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5944 results about "Image plane" patented technology

In 3D computer graphics, the image plane is that plane in the world which is identified with the plane of the display monitor used to view the image that is being rendered. It is also referred to as screen space. If one makes the analogy of taking a photograph to rendering a 3D image, the surface of the film is the image plane. In this case, the viewing transformation is a projection that maps the world onto the image plane. A rectangular region of this plane, called the viewing window or viewport, maps to the monitor. This establishes the mapping between pixels on the monitor and points (or rather, rays) in the 3D world. The plane is not usually an actual geometric object in a 3D scene, but instead is usually a collection of target coordinates or dimensions that are used during the rasterization process so the final output can be displayed as intended on the physical screen.

Projection exposure method and projection exposure system

In a method for manufacturing semiconductor devices and other finely structured parts, a projection objective (5) is used in order to project the image of a pattern arranged in the object plane of the projection objective onto a photosensitive substrate which is arranged in the region of the image plane (12) of the projection objective. In this case, there is set between an exit surface (15), assigned to the projection objective, for exposing light and an incoupling surface (11), assigned to the substrate, for exposing light a small finite working distance (16) which is at least temporarily smaller in size and exposure time interval than a maximum extent of an optical near field of the light emerging from the exit surface. As a result, projection objectives with very high numerical apertures in the region of NA>0.8 or more can be rendered useful for contactless projection lithography.
Owner:CARL ZEISS SMT GMBH

Catadioptric projection objective with geometric beam splitting

A catadioptric projection objective is used to project a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image and has an image-side numerical aperture NA>0.7. The projection objective comprises an optical axis and at least one catadioptric objective part that comprises a concave mirror and a first folding mirror. There are a first beam section running from the object plane to the concave mirror and a second beam section running from the concave mirror to the image plane. The first folding mirror is arranged with reference to the concave mirror in such a way that one of the beam sections is folded at the first folding mirror and the other beam section passes the first folding mirror without vignetting, the first beam section and the second beam section crossing one another in a cross-over region.
Owner:CARL ZEISS SMT GMBH

Method and device for immersion lithography

The present invention relates to an immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation. Said system comprising a source emitting electromagnetic radiation onto an object plane, a mask, adapted to receive and modulate said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said work piece, and an immersion medium contacting at least a portion of a final lens of said lithographic system and a portion of said work piece, wherein an area of said contacting is restricted by capillary forces. The invention further relates to a method for patterning a workpiece.
Owner:MICRONIC LASER SYST AB

System and method for x-ray fluoroscopic imaging

A system for x-ray fluoroscopic imaging of bodily tissue in which a scintillation screen and a charge coupled device (CCD) is used to accurately image selected tissue. An x-ray source generates x-rays which pass through a region of a subject's body, forming an x-ray image which reaches the scintillation screen. The scintillation screen re-radiates a spatial intensity pattern corresponding to the image, the pattern being detected by the CCD sensor. In a preferred embodiment the imager uses four 8×8-cm three-side buttable CCDs coupled to a CsI:T1 scintillator by straight (non-tapering) fiberoptics and tiled to achieve a field of view (FOV) of 16×16-cm at the image plane. Larger FOVs can be achieved by tiling more CCDs in a similar manner. The imaging system can be operated in a plurality of pixel pitch modes such as 78, 156 or 234-μm pixel pitch modes. The CCD sensor may also provide multi-resolution imaging. The image is digitized by the sensor and processed by a controller before being stored as an electronic image. Other preferred embodiments may include each image being directed on flat panel imagers made from but not limited to, amorphous silicon and / or amorphous selenium to generate individual electronic representations of the separate images used for diagnostic or therapeutic applications.
Owner:UNIV OF MASSACHUSETTS MEDICAL CENT

Illumination system particularly for microlithography

The invention concerns an illumination system, particularly for microlithography with wavelengths <=193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.
Owner:CARL-ZEISS-STIFTUNG TRADING AS CARL ZEISS
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