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1769 results about "Colloidal silica" patented technology

Colloidal silicas are suspensions of fine amorphous, nonporous, and typically spherical silica particles in a liquid phase.

Photocatalyst-carrying structure and photocatalyst coating material

The present invention provides a photocatalyst-carrying structure which has a structure, wherein an adhesive layer is provided in between a photocatalyst layer and a substrate, the adhesive layer is composed of silicon-modified resin, polysiloxane-containing resin or colloidal silica-containing resin, and for forming the photocatalyst layer a composition comprising a metal oxide gel or a metal hydroxide gel and a photocatalyst is used. Further, the present invention also provides a photocatalyst coating agent for producing a photocatalyst-carrying structure which contains silicon compound, at least one metal oxide sol or metal hydroxide sol, and at least one photocatalyst powder or sol.
Owner:NIPPON SODA CO LTD

Method of making solar cell/module with porous silica antireflective coating

InactiveUS20070074757A1Improved anti-reflection (AR) coatingReduce reflectionCoatingsPhotovoltaic energy generationColloidal silicaAnti-reflective coating
A solar cell includes an improved anti-reflection (AR) coating provided on an incident glass substrate. In certain example embodiments, the AR coating includes a layer comprising porous silica. The porous nature of the silica inclusive layer permits the refractive index (n) of the silica inclusive layer to be reduced, thereby decreasing reflection and permitting more radiation to make its way to the active layer(s) of the solar cell. In certain example embodiments, a coating solution may be formed by mixing a colloidal silica solution and a polymeric silica solution, then applying the coating solution to a substrate and curing the same in order to form an AR coating.
Owner:GUARDIAN GLASS LLC

CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device

A CMP slurry for metallic film is provided, which includes water, 0.01 to 0.3 wt %, based on a total quantity of the slurry, of polyvinylpyrrolidone having a weight average molecular weight of not less than 20,000, an oxidizing agent, a protective film-forming agent containing a first complexing agent for forming a water-insoluble complex and a second complexing agent for forming a water-soluble complex, and colloidal silica having a primary particle diameter ranging from 5 to 50 nm.
Owner:KIOXIA CORP

Coating film for building material

A building material and a method for coating a substrate for the building material with a coating film having a variety of functions relating to an environment such as mildew resistance, deodorization, antibacterial activity and air purification in addition to the anti-staining effect by having an excellent hydrophilicity. The method for coating the substrate for a building material comprises the steps of; coating a coating material comprising a hydrophilic polymer and a photocatalyst on the substrate, and drying the coating material to form a coating film containing the photocatalyst, wherein the hydrophilic polymer is at least one selected from the group consisting of methyl silicate, liquid glass, colloidal silica, poly(meth)acrylate, and polytetrafluoroethylene graft-polymerized with sulfonic acid, and the photocatalyst is at least one selected from the group consisting of titanium oxide coated with zeolite, titanium oxide coated silica and titanium oxide coated with apatite.
Owner:NICHIHA CORP

Polishing composition and polishing method

A polishing composition includes silicon dioxide, an alkaline compound, an anionic surfactant, and water. The silicon dioxide is, for example, colloidal silica, fumed silica, or precipitated silica. The alkaline compound is, for example, potassium hydroxide, sodium hydroxide, ammonia, tetramethylammonium hydroxide, piperazine anhydride, or piperazine hexahydrate. The anionic surfactant is at least one selected from a sulfonic acid surfactant, a carboxylic acid surfactant, and a sulfuric acid ester surfactant. The polishing composition can be suitably used in applications for polishing a silicon wafer.
Owner:FUJIMI INCORPORATED
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