Simplified method of manufacturing
liquid crystal displays. A gate wire including a gate line, a gate pad and a gate
electrode is formed on the substrate by using the first
mask. A gate insulating layer, a
semiconductor layer, a
ohmic contact layer and a
metal layer are sequentially deposited to make a quadruple
layers, and patterned by a dry etch of using the second
mask. At this time, the quadruple
layers is patterned to have a matrix of
net shape layout and covering the gate wire. An opening exposing the substrate is formed in the display area and a
contact hole exposing the gate pad is formed in the
peripheral area. Next, ITO is deposited and a
photoresist layer coated on the ITO. Then, the ITO layer is patterned by using the third
mask and a dry etch, and the data conductor layer and the
ohmic contact layer not covered by the ITO layer is dry etched. After depositing a
passivation layer, a opening is formed by using the fourth mask and the exposed
semiconductor layer through the opening is etched to separate the
semiconductor layer under the adjacent data line.