233results about How to "Large depth of field" patented technology

Circular and annular lens zones are disclosed which, at a given lens area, exhibit a depth of focus of a lens of considerably smaller area. The large depth of focus is achieved by imparting the lens zones a refractive power profile. An assembly of such large depth of focus lens zones represents a lens of large diameter which lens, in polychromatic light, exhibits essentially the same depth of focus as the lens zones from which it is composed.

The invention discloses an array type parallel laser projection three-dimensional scanning method. The array type parallel laser projection three-dimensional scanning method comprises steps that a laser micro-vibration mirror projection device used for projecting line lasers in different directions and a plurality of array type cameras used for data acquisition are provided; laser cutter separation of each acquired image in different directions is carried out, and the laser cutter centers of the laser cutters in various directions are respectively extracted, and according to a triangle relation among the projection device and the cameras, an object surface three-dimensional coordinate of a line laser position is acquired; the projection device is used to move the line laser on the object surface by one pixel each time, and the above mentioned process of extracting the object three-dimensional coordinate on the laser cutter position is repeated until the three-dimensional coordinate of the whole object surface is acquired by the laser cutter. The laser projection device adopts MEMS scanning vibration mirror laser, and compared with a digital light and physical grating technology, field depth is large, scanning speed is fast, a size is small, and scanning precision is high; and at the same time, the system is used to distribute the cameras in an array, and then the sensitivity to complicated step edge measurement is provided, and then the non-contact, high-speed, and object edge step high precision measurement of the object is realized.

An overlay target with gratings thereon is illuminated and radiation scattered by the target is imaged onto detectors. A phase difference is then detected between the outputs of the detectors to find the mis-alignment error. In another aspect, an overlay target with gratings or box-in-box structures is illuminated and radiation scattered by the target is imaged onto detectors located away from the specular reflection direction of the illumination in a dark field detection scheme. Medium numerical aperture optics may be employed for collecting the radiation from the overlay target in a bright or dark field configuration so that the system has a larger depth of focus and so that the two structures of the target at different elevations can be measured accurately at the same time. Analytical functions are constructed for the grating type targets. By finding the phase difference between the two gratings at different elevations, misalignment errors can be detected. Analytical functions are constructed as a model for box-in-box type targets where data points away from the edges of the box or bars can be used in the curve fitting. Symmetrical functions are employed to further reduce noise.

The preferred embodiment of the present invention provides a transistor structure and method for fabricating the same that overcomes the disadvantages of the prior art. In particular, the preferred structure and method results in lower leakage and junction capacitance by using raised source and drains which are partially isolated from the substrate by a dielectric layer. The raised source and drains are preferably fabricated from the same material layer used to form the transistor gate. The preferred method for fabricating the transistor uses hybrid resist to accurately pattern the gate material layer into regions for the gate, the source and the drain. The source and drain regions are then connected to the substrate by growing silicon. The preferred method thus results in an improved transistor structure while not requiring excessive fabrication steps.

The invention provides an image acquisition method, an image acquisition device and a terminal, wherein the image acquisition method comprises the following steps: setting the focusing distance of each camera in multiple cameras according to a first setting command received; acquiring shooting data related to a target object shot by each camera; and respectively setting a mark for shooting data shot by each camera according to a second setting command received so as to acquire the target image of the target object according to the mark in the shooting data shot by each camera and the shooting data shot by each camera. According to the technical scheme, multiple cameras are arranged on the terminal, so that the terminal has the function of adjusting the focusing distances in multiple ranges so as to increase the depths of field shot and improve the resolution of the shot image, and the terminal can shoot relatively far and clear images.

A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

The invention relates to a surface microdefect search and repair device for large-diameter KDP crystal elements, in particular to a surface microdefect fast search and micro-milling repair device for large-diameter KDP crystal elements, and aims to solve the problem that presently no device for fast research and micro-milling repair of surface microdefects in large-diameter KDP crystal elements is provided. An integral platform fitting assembly is fixed on a bottom large flat plate. A bottom platform fitting assembly is fixed on the integral platform fitting assembly. A crystal moving platform fitting member is fixed on the integral platform fitting assembly. A crystal microscope moving platform is fixed on the integral platform fitting assembly. First and second drag chains are connected with the crystal moving platform fitting member through guide rail and drag chain connecting blocks. The lower portion of a crystal microscope moving platform support is connected to the upper end face of the integral platform fitting assembly. The crystal microscope moving platform is mounted on the crystal microscope moving platform support. The device is applicable to surface microdefect fast research and micro-milling repair for large-diameter KDP crystal elements.

An optical arrangement is provided for use in imaging with a large depth of focus. The optical arrangement comprises an aperture unit, and a replication unit. The replication unit is configured for producing a plurality of replicas of an input optical field passed through the aperture unit such that the replicas include at least two replicas that are of substantially the same phase distribution and are created at different regions of the aperture unit plane.

The invention belongs to the technical field of microimaging and provides a method, an optical module and a system for extended field depth three-dimensional nanoscale-resolution imaging. The method comprises the following steps of 1, building the optical module having a double-helix point spread function and defocusing grating multistage imaging properties, 2, carrying out imaging of a molecule needing to be detected by the optical module to obtain a double-helix image, 3, determining a horizontal position of the molecule needing to be detected according to positions of middle points of double-helix sidelobes of the double-helix image, and 4, determining an axial position of the molecule needing to be detected according to a rotation angle of a connection line of centers of the double-helix sidelobes of the double-helix image, and the positions of the middle points of the double-helix sidelobes. Through combination of double effects of the double-helix point spread function and the defocusing grating multistage imaging, the method extends a field depth and improves a resolution ratio. The method can be used for dynamic range imaging of subcellular fractions having any depth values in a whole cell, can produce dynamic function images of multiple moving molecules, and has an important meaning for high-level understanding of a rule and a relationship between a subcellular structure and a cell function change.

An optical arrangement is provided for use in imaging with a large depth of focus. The optical arrangement comprises an aperture unit, and a replication unit. The replication unit is configured for producing a plurality of replicas of an input optical field passed through the aperture unit such that the replicas include at least two replicas that are of substantially the same phase distribution and are created at different regions of the aperture unit plane.