The invention discloses a luminous decay resistant furnace, which comprises a furnace bracket and a plurality of constant-current sources, wherein a conveying device for conveying wafers circularly is arranged on the furnace bracket, the furnace bracket is sequentially provided with a preheating region, a luminous region and a cooling region along a direction from a charging end to a discharging end of the conveying device, a plurality of groups of LED lamp luminous modules which are arranged side by side are positioned just above the luminous region, each group of LED lamp luminous modules is composed of a plurality of LED lamp strips having a water cooling function, and each LED lamp strip is controlled by one of the constant-current sources independently. According to the luminous decay resistant furnace, one constant-current source controls one LED lamp strip independently, so that the LED lamp strip has ultra-high luminous intensity, the heating temperature thereof can be controlled, and the LED lamp strip operates at constant temperature. In the process that the wafers enter the luminous decay resistant furnace, the wafers are subjected to strong light exposure by means of the plurality of groups of LED lamp luminous modules, and the hydrogen passivation effect of the wafers is obvious.