1763 results about "Colloidal silica" patented technology

The object of the present invention is to provide a carbon nanotube composition that does not impair the characteristics of the carbon nanotubes itself, allows the carbon nanotubes to be dispersed or solubilized in a solvent, does not cause separation or aggregation of the carbon nanotubes even during long-term storage, has superior electrical conductivity, film formability and moldability, can be easily coated or covered onto a base material, and the resulting coated film has superior moisture resistance, weather resistance and hardness; a composite having a coated film composed thereof; and, their production methods. In order to achieve this object, the present invention provides a carbon nanotube composition that contains a conducting polymer (a) or heterocyclic compound trimer (i), a solvent (b) and carbon nanotubes (c), and may additionally contain a high molecular weight compound (d), a basic compound (e), a surfactant (f), a silane coupling agent (g) and colloidal silica (h) as necessary; a composite having a coated film composed of the composition; and, their production methods.

The present invention provides a photocatalyst-carrying structure which has a structure, wherein an adhesive layer is provided in between a photocatalyst layer and a substrate, the adhesive layer is composed of silicon-modified resin, polysiloxane-containing resin or colloidal silica-containing resin, and for forming the photocatalyst layer a composition comprising a metal oxide gel or a metal hydroxide gel and a photocatalyst is used. Further, the present invention also provides a photocatalyst coating agent for producing a photocatalyst-carrying structure which contains silicon compound, at least one metal oxide sol or metal hydroxide sol, and at least one photocatalyst powder or sol.

Methods for reducing surface adsorption of biological materials to the walls of microfluidic conduits in microscale devices are provided. In an example of the methods, one or more colloidal-size particles, such as colloidal silica particles, are flowed in a fluid within the microfluidic conduit in the presence of one or more adherent biological materials (such as one or more proteins, cells, carbohydrates, nucleic acids, lipids and the like) to adsorb to the materials and prevent them from binding to the capillary walls of the microfluidic conduit. Other adsorption inhibition agents such as detergents and nonaqueous solvents can be used alone or in combination with colloidal particles to reduce surface adsorption in microfluidic conduits.

A monolith comprises a zeolite, a thermally conductive carbon, and a binder. The zeolite is included in the form of beads, pellets, powders and mixtures thereof. The thermally conductive carbon can be carbon nano-fibers, diamond or graphite which provide thermal conductivities in excess of about 100 W/m·K to more than 1,000 W/m·K. A method of preparing a zeolite monolith includes the steps of mixing a zeolite dispersion in an aqueous colloidal silica binder with a dispersion of carbon nano-fibers in water followed by dehydration and curing of the binder is given.

It is an object of the present invention to provide a light diffusing sheet that has a less tendency to be deflected due to heat generated by a lamp and a back light unit using this. The light diffusing sheet of the present invention comprises a base sheet and a light diffusing layer provided on a surface of the base sheet. The light diffusing layer is formed by dispersing resinous beads and a fine inorganic filler into a binder. It is preferable that the fine inorganic filler has an averaged particle diameter of not smaller than 5 nanometers and smaller than 1 micrometer. It is preferable that the amount of the fine inorganic filler to be mixed is 10 parts to 500 parts by weight for 100 parts by weight of a polymer component in the binder. As the fine inorganic filler, colloidal silica is used.

A barrier polishing liquid is provided that includes (a) a nonionic surfactant represented by Formula (I) below, (b) at least one type of organic acid selected from the group consisting of an aromatic sulfonic acid, an aromatic carboxylic acid, and a derivative thereof, (c) colloidal silica, and (d) benzotriazole or a derivative thereof.

(In Formula (I), R¹ to R⁶ independently denote a hydrogen atom or an alkyl group having 1 to 10 carbons, X and Y independently denote an ethyleneoxy group or a propyleneoxy group, and m and n independently denote an integer of 0 to 20.) There is also provided a chemical mechanical polishing method that includes supplying the barrier polishing liquid to a polishing pad on a polishing platen at a flow rate per unit area of a semiconductor substrate per unit time of 0.035 to 0.25 mL/(min·cm²), and polishing by making the polishing pad and a surface to be polished move relative to each other while they are in a contacted state.

A solar cell includes an improved anti-reflection (AR) coating provided on an incident glass substrate. In certain example embodiments, the AR coating includes a layer comprising porous silica. The porous nature of the silica inclusive layer permits the refractive index (n) of the silica inclusive layer to be reduced, thereby decreasing reflection and permitting more radiation to make its way to the active layer(s) of the solar cell. In certain example embodiments, a coating solution may be formed by mixing a colloidal silica solution and a polymeric silica solution, then applying the coating solution to a substrate and curing the same in order to form an AR coating.

A coating composition forming a abrasion resistant coating comprising (A) an ultraviolet-curable silicone prepared by chemically modifying particulate colloidal silica with a specific silane compound, (B) a monomer mixture comprising a (meth)acrylate having a specific isocyanate skeleton and a urethane poly(meth)acrylate having an alicyclic skeleton, and (C) a photo-polymerization initiator. By using a urethane poly(meth)acrylate having an alicyclic skeleton as part of the component (B) and the component (A) having an enhanced reactivity of chemical modification, the compatibility of the component (A) with the component (B) is improved to give a cured coating with excellent wear resistance, weather resistance and durability.

The invention relates to a method of producing an aqueous dispersion comprising mixing at least one silane compound and colloidal silica particles to form silanized colloidal silica particles, mixing said silanized colloidal silica particles with an organic binder to form the dispersion. The invention also relates to a dispersion obtainable by the method, and the use thereof.

The invention disclosed relates to porous carbon of spherical morphology having tuned porosity and to a method of making same, comprising: (a) providing a precursor solution, by combining in an aqueous solution a colloidal silica template material and a water-soluble pyrolyzable carbon source, wherein the particle size of the colloidal silica template and the colloidal silica/carbon source weight ratio are controlled, (b) atomizing the precursor solution into small droplets by ultrasonic spray pyrolysis (c) directing the droplets into a high temperature furnace operating at a temperature of 700-1200° C., under an inert gas atmosphere, where the droplets are transformed into solid spherical composite carbon/silica particles, (d) collecting the resulting composite carbon/silica particles exiting from the furnace, and (e) removing the silica from the particles, to provide substantially pure porous carbon of spherical morphology having tuned porosity defined by surface area and pore size. The porous carbon according to the invention is used as catalyst supports in PEM fuel cells, as electrodes in supercapacitors and lithium in batteries, for hydrogen storage and as earners for drug delivering.

An improved, user-friendly silane/silica sol copolymer hardcoating composition for protecting optical plastic and other substrates (including wood, metals, glass, plastics and most coated articles) from scratching is able to be manufactured at lower costs and to provide much-improved ease of use in transportation, storage, dipbath (or other coating tank) stability, and blush resistance in ordinary cleanroom atmospheres. The silane/silica sol copolymer is formed as a direct reaction product of an acidic silica sol and monomethyltrialkoxysilane, preferably substantially monomethyltriethoxysilane, in ratios of 30:70 to 70:30, most preferably about 40:60. A tail solvent aids blush resistance, reduces internal stress and permits adhesion to unprimed polycarbonate. Optionally, colloidal silica sol dissolved in water-miscible solvent may be reacted in a second stage with acidic aqueous colloidal silica sol earlier silanized with monomethyltrialkoxysilane.

A coating admixture, method of coating and substrates coated thereby, wherein the coating contains colloidal silica, colloidal alumina, or combinations thereof; a filler such as silicon dioxide, aluminum oxide, titanium dioxide, magnesium oxide, calcium oxide and boron oxide; and one or more emissivity agents such as silicon hexaboride, carbon tetraboride, silicon tetraboride, silicon carbide, molybdenum disilicide, tungsten disilicide, zirconium diboride, cupric chromite, or metallic oxides such as iron oxides, magnesium oxides, manganese oxides, chromium oxides, copper chromium oxides, cerium oxides, terbium oxides, and derivatives thereof. In a coating solution, an admixture of the coating contains water. A stabilizer such as bentonite, kaolin, magnesium alumina silicon clay, tabular alumina and stabilized zirconium oxide is also added.

An improved composition and method for polishing a sapphire surface is disclosed. The method comprises abrading a sapphire surface, such as a C-plane or R-plane surface of a sapphire wafer, with a polishing slurry comprising an abrasive amount of an inorganic abrasive material such as colloidal silica suspended in an aqueous medium having a salt compound dissolved therein. The aqueous medium has a basic pH and includes the salt compound in an amount sufficient to enhance the sapphire removal rate relative to the rate achievable under the same polishing conditions using a the same inorganic abrasive in the absence of the salt compound.

A gypsum board having roughened surface glass fiber reinforcement. The roughened surface of glass fiber is created by incorporating nano or micro particles of colloidal silica or clay or other inorganic particles in a silane based sizing composition. The sizing coating is partially or completely cured and incorporated in gypsum wet mix either as additions of chopped fibers or as placement of roughened surface glass fiber mats at selected locations within a cast gypsum sheet. The roughened surface of glass fiber with nano or micro particles compliantly bonded with silane polymer transfers load from gypsum to glass fibers providing improved strength and flexure resistance of gypsum boards.

A building material and a method for coating a substrate for the building material with a coating film having a variety of functions relating to an environment such as mildew resistance, deodorization, antibacterial activity and air purification in addition to the anti-staining effect by having an excellent hydrophilicity. The method for coating the substrate for a building material comprises the steps of; coating a coating material comprising a hydrophilic polymer and a photocatalyst on the substrate, and drying the coating material to form a coating film containing the photocatalyst, wherein the hydrophilic polymer is at least one selected from the group consisting of methyl silicate, liquid glass, colloidal silica, poly(meth)acrylate, and polytetrafluoroethylene graft-polymerized with sulfonic acid, and the photocatalyst is at least one selected from the group consisting of titanium oxide coated with zeolite, titanium oxide coated silica and titanium oxide coated with apatite.

A polishing composition includes silicon dioxide, an alkaline compound, an anionic surfactant, and water. The silicon dioxide is, for example, colloidal silica, fumed silica, or precipitated silica. The alkaline compound is, for example, potassium hydroxide, sodium hydroxide, ammonia, tetramethylammonium hydroxide, piperazine anhydride, or piperazine hexahydrate. The anionic surfactant is at least one selected from a sulfonic acid surfactant, a carboxylic acid surfactant, and a sulfuric acid ester surfactant. The polishing composition can be suitably used in applications for polishing a silicon wafer.