The present invention is a technique for manufacturing a
crystalline silicon solar cell piece, especially a technique for manufacturing a high-efficiency, low cost and thin-sheet
solar cell piece, and the invention belongs to the
solar energy application field. The technique aims at the thin-sheet
crystal silicon chip with thickness less than 200 mu m, by adopting innovated technique and developing the original technique, combines the domestic
cell whole equipment which is independently developed, settles the contradiction between the
thin sheet and the fraction ratio, finished product rate and the electrical property, and satisfies the request of the
cell piece product line to the high efficiency and low cost. The technique for manufacturing
crystal silicon solar cell piece is subdivided to seven steps according to the process flow: eliminating the injury and coarsen the surface, diffusing to make a knot,
plasma etching for eliminating the edge, PSG eliminating, PECVD depositing Si3N4 film, printing positive back
electrode slurry and back field
slurry on the silk screen, and co-baking to form an
ohm contact. When the technique is adopted for the size 125*125mm<2>, the efficiency of the single
crystalline silicon solar
cell piece is up to 16.5, and the efficiency of the
polycrystalline silicon solar cell is up to 15.0%.