570results about How to "Good surface smoothness" patented technology

An electrophoretic medium (100) comprises at least one type of particle (108) suspended in a suspending fluid (106) and capable of moving therethrough on application of an electric field to the medium, the particles (108) including at least one electrophoretically mobile specularly reflective particle.

A packaging process for a semiconductor chip that includes the following steps. A carrier having an upper surface and a corresponding lower surface is provided. A photoresist layer is formed on the upper surface of the carrier. A plurality of photoresist openings that expose the carrier is formed in the photoresist layer. A plurality of openings that connects with the photoresist openings are formed in the carrier. A tape is attached to the lower surface of the carrier. The body is filled into the openings of the carrier. A chip is mounted onto the upper surface of the carrier and electrically connected therewith. Finally, the tape is removed from the lower surface of the carrier.

In a quadrangular photomask blank substrate with a length on each side of at least 6 inches, which has a pair of strip-like regions that extend from 2 to 10 mm inside each of a pair of opposing sides along an outer periphery of a substrate top surface, with a 2 mm edge portion excluded at each end, each strip-like region is inclined downward toward the outer periphery of the substrate, and a difference between maximum and minimum values for height from a least squares plane for the strip-like region to the strip-like region is at most 0.5 μm. The substrate exhibits a good surface flatness at the time of wafer exposure.

In a method for producing a nitride semiconductor light-emitting device according to the present invention, first, a nitride semiconductor substrate having groove portions formed is prepared. An underlying layer comprising nitride semiconductor is formed on the nitride semiconductor substrate including the side walls of the groove portions, in such a manner that the underlying layer has a crystal surface in each of the groove portions and the crystal surface is tilted at an angle of from 53.5° to 63.4° with respect to the surface of the substrate. Over the underlying layer, a light-emitting-device structure composed of a lower cladding layer containing Al, an active layer, and an upper cladding layer containing Al is formed. According to the present invention, thickness nonuniformity and lack of surface flatness, which occur when accumulating a layer with light-emitting-device structure of nitride semiconductor over the nitride semiconductor substrate, are alleviated while inhibiting occurrence of cracking.

The invention provides a preparation method and application of a separation film with a nano composite cortical layer. The separation film comprises a non-woven fabric layer, two porous support layers and a desalination layer, and is characterized in that the lower layer of the two porous support layers is a porous body layer containing polymers and/or nano particles, and the upper layer of the two porous support layers is a porous cortical containing polymers and nano particles. The preparation method includes coating the upper layer and the lower layer of the non-woven base material by means of a double-layer coating technology. An ultrafilter support layer of the composite separation film prepared by the preparation method is good in surface evenness, hight water flux is kept in the meantime of keeping higher cutoff rate, and the separation film can be directly used as an ultrafiltration film or can be used as a basic porous support layer to further prepare a composite forward osmosis, reverse osmosis and nanofiltration film. The preparation method can be applied to preparing the reverse osmosis film and the nanofiltration film which are good in performance, and a composite ultrafiltration film with low molecular weight cutoff.

A hard coating that is to be disposed on a surface of a body includes a diamond layer which includes a plurality of diamond grains and is doped with boron, and an outer layer which includes an intermetallic compound and is disposed on the diamond layer by a physical vapor deposition method.

[Object] Provided are a sheet-like molded article having excellent surface smoothness, moldability, flexibility, and a high transmittance of short-wavelength light, and a thermoplastic polymer composition used to produce the sheet-like molded article.

[Solution] A thermoplastic polymer composition containing an acrylic block copolymer (A) and an acrylic resin (B), in which the acrylic block copolymer (A) has, in its molecule, at least one structure where polymer blocks (a2) mainly composed of a methacrylic ester unit are bonded to both ends of a polymer block (a1) mainly composed of an acrylic ester unit, the acrylic block copolymer (A) having a specific weight-average molecular weight range, the acrylic block copolymer (A) contains an acrylic block copolymer (A1) having a polymer block (a2) content of 40% by mass or more and not less than 80% by mass and contains an acrylic block copolymer (A2) having a polymer block (a2) content of 10% by mass or more and less than 40% by mass, the acrylic resin (B) is mainly composed of a methacrylic ester unit, and the mass ratio [(A)/(B)] is in the range of 97/3 to 10/90.

In an electro-optic light modulator requiring an electro-optical sensor material such as polymer dispersed liquid crystal, or PDLC is directly coated on an optical glass substrate with a transparent electrode, such as indium tin oxide (ITO) and an optional layer of passivation coating such as silicon dioxide (SiO₂) on its surface. A thin layer of polymeric adhesive is coated on top of PDLC layer and then this two-layer coating is laminated with a dielectric mirror on a polyester film (Mylar™) preferably with the assistance of a vacuum.

The invention relates to the nanometer plate surface glue equipment and the cloth glue that comprises the working platform, cloth hopper distributing nanometer fluid on the compound extractor, vibrating device connected with the cloth hopper, cloth applying device setting the glass fiber net on the nanometer glue band, and the scraping device and compression device. The compound extraction band moving horizontally on the working platform and forming nanometer band, setting glass fiber net cloth with tension on the nanometer band, compressing the glass fiber net cloth and the nanometer band into nanometer compound band, compressing the compound band tightly. It is heat and sound insulation, radiation resistant, and improved in product feature and reduced in production cost.

Described herein is a method for manufacturing a nitride semiconductor layer by stacking, on a silicon nitride layer, the first nitride semiconductor layer having a surface inclined with respect to the surface of the silicon nitride layer and then stacking the second nitride semiconductor layer on the first nitride semiconductor layer, a nitride semiconductor element and a nitride semiconductor light-emitting element each including the nitride semiconductor layer; and a method for manufacturing the nitride semiconductor element.

An organic electroluminescence type display apparatus of top emission type, in which a thin film transistor (TFT), a flattening film made of organic resin and an organic EL element, in which at least an anode, an electroluminescence layer and a cathode are laminated on the flattening film in this order, are formed in each picture element in a display region on a substrate. The anode is composed of at least two layer film including an aluminum (Al) alloy film containing as a impurity at least one of transition metals of the eighth group of 3d into Al and including a light transmitting conductive oxide film laminated on the Al alloy film.

An aspect of the present invention relates to a method of modifying a surface of a powder, comprising mixing a powder with a heterocyclic compound comprising at least one hydroxylic group and/or carboxylic group. The present invention further relates to a magnetic recording medium and a coating material.

The present invention discloses one kind of polishing fluid for fine surfacing and its usage. The polishing fluid includes abradant and water, and the abradant is water dispersed sol type aluminum mixing silica abradant. When the polishing fluid is used in chemomechanical polishing, the downward pressure is 0.5-3 psi. The polishing fluid may be used to eliminate Ta, TaN, TEOS, FSG, BD and other low dielectric constant material effectively, and has especially high low dielectric constant material eliminating efficiency.

The invention relates to a barium titanate chemico-mechanical polishing aqueous composition and its application. Specifically, the barium titanate chemico-mechanical polishing aqueous composition comprises: 1-20 wt%, preferably 8-15 wt% of an abrasive; 0.5-10 wt%, preferably 1-3 wt% of a complexing agent; and 0.01-5 wt%, preferably 0.1-1 wt% of a surface adsorbent, wherein the barium titanate chemico-mechanical polishing aqueous composition has a pH value of 8.0-12.0, preferably 10.0-11.5. The barium titanate chemico-mechanical polishing aqueous composition provided in the invention can be effectively applied to a barium titanate substrate chemico-mechanical polishing process, thereby being able to effectively obtain a polished barium titanate layer with a high polishing rate and high surface quality.

The display device of the invention includes: a first plastic substrate including a composite layer having a resin-impregnated fiber fabric, an inorganic barrier layer 25 formed on the composite layer, and a planarizing resin layer formed on the inorganic barrier layer; and a display medium layer formed on the planarizing resin layer-side of the first plastic substrate.

The invention discloses a preparation method of a composite polishing pad. The preparation method comprises the following steps that (1) non-woven fabric is preprocessed, specifically, (a) the non-woven fabric is put into a drying oven for flattening, (b) the flattened non-woven fabric is immersed into a glue solution and then is taken out after being infiltrated sufficiently, and a non-woven fabric substrate material is obtained; (2) a polymer solution is prepared, specifically, (I) a macromolecular elastomer is dissolved into a solvent, and a macromolecular elastomer solution is prepared; (II) polymer particles are added into the macromolecular elastomer solution, and the polymer solution is obtained; (3) the non-woven fabric is made into a pad, specifically, the non-woven fabric substrate material is infiltrated into the polymer solution and then is taken out after being infiltrated sufficiently, and unnecessary solutions on the surface of the non-woven fabric substrate material are scraped off; the non-woven fabric substrate material is immersed into coagulating bath for consolidation forming and then put into pure water for rinsing and finally dried to the constant weight, and an original polishing pad is obtained; and (4) the polishing pad is formed, specifically, after the surface of the original polishing pad is polished, cut and rubberized, and the finished polishing pad is obtained. By means of the preparation method, the composite polishing pad has a large polishing rate, and moreover the flatness of a polished object is good.