24962results about "Radiation pyrometry" patented technology

The present invention relates to optical confinements, methods of preparing and methods of using them for analyzing molecules and / or monitoring chemical reactions. The apparatus and methods embodied in the present invention are particularly useful for high-throughout and low-cost single-molecular analysis.

An instrument for evaluating fluorescence of a heterogeneous tissue includes means for exciting a two-dimensional portion of the tissue surface with excitation radiation at a plurality of excitation wavelengths, means for collecting emission radiation from the two-dimensional portion of the tissue surface simultaneously with excitation of the portion, and means for forming a two-dimensional excitation-emission map of the excitation radiation and the simultaneously collected emission radiation and spatially averaging the excitation and emission radiation.

Embodiments of the present disclosure include an oximeter sensor system including a reusable portion including a substantially rigid connector connected to an end of a cable. The substantially rigid connector includes an electronic element housing at least one electronic component of a probe. The system also includes a disposable portion including a flexible wrap comprising a substantially rigid connection port shaped to receive the substantially rigid connector in a releasably securable manner.

Embodiments of the present disclosure include an optical probe capable of communicating identification information to a patient monitor in addition to signals indicative of intensities of light after attenuation by body tissue. The identification information may indicate operating wavelengths of light sources, indicate a type of probe, such as, for example, that the probe is an adult probe, a pediatric probe, a neonatal probe, a disposable probe, a reusable probe, or the like. The information could also be utilized for security purposes, such as, for example, to ensure that the probe is configured properly for the oximeter, to indicate that the probe is from an authorized supplier, or the like. In one preferred embodiment, coding resistors could be provided across the light sources to allow additional information about the probe to be coded without added leads. However, any device could be used without it being used in parallel.

A network for power transmission to a receiver that converts the power into current includes a first node for transmitting power wirelessly in a first area. The first area has a minimum electric or magnetic field strength. The network includes a second node for transmitting power wirelessly in a second area. The second area has a minimum electric or magnetic field strength and overlaps the first area to define an overlap area. In another embodiment, the network includes a source in communication with the first and second nodes which provides power to them. Also disclosed are methods for power transmission to a receiver that converts the power into current.

A system for monitoring a process inside a high temperature semiconductor process chamber by capturing images is disclosed. Images are captured through a borescope by a camera. The borescope is protected from high temperatures by a reflective sheath and an Infrared (IR) cut-off filter. Images can be viewed on a monitor and can be recorded by a video recording device. Images can also be processed by a machine vision system. The system can monitor the susceptor and a substrate on the susceptor and surrounding structures. Deviations from preferred geometries of the substrate and deviations from preferred positions of susceptor and the substrate can be detected. Actions based on the detections of deviations can be taken to improve the performance of the process. Illumination of a substrate by a laser for detecting deviations in substrate geometry and position is also disclosed.

Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.

A method for supplying gas over a substrate in a reaction chamber wherein a substrate is placed on a pedestal, includes: supplying a first gas from a first side of the reaction chamber to a second side of the reaction chamber opposite to the first side; and adding a second gas to the first gas from sides of the reaction chamber other than the first side of the reaction chamber so that the second gas travels from sides of the substrate other than the first side in a downstream direction.

A UV light irradiating apparatus for irradiating a semiconductor substrate with UV light includes: a reactor in which a substrate-supporting table is provided; a UV light irradiation unit connected to the reactor for irradiating a semiconductor substrate placed on the substrate-supporting table with UV light through a light transmission window; and a liquid layer forming channel disposed between the light transmission window and at least one UV lamp for forming a liquid layer through which the UV light is transmitted. The liquid layer is formed by a liquid flowing through the liquid layer forming channel.

Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.

Apparatus for dynamic surface annealing of a semiconductor wafer includes a source of laser radiation emitting at a laser wavelength and comprising an array of lasers arranged in rows and columns, the optical power of each the laser being individual adjustable and optics for focusing the radiation from the array of lasers into a narrow line beam in a workpiece plane corresponding to a workpiece surface, whereby the optics images respective columns of the laser array onto respective sections of the narrow line beam. A pyrometer sensor is provided that is sensitive to a pyrometer wavelength. An optical element in an optical path of the optics is tuned to divert radiation emanating from the workpiece plane to the pyrometry sensor. As a result, the optics images each of the respective section of the narrow line beam onto a corresponding portion of the pyrometer sensor. The apparatus further includes a controller responsive to the pyrometry sensor and coupled to adjust individual optical outputs of respective columns of the laser array in accordance with outputs of corresponding portions of the pyrometry sensor.

The invention comprises a method and apparatus for enhancing the analysis of noninvasive spectra, resulting in improved analytical performance. More particularly, the invention comprises a method and apparatus for processing noninvasive spectra with an analyte filter that preferably rejects variation likely to be detrimental to the measurement system, while passing signal that probabilistically is unique to the target analyte. Subsequently, the analyte filtered data are used to estimate an analyte property, such as a glucose concentration, in the presence of noise, interferences, state changes, and / or across analyzers.

The present invention provides a luminaire system capable of generating light of a desired chromaticity and luminous flux output during continuous operation with varying ambient operating temperature. The luminaire system can be further capable of maintaining a desired correlated colour temperature during dimming of the luminaire. The luminaire system comprises one or more arrays of light-emitting elements for generating light with a current driver system coupled thereto for selectively supplying electrical drive current to each of the arrays, wherein the current driver system is responsive to drive signals received from a controller. The luminaire system further comprises an optical sensor system for generating optical signals representative of chromaticity and luminous flux output of the light. A heat sensing system is operatively coupled to the one or more arrays for generating signals representative of the junction temperatures of arrays of light-emitting elements during operation. The luminaire system further comprises a controller that is operatively connected to the current driver system, the optical sensor system and the heat sensing system for receiving the signals generated by each of these systems and is configured to generate one or more drive signals for transmission to the current driver system in response to the optical signals and thermal signals received from the optical system and the heat sensing system, respectively, thereby enabling a desired level of control of the output light.

The present invention is directed toward a fiber optic position and shape sensing device and the method of use. The device comprises an optical fiber means. The optical fiber means comprises either at least two single core optical fibers or a multicore optical fiber having at least two fiber cores. In either case, the fiber cores are spaced apart such that mode coupling between the fiber cores is minimized. An array of fiber Bragg gratings are disposed within each fiber core and a frequency domain reflectometer is positioned in an operable relationship to the optical fiber means. In use, the device is affixed to an object. Strain on the optical fiber is measured and the strain measurements correlated to local bend measurements. Local bend measurements are integrated to determine position and / or shape of the object.

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process.

A hyperspectral imaging system having an optical path. The system including an illumination source adapted to output a light beam, the light beam illuminating a target, a dispersing element arranged in the optical path and adapted to separate the light beam into a plurality of wavelengths, a digital micromirror array adapted to tune the plurality of wavelengths into a spectrum, an optical device having a detector and adapted to collect the spectrum reflected from the target and arranged in the optical path and a processor operatively connected to and adapted to control at least one of: the illumination source; the dispersing element; the digital micromirror array; the optical device; and, the detector, the processor further adapted to output a hyperspectral image of the target. The dispersing element is arranged between the illumination source and the digital micromirror array, the digital micromirror array is arranged to transmit the spectrum to the target and the optical device is arranged in the optical path after the target.