The invention discloses a nickel ordered porous array film and a preparation method thereof. The film consists of nickel ordered porous arrays, holes in the arrays are regular hexagonal or circular and are arranged in a hexagonal period, the diagonals or the diameters of the holes are 650 to 1,600 nanometers, the hole pitch is 200 to 1,000 nanometers, the hole period is 1,000 to 2,000 nanometers,the thickness of the film is 20 to 50 nanometers, and the void ratio is 60 to 90 percent. The method comprises the following steps: firstly placing polystyrene suspension on a rotary planar substrateto obtain a single-layer colloidal crystal template, then heating the template for 6 to 15 minutes at the temperature of between 60 and 150 DEG C, later placing the template in argon atmosphere and etching the template for 6 to 100 minutes by plasma, heating the template for 0 to 15 minutes at the temperature of between 60 and 150 DEG C, thermally evaporating nickel metal to the treated template at the temperature of between 900 and 1,000 DEG C under the pressure of 1-9*10<-5>Pa, and placing the template in dichloromethane solution for supersonic treatment for 5 to 120 seconds to obtain the film. The nickel ordered porous array film and the preparation method thereof can be applied in the fields of high-density magnetic storage media, sensors, invisible materials, efficient catalysts and the like.