24505results about "Optically investigating flaws/contamination" patented technology

In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is foamed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and/or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure.

Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating or other structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The position of an image of the component structure varies between measurements, and a first type of correction is applied to reduce the influence on the measured intensities, caused by differences in the optical path to and from different positions. A plurality of structures may be imaged simultaneously within the field of view of the optical system, and each corrected for its respective position. The measurements may comprise first and second images of the same target under different modes of illumination and/or imaging, for example in a dark field metrology application. A second type of correction may be applied to reduce the influence of asymmetry between the first and second modes of illumination or imaging, for example to permit a more accurate overly measurement in a semiconductor device manufacturing process.

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent. The radiation that is reflected off the substrate is radially polarized.

A system for focusing light on an illumination area. The system includes a reflector having a focusing reflective surface and a focal region and an LED array having a plurality of LEDs located within the focal region. Each of the plurality of LEDs in the LED array is positioned to emit light toward the focusing reflective surface. The focusing reflective surface reflects light from each of the plurality of LEDs of the LED array toward the illumination area.

A camera assembly arranged on an unmanned and autonomously navigating aerial vehicle is employed to inspect a surface area of for material defects. The vehicle is automatically flown to the surface area from a launch site, wherein it can fly around obstacles using automatic obstacle detection and avoidance methods. A relative position of the aerial vehicle with respect to the surface area with the aid of a position sensor is continuously measured and a sequence of images of the surface area is recorded. Between the individual images, the aerial vehicle is moved along a flight path overlapping image details of the surface area. The images of the sequence are composed into an overall image of the surface area to allow for the surface area to be inspected for defects and the location of defects to be ascertained on the basis of the overall image.

Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.

Methods and systems for providing illumination of a specimen for a process performed on the specimen are provided. One system configured to provide illumination of a specimen for a process performed on the specimen includes a laser configured to generate excitation light. The system also includes focusing optics configured to focus the excitation light to a plasma in an electrodeless lamp such that the plasma generates light. The system is also configured such that the light illuminates the specimen during the process.

Methods and systems for inspection of wafers and reticles using designer intent data are provided. One computer-implemented method includes identifying nuisance defects on a wafer based on inspection data produced by inspection of a reticle, which is used to form a pattern on the wafer prior to inspection of the wafer. Another computer-implemented method includes detecting defects on a wafer by analyzing data generated by inspection of the wafer in combination with data representative of a reticle, which includes designations identifying different types of portions of the reticle. An additional computer-implemented method includes determining a property of a manufacturing process used to process a wafer based on defects that alter a characteristic of a device formed on the wafer. Further computer-implemented methods include altering or simulating one or more characteristics of a design of an integrated circuit based on data generated by inspection of a wafer.

A lighting system associated with a machine vision system. The machine vision system may direct lighting control commands to the lighting system to change the illumination conditions provided to an object. A vision system may also be provided and associated with the machine vision system such that the vision system views and captures an image(s) of the object when lit by the lighting system. The machine vision system may direct the lighting system to change the illumination conditions and then capture the image.

A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The signal processing subsystem comprises a series of data acquisition nodes, each dedicated to a collection detection module and a plurality of data reduction nodes, made available on a peer to peer basis to each data acquisition nodes. Improved methods for detecting signal in the presence of noise are also provided.

An aerial inspection system has at least one transmission line, an aerial vehicle, and a detection device coupled to the aerial vehicle. The detection device is configured to detect a condition of the transmission line as the aerial vehicle flies across the transmission line. The aerial vehicle may be in the form of a drone.

A system for acquiring, processing, storing, analyzing and reporting data relating to the condition of a road or other pavement surface (102) in real time. The system includes a digital camera (104) mounted on a vehicle and positioned relative to a pavement surface (102) so as to capture images of the pavement surface (102) while the camera (104) is moving relative to the surface (102). The system also includes an illumination assembly (100) to illuminate the region from which an image is taken and an interface between the digital camera (104) and at least one computer. The system also includes a processor in the computer for processing the images to detect and classify cracks and other pavement surface (102) features.

Apparatus for automatically inspecting a stream of matter comprises lamps which emit a detection medium, such as IR or visible light, to be active at the matter, a rotary polygonal mirror which receives from a multiplicity of detection zones at the matter detection medium which has been varied by variations in the matter, an optical detection device which receives the varied medium by reflection from the mirror, to detect a plurality of wavelengths of the varied medium substantially simultaneously, and to generate detection data in respect of that plurality of wavelengths substantially simultaneously and in dependence upon the variations in the medium, and a microprocessor which obtains the detection data from the device. The beams of the varied medium which are received at the device and emanate from the zones travel along respective paths from the matter to the mirror 9 which paths converge continuously with respect to each other from the matter to the mirror. Those paths may extend to the mirror indirectly by way of at least one planar mirror, or directly to the mirror, in which latter case the axis of the mirror would be substantially parallel to the direction of advance of the matter.