75 results about "Polycyclic group" patented technology

A phenylcarbazole compound of formula (1) below is provided,where each of R1 and R2 is independently a monosubstituted or polysubstituted functional group selected from the group consisting of hydrogen atom, a substituted or unsubstituted C1-C30 alkyl group, a substituted or unsubstituted C6-C30 aryl group, a substituted or unsubstituted C4-C30 heterocyclic group, a substituted or unsubstituted C6-C30 condensed polycyclic group, wherein groups adjacent to R1 and R2 bind and form a saturated or unsaturated cyclic hydrocarbon group, and Ar is a substituted or unsubstituted C6-C30 aryl group or a C6-C30 heteroaryl group, wherein the substituent R4 is defined herein. Also included is an organic electroluminescence device comprising the above phenylcarbazole compounds.

Fluorinated polymers useful in photoresist compositions and associated processes for microlithography are described. These polymers and photoresists have a fluoroalcohol functional group that simultaneously imparts high ultraviolet (UV) transparency and developability in basic media. The polymers also have a repeat unit derived from a C1-C25 alkyl hydroxymethylacrylate comonomer, e.g., tert-butyl hydroxymethylacrylate, or a C5-C50 polycyclic alkyl acrylate in which the polycyclic group contains a hydroxy group, e.g., hydroxyadamantyl acrylate. The materials of this invention have high UV tansparency, particularly at short wavelengths, e.g., 193 nm and 157 nm, which makes them highly useful for lithography at these short wavelengths.

There is provided a positive type resist composition formed by dissolving (A) a resin component with a unit derived from a (meth)acrylate ester in the principal chain, for which the solubility in alkali increases under the action of acid, and (B) an acid generator component which generates acid on exposure, in an organic solvent component (C), wherein the resin component (A) is a copolymer comprising (a1) a unit derived from a (meth)acrylate ester comprising an acid dissociable, dissolution inhibiting group containing a polycyclic group, (a2) a unit derived from a (meth)acrylate ester comprising a lactone containing monocyclic group or polycyclic group, (a3) a unit derived from a (meth)acrylate ester comprising a hydroxyl group containing polycyclic group, and (a4) a unit derived from a (meth)acrylate ester comprising a polycyclic group which is different from the unit (a1), the unit (a2) and the unit (a3). This composition provides a chemically amplified positive type resist composition which displays excellent resolution, enables the depth of focus range of an isolated resist pattern to be improved, and enables the proximity effect to be suppressed.

There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

A silsesquioxane resin, a positive resist composition, a resist laminate, and a method of forming a resist pattern that are capable of suppressing a degas phenomenon are provided, and a silicon-containing resist composition and a method of forming a resist pattern that are ideally suited to immersion lithography are also provided. The silsesquioxane resin includes structural units represented by the general shown below [wherein, R1 and R2 each represent, independently, a straight chain, branched, or cyclic saturated aliphatic hydrocarbon group; R3 represents an acid dissociable, dissolution inhibiting group containing a hydrocarbon group that includes an aliphatic monocyclic or polycyclic group; R4 represents a hydrogen atom, or a straight chain, branched, or cyclic alkyl group; X represents an alkyl group of 1 to 8 carbon atoms in which at least one hydrogen atom has been substituted with a fluorine atom; and m represents an integer from 1 to 3].

Provided is an organic light-emitting device including: a first electrode; a second electrode; and one or more organic layers interposed between the first electrode and the second electrode. At least one of the organic layers includes one or more anthracene derivatives represented by Formula 1 below: wherein R 1 and R 2 are each independently a hydrogen atom, a substituted or unsubstituted C1-C30 alkyl group, a substituted or unsubstituted C1-C30 alkoxy group, a substituted or unsubstituted C6-C30 aryl group, a substituted or unsubstituted C6-C30 aryloxy group, a substituted or unsubstituted C4-C30 heteroaryl group, a substituted or unsubstituted C6-C30 condensed polycyclic group, a hydroxyl group, halogen, a cyano group, or a substituted or unsubstituted amino group.

There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

A heterocyclic compound represented by Formula 1 below:X is selected from the group consisting of nitrogen, boron, and phosphorous; and Ar1, Ar2, Ar3 and Ar4 are each independently selected from the group consisting of a C6-C30 substituted or unsubstituted aryl group, a C6-C30 substituted or unsubstituted aryloxy group, a C4-C20 substituted or unsubstituted heterocyclic group, and a C6-C20 fused polycyclic group.The heterocyclic compound can be included in emission layers of top emission and bottom emission organic light emitting devices.

A resist composition containing a base component (A) which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a copolymer (A1) having a structural unit (a0) containing a group represented by the following general formula (a0-1) or (a0-2), a structural unit (a11) containing an acid-decomposable group which exhibits increased polarity by the action of acid and contains a polycyclic group, and a structural unit (a12) containing an acid-decomposable group which exhibits increased polarity by the action of acid and contains a monocyclic group. Each of the groups —R3—S+(R4)(R5) and Mm+ in the formula has only one aromatic ring as a whole or has no aromatic ring.

A fluorine-containing compound is represented by Formula 1 below:wherein R1a, R1b, R2a, and R2b are each independently a hydrogen atom, a substituted or unsubstituted C1-C30 alkyl group, a substituted or unsubstituted C1-C30 alkoxy group, a substituted or unsubstituted C6-C30 aryl group, a substituted or unsubstituted C6-C30 aryloxy group, a substituted or unsubstituted C4-C30 heteroaryl group, a substituted or unsubstituted C6-C30 condensed polycyclic group, a hydroxy group, halogen, a cyano group, or a substituted or unsubstituted amino group, and adjacent groups selected from R1a, R1b, R2a, and R2b may join together to form a saturated or unsaturated carbon ring; n and m are each independently an integer of 0 to 5; Ar1a and Ar1b are each independently a C6-C30 aryl group which is unsubstituted or substituted by at least one fluorine or a C4-C30 heteroaryl group which is unsubstituted or substituted by at least one fluorine; and Ar2 is a substituted or unsubstituted C6-C30 aryl group or a substituted or unsubstituted C2-C30 heteroaryl group. The fluorine-containing compound has good electrical characteristics and charge transport capability, and thus, is useful as a hole injection material, a hole transport material, and / or an emitting material for fluorescent or phosphorescent devices capable of producing light of a full spectrum of colors, including red, green, blue, and white. Thus, the fluorine-containing compound can be used to produce organic light-emitting devices with high efficiency, a low driving voltage, high brightness, and a long lifetime.

A thermoplastic resin composition which is inhibited from suffering phase separation and readily gives an optical film having excellent transparency; an optical film comprising the composition as a major ingredient; a retardation film which is a film formed by stretching the optical film, shows a positive wavelength dependence, and has a low photoelastic coefficient and transparency; and a process for producing the retardation film. The thermoplastic resin composition comprises (A) a cyclic-olefin polymer and (B) a vinyl polymer having a unit represented by the following general formula (II). (II) (III) (In the formula (II), at least one of R<1> to R<4> represents a group represented by the general formula (III), and the remainder of R<1> to R<4>, if any, and R<5> and R<6> each represents hydrogen, halogeno, a (substituted) hydrocarbon group optionally having a connecting group containing a heteroatom, or a polar group, provided that R<5> and R<6> may be bonded to each other to form a monocyclic or polycyclic group optionally having a heteroatom or may in cooperation represent a divalent hydrocarbon group; and Y represents a divalent hydrocarbon group.