82 results about "Focus variation" patented technology

Methods and device structures used to determine the focus quality of a photolithographic pattern or a photolithographic system are disclosed. One aspect of the invention relates to focus masking structures configured to form focus patterns that contain focus information relating to the focus quality. The focus masking structures generally include a plurality of parallel source lines that are separated by alternating phase shift zones. Another aspect of the invention relates to focus patterns that change with changes in focus. The focus patterns generally include a plurality of periodic structures that form measurable shifts therebetween corresponding to the sign and magnitude of defocus. Another aspect of the invention relates to a method of determining the focus quality of a photolithographic pattern or a photolithographic system. The method generally includes: providing a focus masking structure, forming a focus pattern on a work piece with the focus masking structure, and obtaining focus information from the focus pattern. The focus information may be obtained using a variety of techniques, as for example, scatterometry techniques, scanning techniques, imaging techniques, phase based techniques, and the like.

The invention provides a spectrometer adjusting demonstrator, which comprises a collimator, a telescope and an objective table. The collimator and the telescope are respectively supported at the two sides of the objective table. The spectrometer adjusting demonstrator is characterized in that the collimator and the telescope are assembled together via a convenient-to-assemble/disassemble structure. According to the technical scheme of the invention, the collimator and the telescope are assembled together via the convenient-to-assemble/disassemble structure, so that the internal structure of the spectrometer adjusting demonstrator can be displayed through disassembling the spectrometer adjusting demonstrator at any time as needed. A fluorescent layer arranged on a reticle is capable of displaying the focusing state of the light. Therefore, students can understand the focusing variation condition of the light during the adjusting process.

The invention discloses a varifocal reflecting surface system based on a rib column cable network structure, and mainly aims to solve the problems that the focus of a conventional surface cannot be varied and the feed source position is fixed. The varifocal reflecting surface system comprises a feed source (1), a reflecting cable network (2), a support rib rod structure (3), a support cable network (4), vertical pull ropes (5), an annular fixing truss structure (6), a central support rod (7), annular rib joints (9) and a reflecting surface (10), wherein a varifocal sleeve (8) sleeves the outer side of the central support rod (7); the varifocal sleeve (8) is connected with the reflecting cable network (2) and the support cable network (4); the position of the varifocal sleeve (8) is adjusted to change the lengths of the reflecting cable network (2) and the support cable network (4), so that large-scale focus variation that the shape of the reflecting surface (10) transits to a plane from a parabolic plane is achieved. The varifocal reflecting surface system is simple, convenient and flexible in structure, the focus range and the reflection function of the reflecting surface are expanded, and the varifocal reflecting surface system can be applied to convergence or reflection of electromagnetic waves or optical energy of outer space, war ships or the ground.

A method and device is described for compensating ambient temperature dependent magnification and focus change of a zoom lens system, whereby an ambient temperature compensation structure cooperates with a rotational ring and an optical-element adjusting member such that a phase variation between the rotational ring and the optical-element adjusting member in response to an ambient temperature change is compensated and whereby the phase variation characterizes an optical property of the zoom lens system such as magnification or focus.

A method for non-destructive testing a cutting insert to determine coating thickness is disclosed. The method includes the steps of using a source of electromagnetic energy to ablate a surface of the cutting insert to non-destructively form a geometric feature and expose the substrate and each layer of the coating; and measuring the thickness of each layer of the coating. In one example, the geometric feature is a groove with a generally trapezoidal shape. In other examples, the groove can have a U-shape, V-shape, and the like. The thickness of each layer of the coating is determined using focus variation, contrast detection, confocal microscopy, an interferometric microscopy, an imaging interferometric microscopy, or similar technique.

An optical compensation zoom lens comprises a compensating lens group and a zoom lens group. Focus variation of the whole lens is adjusted by changing relative positions of the compensating lens group and the zoom lens assembly. The compensating lens group comprises a convex-concave negative light focal power lens serving as a first lens, a double-concave negative light focal lens serving as a second lens and a double-convex positive light focal lens serving as a third lens, wherein the first lens, the second lens and the third lens are arranged on one side of an object. The zoom lens group comprises a double-convex negative light focal power lens serving as a fourth lens, a concave-concave negative light focal lens serving as a fifth lens and a double-convex positive light focal lens serving as a sixth lens, a concave-concave negative light focal lens serving as a seventh lens, a double-convex positive light focal lens serving as a eighth lens, a concave-concave negative light focal lens serving as a ninth lens, wherein the fourth lens, the fifth lens, the sixth lens, the seventh lens, the eighth lens and the ninth lens are arranged on one side of the object. The optical compensation zoom lens achieves con-focus of visible light imaging and infrared light imaging through the structures of the lens and parameter setting.

A mask with a focus measurement pattern and a method for measuring a focus value in an exposure process using the same that are capable of improving the measurement of a focus change, wherein the mask includes an outer reference pattern which provides a position reference for focus measurement, and focus measurement patterns which are provided apart from the outer reference pattern and formed in a line shape extending in two different directions. Accordingly, the focus change caused in the exposure process can be measured by measuring the line shortening of the focus measurement patterns.