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1109results about How to "Rapid assessment" patented technology

Risk assessment and management system

A method of analyzing and presenting a series of risk factors associated with the operation of a business, such as a bank. Quantifiable risk factors are identified. Ranges of acceptable and unacceptable values for the factors are selected and arranged to each factor. Each risk factor has an immediacy value, or risk tolerance, assigned to it. A business is evaluated by measuring the actual values for each factor found in the business, comparing the actual values to the user-defined acceptable value ranges for each factor and creating a report identifying unacceptable valued risk factors and their immediacy value to the business. The measuring, evaluating and reporting may be automated using a computer, or portions can be done manually.
Owner:UNION STATE BANK

Managing compliance of data integration implementations

A system and associated processes which permit organizations to objectively evaluate compliance levels for data integration implementations and other application development platforms. An implementation scorecard analytics feature is provided to the user to permit analysis and computation of a score representing a level of maturity and / or compliance of the code being analyzed. Also disclosed are a system and process for evaluating mapping complexity in a data integration implementation and a transformation, session, and workflow attribute configuration management system, which provides a more granular level reporting for transformation, session, and workflow attributes to diagnose variations in implementations.
Owner:MOMENTUM CONSULTING

Method for computing partially coherent aerial imagery

A method for simulating aerial images is provided where the integrand of a transmission cross-coefficient (TCC) integral is formed from defocused paraxial pupil transfer functions, and contour integration is performed over the boundary of the intersection of the offset pupil functions and the source function. Preferably, the paraxial pupil functions are approximated by a second order Taylor series expansion. The integrand is preferably parameterized in terms of the angles subtending the arcs of the boundary of the integration region, and the integrand is further approximated by an expansion of analytically integrable terms having an error term that substantially monotically decreases as the number of expansion terms increases. Additional factors such as aberrations and amplitude variations can be included by using functions that are simply multipied with the defocused paraxial pupil functions in the integrand. The integrands provide fast computations of TCC integrals that are accurate to within a desired tolerance.
Owner:IBM CORP

Timeline search and index

Some embodiments provide a timeline search tool for searching and navigating a timeline. The timeline search tool includes a search field that allows a user to search for clips. In some embodiments, each clip in the list of clips is selectable such that a selection of the clip causes the timeline to navigate to the position of the clip in the timeline. In some embodiments, the timeline search tool allows a user to search for clips based on keywords or markers.
Owner:APPLE INC

Evaluation method of semiconductor layer, method for fabricating semiconductor device, and storage medium

PCT No. PCT/JP98/02567 Sec. 371 Date Jan. 13, 1999 Sec. 102(e) Date Jan. 13, 1999 PCT Filed Jun. 10, 1998 PCT Pub. No. WO98/57146 PCT Pub. Date Dec. 17, 1998Measurement light, which has been emitted from a Xe light source (20) and then linearly polarized by a polarizer (21), is made to be incident at a tilt angle on a region in a silicon substrate (11) with crystallinity disordered by the implantation of dopant ions. And the spectra of cos DELTA and tan psi are measured with a variation of the measurement light, where DELTA is a phase difference between respective components in p and s directions as to the light reflected as an elliptically-polarized ray, and psi is a ratio between the amplitudes of these components. By correlating in advance the spectral patterns of cos DELTA and so on with the thickness of an amorphous region through a destructive test or the like, or by paying special attention to characteristic parts of the patterns of cos DELTA and so on, the thickness or the degree of disordered crystallinity of the amorphous region is estimated. Also, since a variation in the thickness of the amorphous region can be identified based on a variation of cos DELTA before and after a heat treatment, a temperature of the heat treatment can be sensed based on the variation of the thickness. Thus, an evaluation method allowing for nondestructive estimation of the thickness and the degree of disorder of a region, having crystallinity disordered by implanting dopant ions into a semiconductor region at a high level, can be provided.
Owner:PANASONIC CORP
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