3256results about "Non-surface-active detergent compositions" patented technology

Laundry detergent compositions comprise (a) surfactant, and (b) a hueing dye, wherein the hueing dye exhibits a hueing efficiency of at least 10 and a wash removal value in the range of from about 30% to about 85%.

Structuring systems, specifically thread-like structuring systems and / or disk-like structuring systems wherein structuring agents aggregate together to form disk-like structures that can interact with other disk-like structures to result in a structuring system, and processes for making such structuring systems, stabilized liquid compositions comprising such structuring systems, systems that utilize such structuring systems for stabilizing liquid compositions, and methods for utilizing the stabilized liquid compositions to provide a benefit, are disclosed.

Detergent compositions containing catechols, such as tiron (1,2-dihydroxybenzene-3,5-disulfonic acid), which do not have or do not develop the reddish color associated with the catechol / ferric iron chelate are disclosed. Methods for reducing the intensity of red color in a tiron containing detergent composition are also disclosed.

An esterified substituted benzene sulfonate, a method of making the same, a detergent composition comprising the same and a method of using the detergent composition.

A cleaning composition utilizing an anionically modified catechol in combination with a soil suspending polymer to remove clay and plant-derived polyphenolic compound soils.

A photoresist cleaning solution and method for forming photoresist patterns using the same. More specifically, disclosed are a photoresist cleaning solution comprising H2o and an ionic surfactant represented by Formula 1, and a method for forming a photoresist pattern using the same. By spraying the cleaning solution of the present invention over photoresist film before and / or after exposing step, pattern formation in an undesired region caused by ghost images can be removed.

The invention is directed to aqueous liquid laundry detergent compositions for cleaning and imparting fabric care benefits to fabrics laundered therewith and to methods for preparing such compositions. Such compositions comprise (A) at least one textile-cleaning surfactant; (B) droplets of miscible silicones comprising both a polarly-functionalized, preferably nitrogen-containing amino or ammonium functionalized, polysiloxane component and a nitrogen-free non-functionalized or non-polarly-functionalized polysiloxane component; and (C) a perfume component comprising fragrant aldehydes and / or ketones or a pro-perfume capable of providing such aldheyde and / or ketone perfume materials in situ. Incorporation of a polarly-functionalized polysiloxane fabric care agent into liquid laundry detergent compositions by miscibly combining it with a non-functionalized or non-polarly functionalized polysiloxane minimizes the undesirable interaction such polarly-functionalized silicone material might otherwise have with aldehyde and / or ketone perfume compounds.

A process is provided for producing peroxycarboxylic acids from carboxylic acid esters. More specifically, carboxylic acid esters are reacted with an inorganic peroxide, such as hydrogen peroxide, in the presence of an enzyme catalyst having perhydrolysis activity. The present perhydrolase catalysts are classified as members of the carbohydrate esterase family 7 (CE-7) based on the conserved structural features. Further, disinfectant formulations comprising the peracids produced by the processes described herein are provided.

The present invention provides methods and compositions comprising at least one neutral metalloprotease enzyme that has improved storage stability. In some embodiments, the neutral metalloprotease finds use in cleaning and other applications. In some particularly preferred embodiments, the present invention provides methods and compositions comprising neutral metalloprotease(s) obtained from Bacillus sp. In some more particularly preferred embodiments, the neutral metalloprotease is obtained from B. amyloliquefaciens. In still further preferred embodiments, the neutral metalloprotease is a variant of the B. amyloliquefaciens neutral metalloprotease. In yet additional embodiments, the neutral metalloprotease is a homolog of the B. amyloliquefaciens neutral metalloprotease. The present invention finds particular use in applications including, but not limited to cleaning, bleaching and disinfecting.

There is provided an alcohol composition obtained by dimerizing an olefin feed comprising C6-C10 linear olefins to obtain C12-C20 olefins, followed by conversion to alcohols, such as by hydroformylation. The composition has an average number of branches ranging from 0.9 to 2.0 per molecule. The linear olefin feed preferably comprises at least 85% of C6-C8-olefins. The primary alcohol compositions are then converted to anionic or nonionic surfactants, preferably sulfated or oxyalkylated or both. The sulfated compositions are biodegradable and possess good cold water detergency. The process for making the dimerized primary alcohol comprises dimerizing, in the presence of a homogeneous dimerization catalyst under dimerization conditions, an olefin feed comprising C6-C10 olefins and preferably at least 85 weight % of linear olefins based on the weight of the olefin feed, to obtain a C12-C20; optionally double bond isomerizing said C12-C20 olefins; and converting the C12-C20 olefins to alcohols, preferably through hydroformylation. The process is preferably a one-step dimerization. The homogenous catalyst comprises a mixture of a nickel carboxylate or a nickel chelate, with an alkyl aluminum halide or an alkyl aluminum alkoxide.

A method of cleaning equipment such as heat exchangers, evaporators, tanks and other industrial equipment using clean-in-place procedures and a pre-treatment solution prior to the conventional CIP cleaning process. The pre-treatment step improves the degree of softening of the soil, and thus facilitates its removal. The pre-treatment solution can be a strong acidic solution, a strong alkaline solution, or comprise a penetrant. A preferred strong acidic solution is an acid peroxide solution. In some embodiments, the pre-treatment may include no strong alkali or acid ingredient; rather, the penetrant provides acceptable levels of pre-treatment.

Alkaline aqueous cleaning compositions and processes for cleaning post-chemical mechanical polishing (CMP) residue, post-etch residue and / or contaminants from a microelectronic device having said residue and contaminants thereon. The alkaline aqueous cleaning compositions include amine, passivating agent, and water. The composition achieves highly efficacious cleaning of the residue and contaminant material from the microelectronic device while simultaneously passivating the metal interconnect material.

The present invention provides methods and compositions comprising at least one perhydrolase enzyme for cleaning and other applications. In some embodiments, the present invention provides methods and compositions for generation of long chain peracids. Certain embodiments of the present invention find particular use in applications involving cleaning, bleaching and disinfecting.

This invention relates to novel enzymes and novel methods for producing the same. More specifically this invention relates to a variety of fungal enzymes. Nucleic acid molecules encoding such enzymes, compositions, recombinant and genetically modified host cells, and methods of use are described. The invention also relates to a method to convert lignocellulosic biomass to fermentable sugars with enzymes that degrade the lignocellulosic material and novel combinations of enzymes, including those that provide a synergistic release of sugars from plant biomass. The invention also relates to a method to release cellular content by degradation of cell walls. The invention also relates to methods to use the novel enzymes and compositions of such enzymes in a variety of other processes, including washing of clothing, detergent processes, biorefining, deinking and biobleaching of paper and pulp, and treatment of waste streams.

A method of making a semiconductor structure, comprises cleaning a gate stack with a cleaning solution. The gate stack comprises a gate layer, a metallic layer on the gate layer, and a etch-stop layer on the metallic layer. The gate layer is on a semiconductor substrate, the cleaning solution is a non-oxidizing cleaning solution, and the metallic layer comprises an easily oxidized metal.

A CMP composition containing a rheology agent, e.g., in combination with oxidizing agent, chelating agent, inhibiting agent, abrasive and solvent. Such CMP composition advantageously increases the materials selectivity in the CMP process and is useful for polishing surfaces of copper elements on semiconductor substrates, without the occurrence of dishing or other adverse planarization deficiencies in the polished copper.

Laundry detergent compositions comprise (a) surfactant, and (b) a hueing dye, wherein the hueing dye exhibits a hueing efficiency of at least 10 and a wash removal value in the range of from about 30% to about 80%.

This invention relates to cleaning compositions comprising organic catalysts having enhanced enzyme compatibility and processes for making and using such cleaning compositions.

This invention relates to compositions and methods for removing overfilled substrates, preferably at a relatively high removal rates. Advantageously, a composition according to the invention can contain an oxidizer, preferably a per-type oxidizer such as a peroxide, periodic acid, and peracetic acid, and may also optionally contain an abrasive.

The invention relates to a method for the removal of residues and contaminants from metal or dielectric surfaces and to a method for chemical mechanical polishing of a copper or aluminum surface. The methods of the invention include using an aqueous amidoxime complex agent. Optionally, the pH of the solution can be adjusted with an acid or base. The method includes applying the above composition to the copper or aluminum surface and polishing the surface in the presence of the composition.

Fabric conditioning compositions such as those that are typically provided to the consumer in liquid form are disclosed. The fabric care conditioning composition is in the form of a porous, dissolvable substrate. The substrate comprises diester quaternary ammonium compound, water soluble polymer and Remaining Water. The substrate may take any number of suitable shapes.

A process is provided to produce a concentrated aqueous peracid solution in situ using at least one enzyme having perhydrolase activity in the presence of hydrogen peroxide (at a concentration of at least 500 mM) under neutral to acidic reaction conditions from suitable carboxylic acid esters (including glycerides) and / or amides substrates. The concentrated peracid solution produced is sufficient for use in a variety of disinfection and / or bleaching applications.

Modified polysaccharide polymers for use as anti-scalant and dispersant. The polymers are useful in compositions used in aqueous systems. The modified polysaccharides are also useful in detergent formulations, water treatment, dispersants and oilfield applications and as fiberglass binders. Such applications include a modified polysaccharide having up to about 70 mole % carboxyl groups per mole of polysaccharide ASU and up to about 20 mole % aldehyde groups per mole of polysaccharide ASU. The applications can also include a blend of modified polysaccharides and other synthetic polymers.

The present invention relates to a composition comprising: (i) a lipase; and (ii) a bleach catalyst that is capable of accepting an oxygen atom from a peroxyacid and transferring the oxygen atom to an oxidizeable substrate.

The present invention relates to a composition for whitening teeth comprising: a safe and effective amount of an aqueous phase; a safe and effective amount of a bleaching agent; a safe and effective amount of an inert hydrophobic phase; and a safe and effective amount of an emulsifier; wherein the inert hydrophobic phase is in predominant proportion relative to the aqueous phase present in the composition. In another embodiment the present invention also relates to an oral care delivery system comprising: an integral carrier and a safe and effective amount of the above composition. In one embodiment the delivery system comprises: a first layer of a strip of material; a second layer comprising the present composition, whereby the bleaching agent is releasably associated with the strip of material.

The cleaning composition for removing resists includes a salt of hydrofluoric acid and a base not containing a metal (A component), a water-soluble organic solvent (B1 component), at least one acid selected from a group consisting of organic acid and inorganic acid (C component), water (D component), and optionally an ammonium salt (E1 component), and its hydrogen ion concentration (pH) is 4-8. Thus, in the manufacturing process of a semiconductor device such as a copper interconnecting process, removing efficiency of resist residue and other etching residue after etching or ashing improves, and corrosion resistance of copper and insulating film also improves.

The present invention relates to automatic dishwashing detergent compositions and methods of using compositions comprising halogenated salts, phosphate and / or silicate in conjunction with electrolyzed water in automatic dishwashing appliances comprising an electrochemical cell and / or electrolytic device for treating tableware to improve cleaning, sanitizing and stain removal by controlling hardness, corrosion and dispersancy.

The present invention relates to an aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from a substrate such as, for example, a semiconductor substrate. The cleaning composition comprises from about 0.01% to about 40% by weight of a salt selected from a guanidinium salt, an acetamidinium salt, a formamidinium salt, and mixtures thereof; water; and optionally a water soluble organic solvent. Compositions according to the present invention are free of an oxidizer and abrasive particles and are capable of removing residues from a substrate and, particularly, a substrate having silicon-containing BARC and / or photoresist residue.