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63 results about "Stress management" patented technology

Stress management is a wide spectrum of techniques and psychotherapies aimed at controlling a person's level of stress, especially chronic stress, usually for the purpose of and for the motive of improving everyday functioning. In this context, the term 'stress' refers only to a stress with significant negative consequences, or distress in the terminology advocated by Hans Selye, rather than what he calls eustress, a stress whose consequences are helpful or otherwise.

Stress management for tensile films

The formation of a gap-filling silicon oxide layer with reduced tendency towards cracking is described. The deposition involves the formation of a flowable silicon-containing layer which facilitates the filling of trenches. Subsequent processing at high substrate temperature causes less cracking in the dielectric film than flowable films formed in accordance with methods in the prior art. A compressive liner layer deposited prior to the formation of the gap-filling silicon oxide layer is described and reduces the tendency for the subsequently deposited film to crack. A compressive capping layer deposited after a flowable silicon-containing layer has also been determined to reduce cracking. Compressive liner layers and compressive capping layers can be used alone or in combination to reduce and often eliminate cracking. Compressive capping layers in disclosed embodiments have additionally been determined to enable an underlying layer of silicon nitride to be transformed into a silicon oxide layer.
Owner:APPLIED MATERIALS INC

Closed-loop, rapid manufacturing of three-dimensional components using direct metal deposition

Multiple criteria are monitored and controlled to enhance the success of direct-metal deposition, including greater control over factors such as deposit layer height / thickness, sub-harmonic vibration, contour path shape, powder mass flow, and deposition speed, and stress accumulation. Sensors are used to monitor some or all of the following parameters during the deposition process: deposit height, width, temperature, and residual stress. A predetermined limit with respect to the yield strength of the material is preferably set. If the stress exceeds that limit sensors will automatically introduce one or more remedial measures, the priority of which is established using a look-up table generated in accordance with prior experimental knowledge. To control temperature induced distortion and stress, an infrared temperature detector may be used in conjunction with a controller to reduce temperature, increase speed and decreased power for purpose of stress management.
Owner:DM3D TECH

Dynamic wafer stress management system

Systems and techniques for characterizing samples using optical techniques are described. Light may be incident on a sample in the form of a pre-defined pattern which impinges on a wafer surface, and a reflection of the pattern is detected at a detector. Information indicative of changes in the pattern after reflection may be used to determine one or more sample characteristics and / or one or more pattern characteristics, such as stress, warpage, and curvature. The light may be coherent light of a single wavelength, or may be light of multiple wavelengths, and the pattern may be generated by transmission of the light through a diffraction grating, or hologram. The light source may be incoherent or multi-wavelength, and the pattern may be generated by imaging a pattern disposed on a mask on the sample and re-imaging the pattern at the detector.
Owner:WAFERMASTERS

Method for culturing fingerlings of large-sized Erythroculter ilishaeformis

The invention relates to a method of culturing Erythroculter ilishaeformis fish fries of large specifications. The method comprises the following steps: stocking the fish fries of Erythroculter ilishaeformis adult fishes in the water area which is relatively small and easily controlled with the reasonable density; providing rich water, stress management, and the feeding of fish meals; controlling the water environment and the disease occurrences in the culturing process; and obtaining the Erythroculter ilishaeformis fish fries with the average weight of each one being above 50g after 120-150 days of culture, and the specification being 15-18cm. Compared with the other inorganic and organic water fertilizing methods, the invention adopts the fertilizing method of using the zymotechnics of multiplicity of microbe groups, so as to reduce the pollution to the feeding environment of the pond by fertilizer water and achieve the purpose of emission reduction. In addition, the content of various beneficial bacterium groups in the pond is increased through the fertilizing method of using the zymotechnics of multiplicity of microbe groups, thus being favorable to the culturing of food organisms, thereby decreasing the number of pathogens, and reducing the occurrence of various diseases.
Owner:FRESHWATER FISHERIES RES CENT OF CHINESE ACAD OF FISHERY SCI

Adaptive interactive media server and behavior change engine

Presenting content to users in an interactive content presentation system. The content presented is dynamically selected at the time of presentation, in response to information available about those users at the time of presentation. Dynamic selection is in response to substantially all information available about those users at the time. Dynamic selection can include choices of particular content, the method or modality of presentation, the information included, as determined by rules for dynamic selection provided by an author. A method in which content is presented to users to encourage those users to modify their health-related behavior, such as related to improvement of dietary considerations, activity and exercise considerations, sleep considerations, and stress management considerations. In another example, the method includes a method in which content is presented to users to encourage those users to make other and further improvements, such as teaching users to manage their retirement accounts.
Owner:REDBRICK HEALTH

Combined type tasking time-driven chronic disease preventing control and health managing method

The invention relates to a combined type tasking time-driven chronic disease preventing control and health managing method. The method is designed for a health managing project for a chronic disease preventing control and health managing service, planning an execution time rhythm of the health managing project in different managing stages for the chronic disease risk and risk grade, establishing a time-driven tasking health managing project group, and assembling, combining and forming a productized chronic disease preventing control and health managing service. According to the requirement of chronic disease management, the health managing service is matched and started for a managed object; the health information is collected and analyzed; the health state is assessed; PDCA cycle operation is performed in a time-driven health managing task sequence on the basis of health standard according to an energy balancing and psychological stress managing principle; a health managing technology is applied in a systematic, standard and processed form; a managing scheme is made; a health managing target is refined; the track is approached step by step; the intervening execution is enhanced; the health state is improved; the risk factor is controlled; and the purpose of chronic disease preventing control and health managing is achieved.
Owner:冯力新 +1

Method for assessing psychological stress management ability

ActiveCN107773256AAvoid insufficient stress levels and misjudgment problemsAvoid Assessment MistakesHealth-index calculationMedical automated diagnosisGuidelineComputer science
The invention relates to a method for assessing psychological stress management ability. The method comprises the following steps: setting task motivation, and setting a task required to be finished by a testee; establishing behavior indexes applicable to the task of all difficulty levels and having the same dimensions; verifying rationality of the behavior indexes; selecting physiological signals, determined to be under detection demand, of the testee and establishing physiological indexes under completion of the task of all difficulty levels; verifying rationality of the physiological indexes; determining a psychological stress management ability index S which is a function with the behavior indexes and the physiological indexes being independent variables when the task of all difficultylevels are completed; randomly selecting an alternative object to serve as the testee, obtaining the psychological stress management ability index of the testee and further obtaining the psychological stress management ability assessment standard; taking the psychological stress management ability assessment standard as the selection and evaluation criteria for qualification. The method can effectively and quantitatively assess the psychological stress management ability of the testee and is applied to selection of personnel on the basis of the psychological stress management ability and training effect evaluation.
Owner:PLA NAVY GENERAL HOSIPTAL

Stress management in BGA packaging

The present semiconductor structure includes a substrate having a planar surface, a semiconductor chip attached to the planar surface of the substrate, the chip preferably being of the same thickness as or thinner than the substrate, and a package body attached to the substrate and to the semiconductor chip. The semiconductor chip and substrate are sufficiently rigidly attached so that substantial force applied parallel to the planar surface of the substrate may be transmitted therebetween, reducing temperature-change stress on solder balls which connect the substrate with a PCB. The semiconductor chip with advantage is thinned to reduce the stress on the solder balls.
Owner:CYPRESS SEMICON CORP

Methods of forming reverse side engineered III-nitride devices

Group III-nitride devices are described that include a stack of III-nitride layers, passivation layers, and conductive contacts. The stack includes a channel layer with a 2DEG channel, a barrier layer and a spacer layer. One passivation layer directly contacts a surface of the spacer layer on a side opposite to the channel layer and is an electrical insulator. The stack of III-nitride layers and the first passivation layer form a structure with a reverse side proximate to the first passivation layer and an obverse side proximate to the barrier layer. Another passivation layer is on the obverse side of the structure. Defected nucleation and stress management layers that form a buffer layer during the formation process can be partially or entirely removed.
Owner:TRANSPHORM INC
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