The invention discloses a miniature ultra-low
capacitance solid discharge tube and a manufacturing method thereof. A
boron-based region P is arranged on the
solid discharge tube, a
phosphorus diffusion buried layer N- which is partially overlapped is arranged on one side of the
boron-based region P, a first
phosphorus diffusion region N+ is arranged in the
boron-based region P, and a plurality ofshort-circuit holes are arranged in the first
phosphorus diffusion region N + to form a cellular
cathode. A boron region P and a second
phosphorus diffusion region N+ are arranged below the
solid discharge tube, and the boron region P and the second
phosphorus diffusion region N+ are arranged at intervals to form a one-way
chip anode structure. In the invention, on the basis of an original low-
capacitance structure design, a N- buried layer is added to the
cathode so that
heat sink of each cellular
cathode is increased, and a flow capacity is improved on the basis of a same
chip area. A boronregion and a second
phosphorus diffusion region N+ are arranged in an symmetrical mode, reverse
voltage drop of a single discharge tube is eliminated, and based on the design, an area of an original
chip can be reduced so that the area of a PN junction is reduced, and a junction
capacitance is greatly decreased.