Epitatial thin films for use as buffer
layers for high temperature superconductors, electrolytes in
solid oxide fuel cells (SOFC),
gas separation membranes or
dielectric material in electronic devices, are disclosed. By using CCVD, CACVD or any other suitable
deposition process, epitaxial films having pore-free, ideal grain boundaries, and dense structure can be formed. Several different types of materials are disclosed for use as buffer
layers in high temperature superconductors. In addition, the use of epitaxial thin films for electrolytes and
electrode formation in SOFCs results in densification for pore-free and ideal
gain boundary / interface
microstructure.
Gas separation membranes for the production of
oxygen and
hydrogen are also disclosed. These
semipermeable membranes are formed by high-quality, dense, gas-tight, pinhole free sub-micro scale
layers of mixed-conducting oxides on porous
ceramic substrates. Epitaxial thin films as
dielectric material in capacitors are also taught herein. Capacitors are utilized according to their
capacitance values which are dependent on their
physical structure and
dielectric permittivity. The epitaxial thin films of the current invention form low-loss dielectric layers with extremely high
permittivity. This high
permittivity allows for the formation of capacitors that can have their
capacitance adjusted by applying a
DC bias between their electrodes.