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9020 results about "Contact hole" patented technology

Thin film transistor having an etching protection film and manufacturing method thereof

A thin film transistor of the present invention includes a semiconductor thin film (8); a gate insulating film (7) formed on one surface of the semiconductor thin film (8); a gate electrode (6) formed to be opposite to the semiconductor thin film (8) through the gate insulating film (7); a source electrode (15) and a drain electrode (16) electrically connected to the semiconductor thin film (8); a source region; a drain region; and a channel region. The thin film transistor further includes an insulating film (9) formed on a peripheral portion corresponding to at least the source region and the drain region of the semiconductor thin film (8), and having a contact hole (10, 11) through which at least a part of each of the source region and the drain region is exposed wherein the source electrode (15) and the drain electrode (16) are connected to the semiconductor thin film (8) through the contact hole (10, 11).
Owner:CASIO COMPUTER CO LTD

Wafer-level light emitting diode package and method of fabricating the same

Exemplary embodiments of the present invention provide a wafer-level light emitting diode (LED) package and a method of fabricating the same. The LED package includes a semiconductor stack including a first conductive type semiconductor layer, an active layer, and a second conductive type semiconductor layer; a plurality of contact holes arranged in the second conductive type semiconductor layer and the active layer, the contact holes exposing the first conductive type semiconductor layer; a first bump arranged on a first side of the semiconductor stack, the first bump being electrically connected to the first conductive type semiconductor layer via the plurality of contact holes; a second bump arranged on the first side of the semiconductor stack, the second bump being electrically connected to the second conductive type semiconductor layer; and a protective insulation layer covering a sidewall of the semiconductor stack.
Owner:SEOUL SEMICONDUCTOR

Method for forming fine pattern in semiconductor device

A method for forming a contact hole of a semiconductor device according to the present invention forms a contact hole which is defined as a new contact hole region (a second contact hole region), between spacers as well as a contact hole defined within the spacer (a first contact hole region) by a spacer patterning technology (SPT). The present invention with this method can help to form a fine contact hole as a double patterning is used, even with one mask.
Owner:SK HYNIX INC

Transparent thin film transistor (TFT) and its method of manufacture

A transparent thin film transistor (TFT) and its method of manufacture includes: a substrate, a transparent semiconductor layer formed by coating the substrate with an oxide, a nitride, or a carbide to pattern the material, a gate insulating layer formed on the transparent semiconductor layer, a gate electrode formed on the gate insulating layer to correspond to the transparent semiconductor layer, an interlayer insulating layer formed on the gate electrode, and source and drain electrodes electrically connected to the transparent semiconductor layer through contact holes formed in the interlayer insulating layer and the gate insulating layer.
Owner:SAMSUNG MOBILE DISPLAY CO LTD

Contact hole formation methods

Methods of forming contact holes comprising: (a) providing a substrate comprising a plurality of post patterns over a layer to be patterned; (b) forming a hardmask layer over the post patterns and the layer to be patterned; (c) coating a pattern treatment composition over the hardmask layer, wherein the pattern treatment composition comprises a polymer comprising a reactive surface attachment group and a solvent; and optionally baking the substrate; wherein the polymer becomes bonded to the hardmask layer to form a polymer layer over the hardmask layer; and (d) treating the substrate with a rinsing agent comprising a solvent to remove residual, unbound said polymer, thereby forming a first hole disposed between a plurality of surrounding post patterns. The method is free of exposing the polymer to activating radiation from coating the pattern treatment composition to treating the substrate with the solvent. Also provided are pattern treatment compositions and electronic devices formed by the methods. The inventions find particular applicability in the manufacture of semiconductor devices for providing high resolution contact hole patterns.
Owner:DOW GLOBAL TECH LLC +1

Method of Fabricating Landing Plug in Semiconductor Device

A method of fabricating a landing plug in a semiconductor memory device, which in one embodiment includes forming a landing plug contact hole on a semiconductor substrate having an impurity region to expose the impurity region; forming a landing plug by filling the landing plug contact hole with a polysilicon layer, wherein the landing plug is divided into a first region, a second region, a third region, and a fourth region from a lower portion of the landing plug, and the first region is doped with a first doping concentration that is relatively lowest, the second region is doped with a second doping concentration that is higher than the first doping concentration, the third region is doped with a third doping concentration that is higher than the second doping concentration and the fourth region is not doped; and annealing the resulting product formed with the landing plug.
Owner:SK HYNIX INC

Method for Fabricating A Semiconductor Device Comprising Surface Cleaning

A method for fabricating a semiconductor device including surface cleaning includes forming a gate stack on a semiconductor substrate, cleaning contaminants present on the surface of the semiconductor substrate exposed through a contact hole using an etchant including a fluorine (F)-containing species dispersed in an alcohol, and filling a contact hole with a conductive layer to form a connection contact. The etchant preferably has a low selectivity of 1 or less.
Owner:SK HYNIX INC

Phase changeable memory cells and methods of forming the same

A phase changeable memory cell is provided. The phase changeable memory cell includes a lower interlayer dielectric layer formed on a semiconductor substrate and a lower conductive plug passing through the lower interlayer dielectric layer. The lower conductive plug is in contact with a phase change material pattern disposed on the lower interlayer dielectric layer. The phase change material pattern and the lower interlayer dielectric layer are covered with an upper interlayer dielectric layer. The phase change material pattern is in direct contact with a conductive layer pattern, which is disposed in a plate line contact hole passing through the upper interlayer dielectric layer. Methods of fabricating the phase changeable memory cell is also provided.
Owner:SAMSUNG ELECTRONICS CO LTD

Method to form a contact hole

A example method of forming of a contact hole by removing residue and oxide spacer beside a nitride spacer after a CF containing etch. We provide a gate structure with nitride spacers on the sidewalls of the gate. We provide a dielectric layer (oxide) over the substrate and gate structure. We form a contact photoresist pattern over the oxide dielectric layer. We etch the oxide dielectric layer using fluorocarbons (CxFy) to form contact openings and residual spacer. The photoresist is striped. Preferably, a NF3 and N2 and H2 plasma treatment is performed to deposit a byproducts layer over the residual spacer. The byproducts layer and residual spacer are removed preferably using one of the following processes: (1) heat (2) DI rinse or (3) IR or UV radiation.
Owner:TAIWAN SEMICON MFG CO LTD

Resistive random access memory and method for manufacturing the same

A resistive random access memory including, an insulating layer, a hard mask layer, a bottom electrode, a memory cell and a top electrode is provided. The insulating layer is disposed on the bottom electrode. The insulating layer has a contact hole having a first width. The hard mask layer has an opening. A portion of the memory cell is exposed from the opening and has a second width smaller than the first width. The top electrode is disposed on the insulating layer and is coupled with the memory cell.
Owner:MACRONIX INT CO LTD

Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems

Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The method includes generating an ideal mask layout representative of image characteristics associated with a desired image. Next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout.
Owner:ASML HLDG NV

Metal contact structure in semiconductor device and method for forming the same

A metal contact structure of a semiconductor device and a method for forming the same are provided. The diameter of the upper portion of a contact hole that exposes a region of a lower conductive layer is formed to be larger than the diameter of the lower portion of the contact hole. The metal contact structure is formed without a void or a key hole. This is accomplished by forming at least two metal layers to fill the contact hole by performing a first deposition, an etch back, and a second deposition. The metal layer which fills the contact hole is etched back using a barrier metal layer formed on the entire surface of the contact hole as an etching stop layer. Thus, a void or key hole is not generated by making the upper portion of the contact hole to be wider than the lower portion of the contact hole and by depositing the metal which fills the contact hole through the processes of firstly depositing the metal, etching back the metal, and secondly depositing the metal.
Owner:SAMSUNG ELECTRONICS CO LTD

Manufacturing method of thin film transistor using oxide semiconductor

A manufacturing method of a thin film transistor having at least a gate electrode, a gate insulation film, an oxide semiconductor layer, a first insulation film, a source electrode, a drain electrode, and a second insulation film on a substrate, including: forming the gate electrode on the substrate; forming the gate insulation film on the gate electrode; forming a semiconductor layer including amorphous oxide on the gate insulation film; patterning the gate insulation film; patterning the oxide semiconductor layer; reducing the oxide semiconductor layer in resistance by forming the first insulation film on the oxide semiconductor layer in the atmosphere not including an oxidized gas; patterning the first insulation film and forming a contact hole between the source electrode and the drain electrode and the oxide semiconductor layer; forming a source electrode layer and a drain electrode layer in the oxide semiconductor layer through the contact hole; forming the source electrode and the drain electrode through the contact hole and allowing the first insulation film to be exposed; patterning the exposed first insulation film and allowing a channel region of the oxide semiconductor layer to be exposed; and increasing the channel region in resistance by forming the second insulation film on the surface including the channel region of the oxide semiconductor layer in the atmosphere including an oxidized gas.
Owner:CANON KK

Method for reducing tungsten film roughness and improving step coverage

A tungsten nucleation film is formed on a surface of a semiconductor substrate by alternatively providing to that surface, reducing gases and tungsten-containing gases. Each cycle of the method provides for one or more monolayers of the tungsten film. The film is conformal and has improved step coverage, even for a high aspect ratio contact hole.
Owner:NOVELLUS SYSTEMS

Semiconductor device having multi-layer wiring

The object is to pattern extremely fine integrated circuits by forming fine contact holes. The dry etching method is employed to form contact holes to pattern a wiring (114), using a mask made of metallic film (112) and an organic material as an inter-layer insulating film (111) for covering switching elements and each of the wirings.
Owner:SEMICON ENERGY LAB CO LTD

Method for forming self-aligned contact in semiconductor device

A method for forming a self-aligned contact on a semiconductor substrate provided with a plurality of field-effect transistors. The method comprises the steps of forming a first insulating layer comprising a nitride along a profile of a gate structure and a junction region, forming a temporary layer comprising a doped oxide on the first insulating layer, removing a portion of the temporary layer by performing a selective etch of the oxide with a mask while leaving a plug portion of the temporary layer over the junction region, forming a second insulating layer comprising an undoped oxide in a region where the portion of the temporary layer is removed, removing the plug portion by performing a selective etch of the undoped oxide to form a contact hole, removing a portion of the first insulating layer at a bottom of the contact hole, and forming a conductive contact in the contact hole.
Owner:NAN YA TECH

Thin film transistor having an etching protection film and manufacturing method thereof

A thin film transistor of the present invention includes a semiconductor thin film (8); a gate insulating film (7) formed on one surface of the semiconductor thin film (8); a gate electrode (6) formed to be opposite to the semiconductor thin film (8) through the gate insulating film (7); a source electrode (15) and a drain electrode (16) electrically connected to the semiconductor thin film (8); a source region; a drain region; and a channel region. The thin film transistor further includes an insulating film (9) formed on a peripheral portion corresponding to at least the source region and the drain region of the semiconductor thin film (8), and having a contact hole (10, 11) through which at least a part of each of the source region and the drain region is exposed wherein the source electrode (15) and the drain electrode (16) are connected to the semiconductor thin film (8) through the contact hole (10, 11).
Owner:CASIO COMPUTER CO LTD

Method for forming void-free polysilicon and method for fabricating semiconductor device using the same

A method for fabricating a semiconductor device includes forming a buried gate electrode in a semiconductor substrate. An insulating layer is formed over the buried gate electrode and is etched to form a contact hole exposing the semiconductor substrate. A sacrificial spacer is formed on sidewalls of the insulating layer defining the contact hole. A polysilicon layer pattern is formed in the contact hole. The sacrificial spacer is removed to form an air gap around the polysilicon layer pattern. A thermal process is performed to remove a seam existing in the polysilicon layer pattern.
Owner:SK HYNIX INC

Transflective liquid crystal display device and method of manufacturing the same

The present invention discloses A transflective liquid crystal display device including a first substrate having a color filter; a second substrate having: a)a gate electrode formed on the second substrate; b) a first insulating layer formed on the exposed surface of the second substrate while covering the gate electrode; c) a semiconductor layer formed on the first insulating layer and over the gate electrode; d)a source electrode overlapping one end portion of the semiconductor layer; e) a drain electrode overlapping the other end portion of the semiconductor layer and spaced apart from the source electrode; f) a second insulating layer formed on the exposed surface of the first insulating layer while covering the source and drain electrode, having a first contact hole formed on a portion of the drain electrode; g) a pixel electrode formed on the second insulating layer and electrically connected with the drain electrode through the first contact hole; h) a third insulating layer on the pixel electrode and having a second contact hole over the first contact hole; and i) a reflective electrode formed on the third insulating layer and having a light transmitting hole and electrically connected with the pixel electrode through the second contact hole, the light transmitting hole transmitting light and covered by the pixel electrode; a liquid crystal display layer interposed between the first and second substrates; and a back light device for supplying light and located under the second substrate.
Owner:LG DISPLAY CO LTD

Disposable surgical devices

InactiveUS6849074B2Consume less timeConsume less laborSurgical instruments for heatingElectricityFlexible circuits
A disposable surgical device is constructed to include a shell, a smart block mounted in one end of the shell, the smart block electronic having components mounted to a circuit embedded therein, front contact pins for insertion into respective contact holes in the connector of an industry standard connector interface, and rear wire terminal points, a medical treatment terminal installed in the other side of the shell and adapted for performing surgery and treatments, and a flex circuit termination electrically connected between the smart block and the medical treatment terminal, the flex circuit termination having embedded conductor lines respectively connected to the medical treatment terminal and wire terminal points at the ends of the conductor lines respectively soldered to the wire terminal points of the smart block.
Owner:ATL TECH LLC

Organic light emitting diode display device with touch screen and method of fabricating the same

An OLED display device with a touch screen includes first and second substrates; organic light emitting diodes in the display area over the first substrate; first pads and second pads in the non-display area over the first substrate; first and second touch electrodes in the display area over the second substrate; touch pads in the non-display area over the second substrate and corresponding to and overlapping the second pads, respectively; and a first adhesive layer between the first and second substrates and exposing the first and second pads, wherein pad contact holes pass through the second substrate, the touch pads, and the first adhesive layer and expose the second pads, respectively, and wherein a conduction means is disposed in each of the pad contact holes and electrically connects each of the touch pads with a corresponding second pad.
Owner:LG DISPLAY CO LTD

Semiconductor device and method for manufacturing the same, and electric device

It is an object of the present invention to simplify steps needed to process a wiring in forming a multilayer wiring. In addition, when a droplet discharging technique or a nanoimprint technique is used to form a wiring in a contact hole having a comparatively long diameter, the wiring in accordance with the shape of the contact hole is formed, and the wiring portion of the contact hole is likely to have a depression compared with other portions. A penetrating opening is formed by irradiating a light-transmitting insulating film with laser light having high intensity and a pulse high in repetition frequency. A plurality of openings having a minute contact area is provided instead of forming one penetrating opening having a large contact area to have an even thickness of a wiring by reducing a partial depression and also to ensure contact resistance.
Owner:SEMICON ENERGY LAB CO LTD
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