Method and system for controlling quality consistency of gallium arsenide product
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[0044] The preferred embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art, so as to define the protection scope of the present invention more clearly.
[0045] In this embodiment, the dielectric deposition, sputtering, sintering and other processes of the gallium arsenide production line are key processes, which directly affect the final product quality, and the final consistency of product quality is guaranteed through the prediction and feedback control of key processes. The process parameters of dielectric deposition are: temperature, pressure, gas flow, power. The process parameters of the sputtering process are: material purity, ion bombardment power, sputtering time, working pressure, and its quality characteristic parameter is the coating thickness; the process parameters of the sintering p...
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