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17291 results about "Optic system" patented technology
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The OPTIC System is a workplace health, safety and environment (QHSE) management software for construction and trade services, asset intensive manufacturing and industrial processing companies, utilities and municipal services - allowing our customers to use the best safety practices in QHSE based business process management.
Very high-aperture projection objective
InactiveUS20050141098A1Guaranteed true stateIncrease the number ofSemiconductor/solid-state device manufacturingMicroscopesSpherical shapedOptic system
A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA≧0.85, if appropriate of NA≧1.
Owner:CARL ZEISS SMT GMBH
Ergonomic head mounted display device and optical system
Optical systems such as image display systems include a freeform optical waveguide prism and a freeform compensation lens spaced therefrom by a gap of air or index cement. The compensation lens corrects for aberrations which the optical waveguide prism will introduce in light or images from an ambient real-world environment. The optical waveguide prism receives actively projected images at an entry location, and emits the projected images at an exit location after internally reflecting the images along an optical path therein. The image display system may include an image source and coupling optics. The approach permits design of an optical viewing device, for example in optical see-through HMDs, achieving an eyeglass-form appearance and a wide see-through field of view (FOV).
Owner:MAGIC LEAP INC
Electro-optic displays and optical systems for addressing such displays
The invention features a photoconductively addressed display and a method of photoconductive addressing in a display. The method includes providing an electro-optic imaging layer that extends in an X direction and a Y direction and comprises an array of image elements. A column electrode layer is provided adjacent to one side of the electro-optic imaging layer. The column electrode layer includes a plurality of column electrodes that each extend in the Y direction and are spaced from one another in the X direction. A photoconductive layer disposed between the electro-optic imaging layer and the column electrode layer is provided. An elongate portion of the photoconductive layer is illuminated in the X direction while scanning the illumination in the Y direction to translate a location of the illuminated elongate portion. At least one image element of the array of image elements is addressed by applying an intermittent voltage to one of the plurality of column electrodes that is adjacent to the at least one image element while the illuminated elongate portion of the photoconductive layer is adjacent to the at least one image element.
Owner:E INK CORPORATION
Ergonomic Head Mounted Display Device And Optical System
ActiveUS20120162549A1Good optical performanceWide field of viewPolarising elementsPlanar/plate-like light guidesDisplay deviceSee-through display
Owner:MAGIC LEAP
Metrology Method and Apparatus, and Device Manufacturing Method
ActiveUS20120242970A1Improve accuracyImprove throughputPhotomechanical apparatusOptically investigating flaws/contaminationMetrologyGrating
Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating or other structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The position of an image of the component structure varies between measurements, and a first type of correction is applied to reduce the influence on the measured intensities, caused by differences in the optical path to and from different positions. A plurality of structures may be imaged simultaneously within the field of view of the optical system, and each corrected for its respective position. The measurements may comprise first and second images of the same target under different modes of illumination and / or imaging, for example in a dark field metrology application. A second type of correction may be applied to reduce the influence of asymmetry between the first and second modes of illumination or imaging, for example to permit a more accurate overly measurement in a semiconductor device manufacturing process.
Owner:ASML NETHERLANDS BV
Exposure apparatus
InactiveUS20050146693A1Accurate exposureLarge numerical apertureSemiconductor/solid-state device manufacturingPhotomechanical exposure apparatusRefractive indexReticle
An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between the reticle and the object, a first fluid that has a refractive index of 1 or greater, and fills a space between at least part of the projection optical system and the object and a space between at least part of the projection optical system and the reference mark, and an alignment mechanism for aligning the object by using the projection optical system and the first fluid.
Owner:CANON KK
Optical device and virtual image display device
ActiveUS20060228073A1Improve imaging resolutionReduce aberrationDiffraction gratingsPlanar/plate-like light guidesGratingDisplay device
A virtual image display device is provided which displays a two-dimensional image for viewing a virtual image in a magnified form by a virtual optical system. The virtual image display device includes an optical waveguide (13) to guide, by internal total reflection, parallel pencil groups meeting a condition of internal total reflection, a first reflection volume hologram grating (14) to diffract and reflect the parallel pencil groups incident upon the optical waveguide from outside and traveling in different directions as they are so as to meet the condition of internal total reflection inside the optical waveguide and a second reflection volume hologram grating (15) to project the parallel pencil groups guided by internal total reflection inside the optical waveguide as they are from the optical waveguide by diffraction and reflection thereof so as to depart from the condition of internal total reflection inside the optical waveguide. Some of the parallel pencil groups guided through the optical waveguide being totally reflected different numbers of times for a period from external incidence upon the optical waveguide until outgoing from the optical waveguide.
Owner:SONY CORP
Projection optical system and method for photolithography and exposure apparatus and method using same
InactiveUS20050248856A1Large image-sideWide effective image forming areaSemiconductor/solid-state device manufacturingMicroscopesWide fieldProjection system
Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.
Owner:NIKON CORP
Exposure apparatus and method
InactiveUS20050140948A1High-quality exposureSemiconductor/solid-state device manufacturingPhotomechanical exposure apparatusPhysicsOptics
An exposure method includes the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.
Owner:CANON KK
Illumination optical system, exposure apparatus, and exposure method
InactiveUS20060055834A1Limit lossIncrease exposurePhotomechanical exposure apparatusMicrolithography exposure apparatusLinearityOptic system
An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
Owner:NIKON CORP
Multifocal ophthalmic lens
InactiveUS20040156014A1Improve visual qualitySpectales/gogglesOptical measurementsAberrations of the eyeCorneal surface
A method of designing a multifocal ophthalmic lens with one base focus and at least one additional focus, capable of reducing aberrations of the eye for at least one of the foci after its implantation, comprising the steps of: (i) characterizing at least one corneal surface as a mathematical model; (ii) calculating the resulting aberrations of said corneal surface(s) by employing said mathematical model; (iii) modelling the multifocal ophthalmic lens such that a wavefront arriving from an optical system comprising said lens and said at least one corneal surface obtains reduced aberrations for at least one of the foci. There is also disclosed a method of selecting a multifocal intraocular lens, a method of designing a multifocal ophthalmic lens based on corneal data from a group of patients, and a multifocal ophthalmic lens.
Owner:AMO GRONINGEN
Digitally controlled luminaire system
InactiveUS20070040512A1Radiation pyrometryBeam/ray focussing/reflecting arrangementsJunction temperatureEngineering
The present invention provides a luminaire system capable of generating light of a desired chromaticity and luminous flux output during continuous operation with varying ambient operating temperature. The luminaire system can be further capable of maintaining a desired correlated colour temperature during dimming of the luminaire. The luminaire system comprises one or more arrays of light-emitting elements for generating light with a current driver system coupled thereto for selectively supplying electrical drive current to each of the arrays, wherein the current driver system is responsive to drive signals received from a controller. The luminaire system further comprises an optical sensor system for generating optical signals representative of chromaticity and luminous flux output of the light. A heat sensing system is operatively coupled to the one or more arrays for generating signals representative of the junction temperatures of arrays of light-emitting elements during operation. The luminaire system further comprises a controller that is operatively connected to the current driver system, the optical sensor system and the heat sensing system for receiving the signals generated by each of these systems and is configured to generate one or more drive signals for transmission to the current driver system in response to the optical signals and thermal signals received from the optical system and the heat sensing system, respectively, thereby enabling a desired level of control of the output light.
Owner:SIGNIFY HLDG BV
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
InactiveUS20070127006A1Preventing and suppressing leakage of liquidImprove throughputSemiconductor/solid-state device manufacturingPhotomechanical exposure apparatusEngineeringImage plane
When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.
Owner:NIKON CORP
Exposure apparatus and method for producing device
InactiveUS20060077367A1Forming accuratelySemiconductor/solid-state device manufacturingPhotomechanical exposure apparatusEngineeringImage plane
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
Owner:NIKON CORP
Optical device and virtual image display device
ActiveUS7418170B2Improve imaging resolutionReduce aberrationPlanar/plate-like light guidesDiffraction gratingsGratingTotal internal reflection
A virtual image display device is provided which displays a two-dimensional image for viewing a virtual image in a magnified form by a virtual optical system. The virtual image display device includes an optical waveguide (13) to guide, by internal total reflection, parallel pencil groups meeting a condition of internal total reflection, a first reflection volume hologram grating (14) to diffract and reflect the parallel pencil groups incident upon the optical waveguide from outside and traveling in different directions as they are so as to meet the condition of internal total reflection inside the optical waveguide and a second reflection volume hologram grating (15) to project the parallel pencil groups guided by internal total reflection inside the optical waveguide as they are from the optical waveguide by diffraction and reflection thereof so as to depart from the condition of internal total reflection inside the optical waveguide. Some of the parallel pencil groups guided through the optical waveguide being totally reflected different numbers of times for a period from external incidence upon the optical waveguide until outgoing from the optical waveguide.
Owner:SONY CORP
Methods and apparatus for reducing plenoptic camera artifacts
ActiveUS8189089B1Reduce artifactsQuality improvementTelevision system detailsColor television detailsOptic systemRendering algorithms
Methods and apparatus for reducing plenoptic camera artifacts. A first method is based on careful design of the optical system of the focused plenoptic camera to reduce artifacts that result in differences in depth in the microimages. A second method is computational; a focused plenoptic camera rendering algorithm is provided that corrects for artifacts resulting from differences in depth in the microimages. While both the artifact-reducing focused plenoptic camera design and the artifact-reducing rendering algorithm work by themselves to reduce artifacts, the two approaches may be combined.
Owner:ADOBE INC
Control of stray light in camera systems employing an optics stack and associated methods
A camera system may include an optics stack including two substrates secured together in a vertical direction and an optical system on the two substrates, the two substrates having exposed sides, a detector on a detector substrate, and a stray light blocker directly on at least some sides of the optics stack.
Owner:DIGITALOPTICS CORPORATION
Pattern forming apparatus and pattern forming method, movable member drive system and movable member drive method, exposure apparatus and exposure method, and device manufacturing method
InactiveUS20070263191A1Improve accuracyImprove controllabilityPhotomechanical apparatusSemiconductor/solid-state device manufacturingOptical axisEngineering
A partial section of an aerial image measuring unit is arranged at a wafer stage and part of the remaining section is arranged at a measurement stage, and the aerial image measuring unit measures an aerial image of a mark formed by a projection optical system. Therefore, for example, when the aerial image measuring unit measures a best focus position of the projection optical system, the measurement can be performed using the position of the wafer stage, at which a partial section of the aerial image measuring unit is arranged, in a direction parallel to an optical axis of the projection optical system as a datum for the best focus position. Accordingly, when exposing an object with illumination light, the position of the wafer stage in the direction parallel to the optical axis is adjusted with high accuracy based on the measurement result of the best focus position.
Owner:NIKON CORP
Photographing apparatus
ActiveUS20080131107A1Quality improvementSimply obtainedCharacter and pattern recognitionElectric digital data processingComputer graphics (images)Direction information
Photographing apparatus having a plurality of photographic optical systems, comprises: an attitude detecting device which detects an attitude of the apparatus body; a physical relationship information obtaining device which obtains information on physical relationship among the photographic optical systems setting; and a shooting direction information obtaining device which obtains information on the shooting direction of each of the photographic optical systems. The images photographed by each of the photographic optical systems may be corrected based on information on the attitude of the apparatus body, information on the physical relationship among the photographic optical systems, and information on the shooting direction of each of the photographic optical systems. Thereby it enables to easily correct tilt and the like of the images.
Owner:FUJIFILM CORP
Intra-link spatial-mode mixing in an under-addressed optical MIMO system
ActiveUS20120224807A1Reduce frequencyReduce outage rateOptical mode multiplex systemsCoupling light guidesCoherence timeError correcting
The outage probability in an under-addressed optical MIMO system may be reduced by configuring an intra-link optical mode mixer to dynamically change the spatial-mode mixing characteristics of the link on a time scale that is faster than the channel coherence time. Provided that the MIMO system employs an FEC code that has a sufficient error-correcting capacity for correcting the amount of errors corresponding to an average state of the MIMO channel, this relatively fast dynamic change tends to reduce the frequency of events during which the number of errors per FEC-encoded block of data exceeds the error-correcting capacity of the FEC code.
Owner:ALCATEL LUCENT SAS
Digitally controlled luminaire system
InactiveUS7319298B2Radiation pyrometryBeam/ray focussing/reflecting arrangementsJunction temperatureLuminous flux
The present invention provides a luminaire system capable of generating light of a desired chromaticity and luminous flux output during continuous operation with varying ambient operating temperature. The luminaire system can be further capable of maintaining a desired correlated colour temperature during dimming of the luminaire. The luminaire system comprises one or more arrays of light-emitting elements for generating light with a current driver system coupled thereto for selectively supplying electrical drive current to each of the arrays, wherein the current driver system is responsive to drive signals received from a controller. The luminaire system further comprises an optical sensor system for generating optical signals representative of chromaticity and luminous flux output of the light. A heat sensing system is operatively coupled to the one or more arrays for generating signals representative of the junction temperatures of arrays of light-emitting elements during operation. The luminaire system further comprises a controller that is operatively connected to the current driver system, the optical sensor system and the heat sensing system for receiving the signals generated by each of these systems and is configured to generate one or more drive signals for transmission to the current driver system in response to the optical signals and thermal signals received from the optical system and the heat sensing system, respectively, thereby enabling a desired level of control of the output light.
Owner:SIGNIFY HLDG BV
Substrate-guided optical device particularly for vision enhanced optical systems
ActiveUS7751122B2Design and fabrication is facilitatedEasy to mergeMirrorsMountingsTotal internal reflectionImaging processing
There is provided an optical system, including a mechanical body (110), a light-transmitting substrate (20) having two major surfaces and edges, embedded in the mechanical body, an optical element (90) for coupling light into the substrate by total internal reflection and a plurality of partially reflecting surfaces (22) carried by the substrate, wherein the partially reflecting surfaces are parallel to each other and are not parallel to any of the edges of the substrate. The system also includes an image capturing device (112), a display source (4), and an image-processing unit (114). The image-capturing device (112) is connected via the image-processing unit (114) to the display source (4).
Owner:LUMUS LTD
Enhanced resolution for image generation
InactiveUS7417617B2High resolutionCathode-ray tube indicatorsSteroscopic systemsImage resolutionDisplay device
Images with enhanced resolution are created with a display device comprising a non-transmissive light valve including addressable pixels, a light source that directs light to the light valve, and a lens positioned between the light valve and the light source, the lens directing light from the light source to the pixels on the light valve and the light valve directing light to viewing optics. The light valve is an integrated circuit ferroelectric liquid crystal device (ICFLCD), or other light valve arrays such as a digital light processor (DLP) display, having an array of addressable pixels. Such light valves may be mounted in a head mounted display.
Owner:DIMENSION TECH
High numerical aperture ring field projection system for extreme ultraviolet lithography
An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12 DEG , and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15 DEG . Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 mu m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 mu m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 mu m.
Owner:EUV
Apparatus and method for production of three-dimensional models by spatial light modulator
InactiveUS6051179AFacilitate cross-linkingHigh mechanical strengthAdditive manufacturing apparatusAnalogue computers for control systemsSpatial light modulatorWide beam
An apparatus and the method of its operation for rapid prototyping of a three-dimensional object which includes a radiant energy source of a wide beam of radiant energy of suitable intensity and wavelength for curing a layer of photo-curable resin contained in an open vat, a spatial light modulator (SLM) having an array of pixel elements which are individually digitally controllable by a computer, for modulating the radiant energy beam projected from the radiant energy source on a pixel by pixel basis, to form a series of time sequential images of the cross-sectional laminae of the object, an optical system for focusing each image formed by the SLM, one at a time, onto successive layers of photo-curable resin for predetermined exposure times to thereby form stacked laminae of cured resin, each lamina of cured resin being in the shape of a different one of the cross-sectional laminae, and a piston support for lowering each lamina of cured resin after it is formed by the SLM and for depositing a layer of resin corresponding to the thickness of one cross sectional lamina of the three-dimensional object before the step of projecting a new image by the SLM. The SLM, the piston support for lowering, and the optical system operate repeatedly and sequentially until a complete copy of the object is thereby produced.
Owner:GLOBAL FILTRATION SYST
Methods and systems for simultaneous real-time monitoring of optical signals from multiple sources
ActiveUS20070188750A1Increase speedLower levelRadiation pyrometrySpectrum investigationDetector arrayOptical communication
Methods and systems for real-time monitoring of optical signals from arrays of signal sources, and particularly optical signal sources that have spectrally different signal components. Systems include signal source arrays in optical communication with optical trains that direct excitation radiation to and emitted signals from such arrays and image the signals onto detector arrays, from which such signals may be subjected to additional processing.
Owner:PACIFIC BIOSCIENCES
System for measuring vital signs during hemodialysis
InactiveUS20110066043A1Simplifies and expedites applicationEfficient detectionDialysis systemsMedical devicesTransit timeSerial port
The invention provides a system for continuously monitoring a patient during hemodialysis. The system includes a hemodialysis machine for performing the hemodialysis process that features a controller, a pump, a dialyzer filter, a lumen, and an interface to a body-worn monitor. A patient attaches to the dialysis machine through the lumen, and wears a body-worn monitor for continuously measuring blood pressure. The monitor includes an optical system for measuring an optical waveform, an electrical system for measuring an electrical waveform, and a processing component for determining a transit time between the optical and electrical waveforms and then calculating a blood pressure value from the transit time. The body-worn monitor features an interface (e.g. a wired serial interface, or a wireless interface) to transmit the blood pressure value to the controller within the hemodialysis machine. The controller is configured to receive the blood pressure value, analyze it, and in response adjust the dialysis process.
Owner:SOTERA WIRELESS
Augmented reality glasses for medical applications and corresponding augmented reality system
Owner:BADIALI GIOVANNI +3
Fiber optic device for sensing analytes
InactiveUS20050113657A1Reduce power consumptionExtended service lifeMaterial analysis by observing effect on chemical indicatorDiagnostic recording/measuringFiberAnalyte
A device for sensing analyte concentration, and in particular glucose concentration, in vivo or in vitro is disclosed. An optical conduit, preferably an optical fiber has an optical system at the proximal end of the optical conduit. A sensing element is attached to the distal end of the optical conduit, and comprises at least one binding protein adapted to bind with at least one target analyte. The sensing element further comprises at least one reporter group that undergoes a luminescence change with changing analyte concentrations. Optionally, the sensing element includes reference groups with luminescence properties that are substantially unchanged by variations in the analyte concentrations.
Owner:BECTON DICKINSON & CO
Method and device for algining a lens with an optical system
The invention comprises a process for pre-aligning a lens with an optical system, the process comprising: providing a lens and an optical system having an optical axis, wherein the lens is apt to be aligned with the optical system to form on an image plane an image of a source object, the image having top, bottom, left and right edges; coarsely positioning the lens with respect to the optical system; and in a plane normal to the optical axis of the optical system, correcting the position of the lens until the values of four Combination Modulation Transfer Functions (C-MTF) are in predetermined ranges, the C-MTF being calculated at four coarse measurement locations situated close to the edges of the image along two coarse positioning axes crossing the center of the image, each for a combination pattern comprising a combination of a Sagittal pattern and a Tangential pattern.
Owner:AO ETHER
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