The invention provides a preparation process for a high-silicon super-hard PVD coating. The preparation process comprises the following steps: I, pre-processing a workpiece surface; II, clamping and loading a workpiece; III, performing vacuum-pumping on a furnace chamber; IV, heating the workpiece; V, etching and cleaning a target material and the workpiece; VI, preparing a high-silicon coating; VII, cooling the workpiece. The preparation process is used for obtaining the high-silicon super-hard PVD coating by controlling vacuum degree of a film-coating furnace chamber, bias voltage of a base body, a flow rate of nitrogen gas, target current and the like, wherein the flow rate of the reaction gas nitrogen gas (N2) ranges from 130 sccm to 210 sccm, the bias voltage of the base body ranges from 40 V to 120 V, and the vacuum degree of the furnace chamber ranges from 0.005 mbar to 0.060 mbar. By changing the element components of the coating, high silicon element content is obtained, so that the coating has characteristics of relatively high strength, hardness, wear resistance, high-temperature stability and corrosion resistance. A coating tool prepared by the process can be used for cutting a material with hardness of HRC65, and has relatively good using performances in comparison with a conventional coating.