78 results about "Reactive deposition" patented technology

Light reactive deposition can be adapted effectively for the deposition of one or more electrochemical cell components. In particular, electrodes, electrolytes, electrical interconnects can be deposited form a reactive flow. In some embodiments, the reactive flow comprises a reactant stream that intersects a light beam to drive a reaction within a light reactive zone to produce product that is deposited on a substrate. The approach is extremely versatile for the production of a range of compositions that are useful in electrochemical cells and fuel cell, in particular. The properties of the materials, including the density and porosity can be adjusted based on the deposition properties and any subsequent processing including, for example, heat treatments.

Methods for forming coated substrates can be based on depositing material from a flow onto a substrate in which the coating material is formed by a reaction within the flow. In some embodiments, the product materials are formed in a reaction driven by photon energy absorbed from a radiation beam. In additional or alternative embodiments, the flow with the product stream is directed at the substrate. The substrate may be moved relative to the flow. Coating materials can be formed with densities of 65 percent to 95 percent of the fully densified coating material with a very high level of coating uniformity.

Light reactive deposition can be adapted effectively for the deposition of one or more electrochemical cell components. In particular, electrodes, electrolytes, electrical interconnects can be deposited form a reactive flow. In some embodiments, the reactive flow comprises a reactant stream that intersects a light beam to drive a reaction within a light reactive zone to produce product that is deposited on a substrate. The approach is extremely versatile for the production of a range of compositions that are useful in electrochemical cells and fuel cell, in particular. The properties of the materials, including the density and porosity can be adjusted based on the deposition properties and any subsequent processing including, for example, heat treatments.

A lithium secondary battery comprises a negative electrode containing lithium metal or a material previously storing lithium as an active material, a positive electrode containing a positive active material, and an electrolyte containing a non-aqueous electrolyte solution. The positive active material is a thin film formed by depositing on a substrate from vapor phase or liquid phase and including an oxide containing at least iron as a main constituent by a sputtering method, a reactive deposition method, a vacuum deposition method, a chemical vapor deposition method, a spraying method, a plating method, or a method in combination of these methods.

Novel cyclic amides containing tin or lead are disclosed. These cyclic amides can be used for atomic layer deposition or chemical vapor deposition of tin or lead as well as their oxides, sulfides, selenides, nitrides, phosphides, carbides, silicides or borides or other compounds. Tin(IV) oxide, SnO2, films were deposited by reaction of a cyclic tin amide vapor and H2O2 or NO2 as oxygen sources. The films have high purity, smoothness, transparency, electrical conductivity, density, and uniform thickness even inside very narrow holes or trenches. Deposition temperatures are low enough for thermally sensitive substrates such as plastics. Suitable applications of these films include displays, light-emitting diodes, solar cells and gas sensors. Doping SnO2 with aluminum was used to reduce its conductivity, making material suitable as the active semiconductor layer in electron multipliers or transparent transistors. Deposition using the same tin precursor and H2S deposited tin monosulfide, SnS, a material suitable for solar cells.

The invention belongs to the technical field of metal and oxide coatings thereof, and discloses an Al-rich corundum structure Al-Cr-O thin film and a preparation method thereof. Firstly, a DC magnetron sputtering pure Cr target is used for preparing a pure Cr transition layer under the Ar gas condition and the matrix temperature ranging from 540 DEG C to 560 DEG , then the pulse DC negative bias voltage within the range from -150 V to -100 V is applied to a matrix, Ar+O2 mixed gas with the O2 partial pressure being 10%-12.5% is input, the matrix temperature is adjusted to range from 540 DEG Cto 560 DEG C, a radio frequency magnetron sputtering Al70Cr30 alloy target is used for reaction deposition, and the Al-rich corundum structure Al-Cr-O thin film is obtained. The thin film is composedof alpha-Al2O3 and alpha-(Al,Cr)2O3, and the maximum Al content can reach 39.9wt%.

An SixNy or SiOxNy liner is formed on a MOS device. Cobalt is then deposited and reacts to form an epitaxial CoSi2 layer underneath the liner. The CoSi2 layer may be formed through a solid phase epitaxy or reactive deposition epitaxy salicide process. In addition to high quality epitaxial CoSi2 layers, the liner formed during the invention can protect device portions during etching processes used to form device contacts. The liner can act as an etch stop layer to prevent excessive removal of the shallow trench isolation, and protect against excessive loss of the CoSi2 layer.

The invention provides a preparation method of an AlCrSiN / VSiN multi-layer nano-coating. The preparation method of the AlCrSiN / VSiN multi-layer nano-coating comprises the following steps that (a) cathode electric arcs are used for achieving evaporative deposition of an Al50Cr50N transition layer on the surface of a matrix; and (b) a VSi target is sputtered through a high-power pulse magnetic control power supply, a direct-current arc power supply is used for achieving cathode evaporation of an AlCrSi target, and reactive deposition of the AlCrSiN / VSiN multi-layer nano-coating is achieved in the mixed atmosphere of Ar gas and N2 gas. According to the preparation method of the AlCrSiN / VSiN multi-layer nano-coating, the electric arc ion plating technique and the high-power pulse magnetron sputtering technique are used in a quasi coupling mode, so that the element V is prevented from being diffused outwards rapidly through a multi-layer nanostructure and a composite nanostructure, the high-temperature mechanical performance, the high temperature resistance and the oxidization resistance of the coating are improved, and the diffusion reaction between titanium and the coating at a high temperature is restrained; and under the synergistic effect of the multi-layer nanostructure, the composite nanostructure and the doped element V, the surface of the AlCrSiN / VSiN multi-layer coating has high temperature oxidization resistance, self-lubrication performance and high abrasion resistance, and the AlCrSiN / VSiN multi-layer nano-coating which is of the multi-layer nanostructure and has high bonding force, excellent temperature resistance and self-lubrication performance is finally obtained.

A method of controlling a reactive deposition process and a corresponding assembly and / or apparatus are described. The method includes providing power to a cathode with a power supply, providing a voltage set point to the power supply, receiving a power value correlating the power provided to the cathode, and controlling a flow of a process gas in dependence of the power value to provide a closed loop control for the power value.

Light reactive deposition uses an intense light beam to form particles that are directly coated onto a substrate surface. In some embodiments, a coating apparatus comprising a noncircular reactant inlet, optical elements forming a light path, a first substrate, and a motor connected to the apparatus. The reactant inlet defines a reactant stream path. The light path intersects the reactant stream path at a reaction zone with a product stream path continuing from the reaction zone. The substrate intersects the product stream path. Also, operation of the motor moves the first substrate relative to the product stream. Various broad methods are described for using light driven chemical reactions to produce efficiently highly uniform coatings.

A sweeping linear magnetron is described. The magnetron has a cathode backing plate, a drive housing attached to the cathode backing plate and a motor held in the drive housing. The motor drives a yoke positioned within a cut-out in the backing plate. The yoke has a magnet pack attached thereto said yoke such that the magnet pack is adapted to being moved over a target material and wherein the target material is being sputtered within a vacuum chamber onto a substrate.