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72results about How to "Uniformity controllable" patented technology

Preparation method of neodymium iron boron magnet

A preparation method of neodymium iron boron magnet is disclosed. The composition general formula of the magnet provided by the invention is R1R2FeMB, wherein R1 is at least one element selected from the group consisting of Nd, Pr, La, Ce, Sm, Sc, Y and Eu, having a content of 23 to 35 wt%; R2 is at least one element selected from the group consisting of Tb, Dy, Gd, and Ho, having a content of 0.1 to 5 wt%; M represents transition group metal with the exception of Fe, having the content of 0.01 to 5 wt%; B represents simple substance boron, having the content of 0.8 to 1.2 wt%; the balance isFe and the other inevitable impurities. The preparation method of neodymium iron boron magnet provided by the invention works in such a manner that: one or more elements in the R2 are plated to the surface of the magnet, the metal R2 is diffused into the interior of the magnet by primary high temperature heat treatment, and imbalance organization and internal stress brought by the high temperature treatment are eliminated through secondary low temperature tempering. Low temperature molten salt electrodeposition method is employed to plate films. The present invention is advantageous in greatly improving the production efficiency, reducing the dosage of the heavy rare earth during preparation process of magnet, saving rare earth resource, and obtaining high coercivity without reducing remanent magnetism and magnetic energy product of a magnet.
Owner:GRIREM ADVANCED MATERIALS CO LTD

Method and device for recording a three-dimensional distance-measuring image

The invention relates to methods and devices for recording three-dimensional distance-measuring images of an object surface by measuring light propagation time using a short-term integrated photodetector. For starting a light-induced pulse on the transmission side, a trigger signal is produced that is at the same time used on the receiving side for opening at least one integration window for receiving back-scattered light-induced pulses with a predetermined time delay. A predetermined event such as a maximum or a zero crossing is detected which, by its interval relative to the integration windows, determines a trigger delay. The trigger delay is correlated with the light propagation time and allows calculation of the object point distance d.
Owner:ROCKWELL AUTOMATION

Premixing pre-vaporization combustion chamber for main combustible stage of discrete pipe

The invention provides a premixing pre-vaporization combustion chamber for a main combustible stage of a discrete pipe. The combustion chamber is in a single annulus structure, and consists of a combustion chamber outer case, a combustion chamber inner case, a flame tube outer wall, a flame tube inner wall and a combustion chamber head, wherein combusting air completely enters a flame tube from the combustion chamber head, a staged combustion scheme, namely a pre-combustible stage and the main combustible stage, is adopted; a swirl cup is adopted in the pre-combustible stage which is of a diffusion combustion organization mode; a premixing pre-vaporization device is adopted in the main combustible stage, a main combustible stage nozzle supplies fuel axially, the fuel is vaporized in the premixing pre-vaporization device and blended with air, the uniformly mixed combustible gas enters the combustion chamber to participate in combustion, namely a premixing combustion organization mode. The pre-combustible stage controls the range of stable work of the combustion chamber, and provides a stable ignition source for the main combustible stage; and the main combustible stage controls main pollution emission of the combustion chamber, and lower pollution emission of the combustion chamber is realized by controlling the equivalence ratio of premixed gas of the main combustible stage. The premixing pre-vaporization device has a simple structure, and can realize that the pollution emission of an aircraft engine combustion chamber can be reduced on the basis of not influencing the combustion stability.
Owner:BEIHANG UNIV

DPF with low-backpressure and low-initiation-temperature catalyst layer and preparation process of DPF

The invention provides a DPF with a low-backpressure and low-initiation-temperature catalyst layer and a preparation process of the DPF. The invention discloses the DPF and the preparation process ofthe DPF, wherein the DPF is used for catching, purifying and conducting low-temperature catalytic oxidation on PM and PN particles in tail gas of diesel vehicles and has the low-backpressure catalystlayer. The preparation process includes the steps that soluble aluminum salt or aluminum oxide is added in a water-alcohol solvent system, and slurry A is obtained through high energy ball milling; soluble salt of cerium and zirconium is prepared into an ionic type mixed solution, the solution is added in the slurry A, slurry B is prepared through stirring, and high energy ultrasonic oscillation is conducted while the slurry B is aged, and a glue solution C with gel particles is formed; then, the glue solution C is dipped onto the wall face of a wall-flow type DPF gas inlet and holes in the wall through the dipping process, back flushing is conducted through gas flow finally so that the redundant glue solution C can be removed, a solution with active precious metal ions is dipped in the dried DPF with a coating layer in the form of gas mist spray, and a diesel particle catcher which can conduct low-temperature catalytic oxidation on PM and PN and has the low-backpressure characteristicis obtained through drying and roasting.
Owner:SINOCAT ENVIRONMENTAL TECH

Method for manufacturing nonvolatile memory device, nonvolatile memory element, and nonvolatile memory device

Disclosed is a manufacturing method, whereby a nonvolatile memory device having a stable memory performance can be manufactured with a simple process. The method includes: a step wherein a laminated structure is formed by alternately laminating, on a substrate (11), a plurality of conductive layers (13) containing a transition metal, and a plurality of interlayer insulating films (17) composed of an insulating material; a step wherein a contact hole, which penetrates the laminated structure and exposes parts of the respective conductive layers (13) is formed; a step wherein the conductive layer (13) parts exposed in the contact hole are oxidized, and variable-resistance layers (14) wherein resistance values reversibly change on the basis of electrical signals transmitted thereto are formed; and a step wherein a conductive material is embedded in the contact hole, and a columnar electrode (12) connected to the variable-resistance layers (14) is formed in the contact hole.
Owner:PANASONIC SEMICON SOLUTIONS CO LTD

Method and device for attaching polarizer

The invention relates to a method and a device for attaching a polarizer. The device comprises absorption equipment, supporting equipment and power equipment, wherein the absorption equipment is used for absorbing first equipment; the supporting equipment is used for placing second equipment; an absorption plane of the absorption equipment is parallel to a supporting plane of the supporting equipment; the power equipment controls the absorption equipment and / or the supporting equipment to perform relative motion along the direction which is perpendicular to the absorption plane and the supporting plane, so the first equipment and the second equipment are attached; the first equipment is the polarizer and the second equipment is a liquid crystal display panel; and or the first equipment is the liquid crystal display panel and the second equipment is the polarizer. The method and the device for attaching the polarizer is characterized in that the uniformity of pressure applied to every area of the polarizer to be attached is easy to control, and the consistency of stress applied by the polarizer to be attached on the liquid crystal display panel in the X axis direction and the Y axis direction can be ensured.
Owner:BEIJING BOE OPTOELECTRONCIS TECH CO LTD

Neuronal and neuroglial cell ordered co-culture device and preparation method thereof, and neuronal and neuroglial cell ordered co-culture method

The invention relates to the cytobiology field, and discloses a neuronal cell and neuroglial cell ordered co-culture device and a preparation method and an application thereof. The device includes a substrate and a polydimethylsiloxane stamper, wherein the polydimethylsiloxane stamper can be removably compounded on the substrate; the polydimethylsiloxane stamper includes at least one micropore unit, the micropore unit includes at least one first through hole perpendicular to the substrate and at least one second through hole perpendicular to the substrate, the first through hole and the second through hole are arranged successively, and the first through hole and the second through hole respectively with the surface of the substrate form grooves having one end with an opening; the distance between the first through hole and the second through hole is 500 [mu]m-2000 [mu]m. Neuronal cells and neuroglial cells are inoculated through the first through hole and the second through hole which are perpendicular to the substrate, uniformity of the two kinds of cells is easy to control during inoculation in regions, cell quantity which can be used is increased, a population effect is obvious, and observation and study are facilitated.
Owner:民航总医院 +1

Graphene test paper and preparation thereof and liquid analyzing method based on test paper

The invention relates to graphene test paper and preparation thereof and a liquid analyzing method based on the test paper, and belongs to the technical fields of liquid sensing elements and liquid analyzing. The test paper comprises a film substrate, a thin film structure and a contact electrode, wherein the thin film structure is formed by stacking graphene layer sheets and is tightly bonded with the film substrate; an auxiliary film forming agent and chemical sniffing molecules are attached to each graphene layer sheet. The preparation method comprises the following steps of dispersing the graphene layer sheets, the auxiliary film forming agent and the chemical sniffing molecules into a solvent, so as to prepare graphene conductive ink; depositing the graphene layer sheets in the graphene conductive ink onto the film substrate, and then setting the contact electrode, so as to obtain the graphene test paper with good strength, flexibility and chemical sensitivity. The liquid analyzing method using the test paper is used for analyzing multiple types of liquids, such as organic solvent, salt solutions and beverages, and has the advantages that the demand amount of samples is small, the detection time is short, the manufacturing cost of instruments and reagents is low, and the like.
Owner:TSINGHUA UNIV

Semiconductor silicon wafer corrosive liquid and corrosion method thereof

The invention relates to the technical field of microelectronic processing and especially to a semiconductor silicon wafer corrosive liquid. The semiconductor silicon wafer corrosive liquid is formed by mixing nitric acid, hydrofluoric acid, and glacial acetic acid according to a volume ratio of 4-14: 4-14: 6-18. A semiconductor silicon wafer is placed in a closed container containing the semiconductor silicon wafer corrosive liquid in order to be corroded on a low-temperature condition. Different corrosion demands are satisfied by regulating the ratio of the nitric acid to the hydrofluoric acid. The corrosion rate and the corrosion depth of the semiconductor silicon wafer, and the surface cleanliness of the corroded semiconductor silicon wafer can be controlled on the low-temperature condition. The corrosion rate at a low-temperature environment is less than that at a normal-temperature environment, so the corrosive uniformity of the semiconductor silicon wafer is easier to control. The semiconductor silicon wafer corrosive liquid is easy to form, attainable in raw material, low in cost, and very suitable for industrial production of semiconductor microelectronics.
Owner:江苏佑风微电子有限公司

High temperature-resistant ultrafine quartz glass fiber cotton and preparation method thereof

ActiveCN105130183AImprove heat resistanceMeet the requirements for high-temperature service environmentsGlass making apparatusGlass fiberSilicon dioxide
The invention discloses a high temperature-resistant ultrafine quartz glass fiber cotton and a preparation method thereof, and belongs to the field of quartz glass fiber cotton preparation. The preparation method comprises following steps: three to nine quartz glass rods with a diameter ranging from 1.6 to 2.0mm and silicon dioxide content of 99.95% or higher are selected; the quartz glass rods are heated to be molten using an electric heating device, and are made into quartz glass thin rods with a diameter ranging from 0.8 to 1.0mm via drawing of a primary roller at a linear speed ranging from 25 to 40mm/min; the quartz glass thin rods are heated to be molten in a primary fire head device at 1900 to 2300 DEG C, and are made into quartz glass silk with a diameter ranging from 50 to 80<mu>m via drawing of a secondary roller at a linear speed ranging from 6000 to 16000mm/min; and the quartz glass silk is made into the quartz glass fiber cotton with a diameter ranging from 1 to 3<mu>m via blowing in a secondary fire head device at 1900 to 2300 DEG C at a jet stream speed ranging from 200 to 400m/s. The high temperature-resistant ultrafine quartz glass fiber cotton is capable of resisting super high temperature as high as 1100 DEG C; signal silk diameter is low; diameter uniformity is better; and product quality is high.
Owner:武汉鑫友泰光电科技有限公司

Composite penetrator with enhanced lateral efficiency and based on active material and inert material

The invention discloses a composite penetrator with enhanced lateral efficiency and based on active materials and inert materials, and relates to the technical field of penetrators with enhanced lateral efficiency. The penetrator with enhanced lateral efficiency comprises a front-section penetrator, a tail-section penetrator and one or more middle-section penetrators arranged between the front-section penetrator and the tail-section penetrator, wherein the front-section penetrator, the middle-section penetrators and the tail-section penetrator are in butt joint coaxially and sequentially, each of the front-section penetrator, the middle-section penetrators and the tail-section penetrator comprises a corresponding shell, a corresponding inner core and a corresponding sandwich part arranged between the corresponding shell and the corresponding inner core which are coaxially arranged in a sleeved mode, notch grooves are distributed in the outer walls of all the shells correspondingly, all the shells are made of the inert materials, and all the inner cores and all the sandwich parts are made of the active materials. The problems that an existing penetrator with enhanced lateral efficiency is single in damage mode, uncontrollable in fragment size and amount, low in penetrator body strength during high-speed penetration and the like are solved, kinetic energy and chemical energy combined damage and efficient damage to multi-layer target designated positions are achieved, and then the characteristics of impact energy release, fragment control, higher structural strength during high-speed impact and the like can be achieved.
Owner:BEIJING INSTITUTE OF TECHNOLOGYGY

Manufacturing method of 2.5D asynchronous, reverse and irregular three-dimensional fabric

ActiveCN104532451AImprove uniformityHigh fiber volume fractionWoven fabricsFiberEngineering
The invention discloses a manufacturing method of a 2.5D asynchronous, reverse and irregular three-dimensional fabric. The 2.5D asynchronous, reverse and irregular three-dimensional fabric is characterized in that the middle is tubular, and geometric shapes extend from two ends of the tubular middle, and a 2.5D structure is adopted. The method comprises the steps of setting a central line of the 2.5D asynchronous, reverse and irregular three-dimensional fabric in the length direction as a weaving starting position; setting one end of the 2.5D asynchronous, reverse and irregular three-dimensional fabric in the length direction as the end A and the other end as the end B; weaving from the weaving starting position to the end A, so as to finish the first molding; weaving from the starting position to the end B after the end A is worn so as to finish the second molding; when weaving from the end B of the 2.5D asynchronous, reverse and irregular three-dimensional fabric, a triangular low-density area caused by secondary molding at the starting position is filled by the compensating type weft insertion process. The 2.5D asynchronous, reverse and irregular three-dimensional fabric manufactured by the method is integrally molded and has the characteristics of being high in uniformity, and relatively high in dimension volume fractions.
Owner:NANJING FIBERGLASS RES & DESIGN INST CO LTD

Method for manufacturing solid mandrel of insulator

The invention discloses a method for manufacturing a solid mandrel of an insulator. According to the method, a basic bar is manufactured by drawing an epoxy resin composite material by a pultrusion process; the basic bar is used as a base body, and one or more epoxy resin composite material pultrusion diameter-expansion processes are adopted. The diameter of the basic bar is between 70 and 90 millimeters; and in each epoxy resin composite material pultrusion, the diameter expansion amount of the basic bar is that: the cross section is expanded to be no more than 5,000 square millimeters. The epoxy resin composite material is a continuous glass fiber bundle dipped in epoxy resin glue solution. The method for manufacturing the solid mandrel of the insulator uses the basic bar as the base body and adopts one or more epoxy resin composite material pultrusion diameter-expansion process. The equipment and the process for manufacturing the basic bar can be adopted in the diameter expansion process, so the method has the advantages of simple process, easily controlled uniformity and equipment investment saving. The pultrusion diameter-expansion process also ensures that the mandrel has uniformly distributed glass fiber bundle and better mechanical performance.
Owner:浙江金凤凰电力科技有限公司

Short-flow efficient production process of double-metal composite belt material

The invention relates to a short-flow efficient production process of a double-metal composite belt material. The short-flow efficient production process of the double-metal composite belt material comprises the following steps: preparing a high-quality double-metal composite plate blanket with a metallurgical bonding interface by a continuous casting composite process and putting the high-qualitydouble-metal composite plate blanket into a heating furnace to heat; performing multi-pass rolling on the heated plate blanket by a rolling machine, wherein the pass reduction rate of the first passis controlled to be 50 to 70 percent, the pass reduction rate of the subsequent passes is controlled to be 25 to 45 percetn and the total rolling deformation quantity is controlled to be 85 to 95 percent; performing warm rolling forming, wherein the rolling process avoids lubrication; after performing acid-washing treatment, performing rolling forming on a cold-rolling machine, wherein the pass reduction rate is controlled to be 15 to 30 percent, the total rolling deformation quantity is controlled to be less than 90 percent and the rolling speed is 1 to 25 m/min; and performing rapid sensingheating continuous heat treatment on the composite belt material after cold rolling to obtain the double-metal composite belt material. The plate material prepared by the method is short in process flow, high in production efficiency and favorable for realizing large-scale production.
Owner:UNIV OF SCI & TECH BEIJING

Method and device for manufacturing barrier film layer

The invention discloses a method and device for manufacturing a barrier film layer. The method includes the steps that a ceramic material doped with metal is provided as a target, wherein the characteristics of metallic elements and metallic compounds are the same as those of the barrier film layer; the target is arranged in a reaction cavity; a substrate to be plated with a film is arranged in the reaction cavity; reactant gas and sputtering gas are introduced into the reaction cavity; a direct-current power source is adopted for providing the working voltage for the target; and when the direct-current power source is turned on, the barrier film layer is deposited on the substrate in a reaction sputtering manner. By the adoption of the method, the direct-current power source can be adopted for manufacturing the non-metallic ion barrier film layer, the method can be applied to actual production, the film layer manufactured through the method is large in area, the temperature is low, the deposition speed of the film layer is adjustable, and the evenness of the film layer is controllable.
Owner:APOLLO PRECISION (FUJIAN) LIMITED
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