213 results about "Gallium arsenate" patented technology

The invention provides an LED gallium arsenide substrate dewaxing cleaning agent which comprises the following components in percentage by weight: 5 percent to 10 percent of organic solvent, 2 percent to 5 percent of organic alkali, 5 percent to 10 percent of surfactant, 5 percent to 20 percent of inorganic salt and the balance of de-ionized water. The organic solvent is alkane, naphthenic hydrocarbon or aromatics solvent; the organic alkali is polyhydric polyamine, pegamine, hydroxylamine or hydramine, the surfactant is one or more than one of fatty alcohol polyoxyethylene ether, polyol ester and macromolecule and element organic compounds, and inorganic salt is basic salt. In the invention, the LED gallium arsenide substrate dewaxing cleaning agent can replace halogenated hydrocarbon solvent, not only can achieve the cleaning effect of halogenated hydrocarbon solvent with obvious dewaxing effect, and but also has no influence on gallium arsenide substrate and simple preparation process, and can meet the requirement of environment protection.

The invention relates to a treatment method for removing arsenic and COD in wastewater in gallium arsenide wafer production treatment simultaneously and belongs to the technical field of wastewater treatment. The method includes delivering waste water to an adjusting reaction tank, removing dichlord isocyanurice acid in raw water through the oxidation-reduction reaction and lifting wastewater subjected to the treatment to a coagulating precipitation tank through a pump to conduct sequential batch type coagulating sedimentation reaction. The process flow sequentially includes water feeding, chemical feeding, coagulating, precipitating and water discharging. Treated wastewater is lifted to a sequential batch type activated sludge tank from a middle tank through the pump to be subjected to aerobic biological treatment. The process flow sequentially comprises water feeding, aeration, sedimentation and water discharging. The arsenic and COD density in finally discharged water can achieve the standard of one-grade B in<<pollutant discharge standard of town wastewater treatment factory>>(GB18918-2002). The treatment method can simultaneously remove pollutants including arsenic, dichlord isocyanurice acid, COD and the like in the wastewater in gallium arsenide wafer production treatment, is high in treatment efficiency and high in operation stability.