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5314results about "Surface-active detergent compositions" patented technology

Stabilized liquid compositions

Structuring systems, specifically thread-like structuring systems and / or disk-like structuring systems wherein structuring agents aggregate together to form disk-like structures that can interact with other disk-like structures to result in a structuring system, and processes for making such structuring systems, stabilized liquid compositions comprising such structuring systems, systems that utilize such structuring systems for stabilizing liquid compositions, and methods for utilizing the stabilized liquid compositions to provide a benefit, are disclosed.
Owner:THE PROCTER & GAMBLE COMPANY

Method for forming a photoresist pattern

A photoresist cleaning solution and method for forming photoresist patterns using the same. More specifically, disclosed are a photoresist cleaning solution comprising H2o and an ionic surfactant represented by Formula 1, and a method for forming a photoresist pattern using the same. By spraying the cleaning solution of the present invention over photoresist film before and / or after exposing step, pattern formation in an undesired region caused by ghost images can be removed.
Owner:SK HYNIX INC

Razor head with mild cleansing composition as a shaving aid

A razor head assembly is described that contains a mild cleansing composition including acyl isethionate surfactant(s) positioned adjacent to a blade for shaving and treating the skin. The isethionate surfactants provide the user with nearly simultaneous moisturization, cleansing and shaving. An after shave phase is provided in addition to the cleansing phase in a preferred embodiment.
Owner:UNILEVER HOME & PERSONAL CARE USA DIV OF CONOPCO IN C

Non-chlorinated concentrated all-in-one acid detergent and method for using the same

Non-chlorinated concentrated acid detergent compositions and methods for using the same are provided. More particularly, the acid detergents comprise a quantity of a fatty alkyl-1,3-diaminopropane or salt thereof and optionally alkylsulfonic acid. The detergents form the basis for an all-in-one cleaning, sanitizing, and descaling composition for use on soiled surfaces, particularly surfaces contaminated with milk soils and other food soils.
Owner:DELAVAL HLDG AB

Apparatus for supplying detergent in washer

InactiveUS20050229652A1Decolorization or discoloration of a laundry can be preventedSurface-active detergent compositionsOther washing machinesEngineeringLaundry
The present invention provides an apparatus for supplying a detergent in a washer, in which a liquid detergent box supplying a liquid detergent mixed with water is provided to a powdered detergent container of a detergent box, by which the liquid detergent is conveniently supplied, and by which the decolorization or discoloration of a laundry can be prevented. The present invention includes a detergent box having a powdered detergent container to mix a powdered detergent and water to supply and a liquid detergent box detachably provided to the powdered detergent container to mix a liquid detergent and water to supply.
Owner:LG ELECTRONICS INC

Aqueous fluoride compositions for cleaning semiconductor devices

The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageously provide both cleaning efficiency and material compatibility.
Owner:EKC TECH

Gelled hydrocarbon compositions and methods for use thereof

Gelled organic compositions and methods for using same. The gelled compositions may be liquid organic fluids, such as gelled liquid hydrocarbons, formed from a mixture of an organic-base fluid, a carboxylic acid, and one or more metal source compounds, such as a metal salt of carboxylic acid. The gelled compositions may be used in variety of applications including, but not limited to, oil field, pipeline and processing facility applications.
Owner:BJ SERVICES LLC +1

Self-sticking disintegrating block for toilet or urinal

A self-sticking disintegrating cleansing block to be attached directly to a wall of a toilet bowl or urinal, above the water-line and in the stream of flush water, by pressing the cleansing block to the wall. The cleaning block includes 25% to 99% of a solid surfactant, and 1% to 25% of a liquid component. The cleansing block may include a substrate removably attached to a surface of the cleansing block. In use, the substrate is removed from the cleansing block and the exposed surface of the cleansing block is pressed to a surface in a position above any waterline that is contacted by a rinse liquid that disintegrates the cleansing block. Rinse liquid is then allowed to contact the cleansing block such that an amount of the cleansing block is mixed with rinse fluid to clean the surface or a liquid reservoir adjacent the surface.
Owner:SC JOHNSON & SON INC

Personal care composition in the form of an article having a porous, dissolvable solid structure

The present invention relates to a dissolvable article in the form of a porous dissolvable solid structure, comprising from about 23% to about 75% surfactant; wherein the surfactant has an average ethoxylate / alkyl ratio of from about 0.001 to about 0.45; from about 10% to about 50% water soluble polymer; and from about 1% to about 15% plasticizer; and wherein the article has a density of from about 0.05 g / cm3 to about 0.25 g / cm3.
Owner:THE PROCTER & GAMBLE COMPANY

Cleaning composition for removing resists and method of manufacturing semiconductor device

The cleaning composition for removing resists includes a salt of hydrofluoric acid and a base not containing a metal (A component), a water-soluble organic solvent (B1 component), at least one acid selected from a group consisting of organic acid and inorganic acid (C component), water (D component), and optionally an ammonium salt (E1 component), and its hydrogen ion concentration (pH) is 4-8. Thus, in the manufacturing process of a semiconductor device such as a copper interconnecting process, removing efficiency of resist residue and other etching residue after etching or ashing improves, and corrosion resistance of copper and insulating film also improves.
Owner:PANASONIC CORP +2

Composition for removal of residue comprising cationic salts and methods using same

The present invention relates to an aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from a substrate such as, for example, a semiconductor substrate. The cleaning composition comprises from about 0.01% to about 40% by weight of a salt selected from a guanidinium salt, an acetamidinium salt, a formamidinium salt, and mixtures thereof; water; and optionally a water soluble organic solvent. Compositions according to the present invention are free of an oxidizer and abrasive particles and are capable of removing residues from a substrate and, particularly, a substrate having silicon-containing BARC and / or photoresist residue.
Owner:VERSUM MATERIALS US LLC

Intermediates And Surfactants useful In Household Cleaning And Personal Care Compositions, And Methods Of Making The Same

Disclosed herein are novel mixtures of scattered-branched chain fatty acids and derivatives of scattered-branched chain fatty acids. Further disclosed are uses of these mixtures in cleaning compositions (e.g., dishcare, laundry, hard surface cleaners,) and / or personal care compositions (e.g., skin cleansers, shampoo, hair conditioners).
Owner:THE PROCTER & GAMBLE COMPANY

Supercritical fluid cleaning of semiconductor substrates

Chemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates. The formulations utilize a supercritical fluid-based cleaning composition, which may further include (I) co-solvent(s), (II) surfactant(s), (III) chelating agent(s), and / or (IV) chemical reactant(s).
Owner:ADVANCED TECH MATERIALS INC

Cleaning article

Disclosed is a cleaning article including fibers having at least a surfactant adhered thereto, wherein the surfactant is a mixture that contains from 45 to 76% by weight of a polyoxyethylene (POE) monoester of a fatty acid having from 5 to 15 carbon atoms, and the balance of the mixture is at least one compound selected from the group consisting of a POE monoester of a saturated fatty acid having from 16 to 22 carbon atoms, a POE monoester of an unsaturated fatty acid having from 16 to 22 carbon atoms, a POE diester of an unsaturated fatty acid having from 16 to 22 carbon atoms, and a POE diester of a saturated fatty acid having from 12 to 15 carbon atoms.
Owner:UNI CHARM CORP

Stable liquid enzyme compositions

The present invention relates to a liquid enzyme cleaning composition in which the enzyme is stable at alkaline pH and: at high concentration of boric acid salt; in the absence of sodium ion; and / or in the presence of at least about 40 wt-% water. In an embodiment, water is present at concentrations of at least about 60 weight percent. The present enzyme cleaning composition typically yields superior soil (especially protein soil) removal properties. In an embodiment, the composition of the invention stabilizes the enzyme with potassium and / or alkanolamine borate.
Owner:ECOLAB USA INC

Cleaning formulation for removing residues on surfaces

The present disclosure provides a non-corrosive cleaning composition that is useful for removing residues from a semiconductor substrate. The composition can comprise water, at least one hydrazinocarboxylic acid ester, at least one water soluble carboxylic acid, optionally, at least one fluoride-containing compound, and, optionally, at least one corrosion inhibitor not containing a carboxyl group. The present disclosure also provides a method of cleaning residues from a semiconductor substrate using the non-corrosive cleaning composition.
Owner:FUJIFILM ELECTRONICS MATERIALS US

FSA Context Switch Architecture for Programmable Intelligent Search Memory

Memory architecture provides capabilities for high performance content search. The architecture creates an innovative memory that can be programmed with content search rules which are used by the memory to evaluate presented content for matching with the programmed rules. When the content being searched matches any of the rules programmed in the Programmable Intelligent Search Memory (PRISM) action(s) associated with the matched rule(s) are taken. Content search rules comprise of regular expressions which are converted to finite state automata (FSA) and then programmed in PRISM for evaluating content with the search rules. PRISM architecture comprises of a plurality of programmable PRISM Search Engines (PSE) organized in PRISM memory clusters that are used simultaneously to search content presented to PRISM. A context switching architecture enables transitioning of PSE states between different input contexts.
Owner:INFOSIL INC

Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds

The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5, where, R1 and R2 R5, R6, R7, R8, and R9 are defined herein; m=1–5; X− is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3, where R30, R31, R32, R33, and R34 are defined herein.
Owner:MERCK PATENT GMBH
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