507 results about "Depth of focus" patented technology

A large depth of focus (DOF) display provides an image in which the apparent focus plane is adjusted to track an accommodation (focus) of a viewer's eye(s) to more effectively convey depth in the image. A device is employed to repeatedly determine accommodation as a viewer's gaze within the image changes. In response, an image that includes an apparent focus plane corresponding to the level of accommodation of the viewer is provided on the large DOF display. Objects that are not at the apparent focus plane are made to appear blurred. The images can be rendered in real-time, or can be pre-rendered and stored in an array. The dimensions of the array can each correspond to a different variable. The images can alternatively be provided by a computer controlled, adjustable focus video camera in real-time.

The present invention relates to a face recognition and/or iris recognition system and method using a mobile device equipped with a stereo camera, which acquire a stereo image of a user's face using at least two cameras or a method corresponding thereto and, even when the size of the stereo image is varied according to distance, correct the size of the stereo image. The stereo camera uses a single-focus lens with a long depth of focus to acquire a focused iris image over a wider range. When the user is not located at a position suitable for iris recognition, a message is sent to the user such that an iris image suitable for recognition is acquired. Furthermore, an iris image correction process according to distance is performed to prevent recognition rate from decreasing even when the size of the iris image is changed.

A corneal inlay protects ocular structures from harmful wavelengths of light while maintaining acceptable color cosmetics, color perception, overall light transmission, photopic vision, scotopic vision, color vision, and/or cirdadian rhythms. The corneal inlay can also include a pinhole effect to increase depth of focus. In some embodiments, the corneal inlay can also correct refractive errors including, but not limited to, higher order aberration, lower order aberration, myopia, hyperopia, astigmatism, and/or presbyopia.

An accommodating intraocular lens implantable in an eye. The lens comprises an anterior portion having an anterior biasing element and an anterior optic having refractive power. The lens further comprises a posterior portion having a posterior biasing element and a posterior optic having refractive power. The anterior optic and the posterior optic are relatively moveable in response to action of the ciliary muscle to change the separation between the optics and the refractive power of the lens. The lens has an aberration-inducing force characteristic of about 70 mg to about 115 mg to allow aberration-inducing relative movement of the optics when the lens is in the eye, thereby adding optical aberration to the lens which increases depth of focus of the lens. In one variation, the lens has an aberration-inducing force characteristic of 70 mg to 115 mg. Related methods are also disclosed.

A mask configured to be implanted in a cornea of a patient to increase the depth of focus of the patient includes an anterior surface, a posterior surface, and a plurality of holes. The anterior surface is configured to reside adjacent a first corneal layer. The posterior surface is configured to reside adjacent a second corneal layer. The plurality of holes extends at least partially between the anterior surface and the posterior surface. The holes of the plurality of holes are configured to substantially eliminate visible diffraction patterns.

There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

A method is provided for increasing the depth of focus of an eye of a patient. A visual axis of the eye is aligned with an instrument axis of an ophthalmic instrument. The ophthalmic instrument has an aperture through which the patient may look along the instrument axis. A first reference target is imaged on the instrument axis at a first distance with respect to the eye. A second reference target is imaged on the instrument axis with the ophthalmic instrument at a second distance with respect to the eye. The second distance is greater than the first distance. Movement is provided such that the patient's eye is in a position where the images of the first and second reference targets appear to the patient's eye to be aligned. A mask comprising a pin-hole aperture having a mask axis is aligned with the instrument axis such that the mask axis and the instrument axis are substantially collinear. The mask is applied to the eye of the patient while the alignment of the mask axis and the instrument axis is maintained. Maintaining alignment of the mask axis and the instrument axis may be facilitated by capturing an image of the eye.

Circular and annular lens zones are disclosed which, at a given lens area, exhibit a depth of focus of a lens of considerably smaller area. The large depth of focus is achieved by imparting the lens zones a refractive power profile. An assembly of such large depth of focus lens zones represents a lens of large diameter which lens, in polychromatic light, exhibits essentially the same depth of focus as the lens zones from which it is composed.

In projection exposure of isolated pattern such as a contact hole, in order to increase the depth of focus a coherence reducing member is disposed on a Fourier transform plane in an image-forming optical path between a mask and a sensitized base, so that coherence is reduced between image-forming beams respectively passing through a plurality of different, concentric regions around the optical axis of the projection optical system on the Fourier transform plane. The coherence reducing member may be a polarization state control member for making a difference in polarization state, a member for making a difference in optical path length, or space filters with different shapes.

A cursor control device (700) having a light source (70) and an image sensor (80) for optically tracking motion. The device (700) includes an upwardly facing dome (710) or window (32) that provides a visual and tactile interface for user interaction. The user's hand or finger, bare or gloved, or other object controlled by the user, can be moved in close proximity or touching the dome (710), and means are provided to discriminate against the motion of objects that are not close to the dome in order to prevent unwanted cursor motion. Said means can include optics (40) having a limited depth of focus, adaptive illumination processing for controlling the intensity of light emitted from the light source (70) to optimize sensor operation, and/or processing for projecting cursor motion in accordance with a detected level of confidence in the sensor data.

A method increases the depth of focus of an eye having a line of sight. A pharmacologic agent is applied to the eye to cause a reduction in the size of the pupil of the eye. The pupil is aligned with a visible feature of a mask comprising a pin-hole aperture. The pin-hole aperture is centered on a mask axis. The alignment causes the mask axis to be substantially aligned with the line of sight of the eye. The mask is applied to the eye of the patient while maintaining the alignment of the visible feature of the mask and the pupil.

A method and apparatus for microlithography. The method and apparatus include optimizing illumination modes based on characteristics of a specific mask pattern. The illumination is optimized by determining an appropriate illumination mode based on diffraction orders of the reticle, and the autocorrelation of the projection optic. By elimination of parts of the illumination pattern which have no influence on modulation, excess DC light can be reduced, thereby improving depth of focus. Optimization of mask patterns includes addition of sub-resolution features to reduce pitches and discretize the probability density function of the space width.

A mask is provided that is configured to increase the depth of focus of a patient. The mask can include an aperture configured to transmit along an optical axis substantially all visible incident light. The mask can further include a portion surrounding at least a portion of the aperture. The portion may be configured to be substantially opaque to visible electromagnetic radiation and be substantially transparent to electromagnetic radiation transmitted from an ocular examination device (e.g., substantially transparent to at least some non-visible electromagnetic radiation with a wavelength between about 750 nm and about 1500 nm).

An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

There is provided a positive type resist composition formed by dissolving (A) a resin component with a unit derived from a (meth)acrylate ester in the principal chain, for which the solubility in alkali increases under the action of acid, and (B) an acid generator component which generates acid on exposure, in an organic solvent component (C), wherein the resin component (A) is a copolymer comprising (a1) a unit derived from a (meth)acrylate ester comprising an acid dissociable, dissolution inhibiting group containing a polycyclic group, (a2) a unit derived from a (meth)acrylate ester comprising a lactone containing monocyclic group or polycyclic group, (a3) a unit derived from a (meth)acrylate ester comprising a hydroxyl group containing polycyclic group, and (a4) a unit derived from a (meth)acrylate ester comprising a polycyclic group which is different from the unit (a1), the unit (a2) and the unit (a3). This composition provides a chemically amplified positive type resist composition which displays excellent resolution, enables the depth of focus range of an isolated resist pattern to be improved, and enables the proximity effect to be suppressed.