. The invention can directly heat the semiconductor sample fixed on the fixture, or fix the heat-resistant metal sheet, such as tungsten, molybdenum, etc. on the fixture, place the sample on the metal sheet, and heat the sample with Joule heat after electrification. The invention is suitable for small-sized samples, and can be used for high-vacuum rapid annealing, inert gas atmosphere annealing, and the like for samples of different sizes. The invention adopts electric current heating, and has the characteristics of fast heating speed, low energy consumption, small occupied volume and the like.

Description

technical field [0001] The invention relates to the technical field of heat treatment equipment, in particular to a miniature electric current heating rapid annealing furnace and a heating fixture. Background technique [0002] Rapid thermal annealing (RTA) is a conventional technical means in semiconductor processing technology. RTA technology refers to rapidly heating the wafer from ambient temperature to about 1000-1500K, keeping the wafer at this temperature for a period of time, and then cooling down. This technology is mainly used in high-temperature processes such as doping and impurity activation in the production of thin-film transistors and solar cells. [0003] The traditional tubular annealing device not only has a large volume and serious waste of heat energy, but also has a slow heating rate, which cannot meet the requirements of rapid annealing. At present, the methods of rapid annealing mainly include infrared radiation heating method and microwave heating m...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F27B17/00F27D11/02
CPCF27B17/0025F27D11/02
Inventor 郝秀春李宇翔
Owner JIANGSU UNIV
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