The invention discloses an
ultraviolet light-emitting
diode with an
electron deceleration layer structure. The light-emitting
diode sequentially comprises a substrate, an AlN nucleating layer, an AlN buffer layer, a non-doped AlGaN buffer layer, an n-type AlGaN layer, a B(Al, Ga)N
electron deceleration layer, an Al<x>Ga<1-x>N / Al<y>Ga<1-y>N multi-
quantum well active region, a p-type AlGaN layer and a p-type GaN
ohmic contact layer from bottom to top. Compared with the Al<x>Ga<1-x>N / Al<y>Ga<1-y>N
heterojunction, the B(Al, Ga)N / AlGaN
heterojunction has a larger
conduction band offset and
valence band offset ratio, so that the rate of electrons entering the active region from the n-type region can be limited more effectively. Secondly, a traditional p-type doped
electron barrier layer is removed, the efficiency of hole injection into an active region can be improved, and the
radiation recombination efficiency of electron holes in the active region is improved. Besides, polarized charges can be generated at the two ends of the B(Al, Ga)N electron deceleration layer, a polarized
electric field with the same electron migration direction can be formed, and the migration rate of electrons entering an active region from an n-type region can be reduced, so that the
electron capture efficiency of the
quantum well is improved, the
radiation recombination probability of the electrons and holes in the
quantum well is increased, and the light emitting efficiency of the UV-LED is improved.