11856 results about "Nuclear chemistry" patented technology

The invention relates to the discovery of novel soluble neutral active Hyaluronidase Glycoproteins (sHASEGPs), methods of manufacture, and their use to facilitate administration of other molecules or to alleviate glycosaminoglycan associated pathologies. Minimally active polypeptide domains of the soluble, neutral active sHASEGP domains are described that include asparagine-linked sugar moieties required for a functional neutral active hyaluronidase domain. Included are modified amino-terminal leader peptides that enhance secretion of sHASEGP. The invention further comprises sialated and pegylated forms of a recombinant sHASEGP to enhance stability and serum pharmacokinetics over naturally occurring slaughterhouse enzymes. Further described are suitable formulations of a substantially purified recombinant sHASEGP glycoprotein derived from a eukaryotic cell that generate the proper glycosylation required for its optimal activity.

The invention provides an aqueous formulation comprising water and a protein, and methods of making the same. The aqueous formulation of the invention may be a high protein formulation and/or may have low levels of conductivity resulting from the low levels of ionic excipients. Also included in the invention are formulations comprising water and proteins having low osmolality.

Antimicrobial compositions, especially those useful when applied topically, particularly to mucosal tissues (i.e., mucous membranes), including a cationic antiseptic such as biguanides and bisbiguanides such as chlorhexidine and its various salts including but not limited to the digluconate, diacetate, dimethosulfate, and dilactate salts; polymeric quaternary ammonium compounds such as polyhexamethylenebiguanide; silver and various silver complexes; small molecule quaternary ammonium compounds such as benzalkoium chloride and alkyl substituted derivatives; di-long chain alkyl (C8-C18) quaternary ammonium compounds; cetylpyridinium halides and their derivatives; benzethonium chloride and its alkyl substituted derivatives; and octenidine. The compositions can also include an enhancer component, a surfactant, a hydrophobic component, and/or a hydrophilic component. Such compositions provide effective topical antimicrobial activity and are accordingly useful in the treatment and/or prevention of conditions that are caused, or aggravated by, microorganisms (including viruses).

A photochemical sensing system enables the measurement of nitrogen oxides (nitrogen dioxide and nitric oxide) by photolyzing nitrogen dioxide to form oxygen atoms which combine with oxygen molecules to form ozone. Ozone reacts with nitric oxide to for nitrogen dioxide-decreasing ozone. Changes in ozone concentration are measured as a surrogate for the nitrogen dioxide and nitric oxide. Any species which photolyzes to yield oxygen atoms may be measured by this technique. Additional specificity for nitrogen oxides is conferred by allowing the nitric oxide to react with the ozone to recreate the nitrogen dioxide. By periodically photolyzing the nitrogen dioxide (to form ozone), and then allowing the resulting nitric oxide to react with the ozone (thereby reducing ozone), a pulsed signal is obtained whose amplitude is proportional to the total amount of nitrogen dioxide and nitric oxide present. Medical applications include measuring nitric oxide concentrations in expired air samples.

The present invention is a method for removing deposited etch byproducts from surfaces of a semiconductor processing chamber after a copper etch process. The method of the invention comprises the following general steps: (a) an oxidation step, in which interior surfaces of the processing chamber are contacted with an oxidizing plasma; (b) a first non-plasma cleaning step, in which interior surfaces of the processing chamber are contacted with an H+hfac-comprising gas; and (c) a second cleaning step, in which interior surfaces of the processing chamber are contacted with a plasma containing reactive fluorine species, whereby at least a portion of the copper etch byproducts remaining after step (b) are volatilized into gaseous species, which are removed from the processing chamber. The method of the invention is preferably performed at a chamber wall temperature of at least 150° C. in order to achieve optimum cleaning of the chamber at the chamber operating pressures typically used during the cleaning process. The dry cleaning method of the invention can be performed between wafer processing runs without opening the processing chamber, thereby minimizing potential contamination to the chamber as well as chamber downtime.

An apparatus and method produces nitrate ions on-site from water, natural gas and air extracted in proximity to the apparatus. The apparatus generates nitrate ions and brings the nitrate ions into contact with an aqueous system. Hydrogen sulfide present in the aqueous system is removed and the production of hydrogen sulfide by sulfate-reducing bacteria (SRB) is eliminated by introducing into the system nitrate ions, whereby denitrifying microorganisms, using nitrate, outcompete the sulfate-reducing bacteria for the available carbon nutrients, thus preventing the SRB from producing hydrogen sulfide. Nitrate ions generated by the apparatus and added to the aqueous system which contains the denitrifying microorganisms can enhance oil recovery by means of microbial enhanced oil recovery mechanisms.

Personal cleansing compositions comprise (A) a cleansing phase containing a surfactant and water; and (B) a separate benefit phase containing a hydrophobic material; wherein the cleansing and benefit phases are packaged together and are in physical contact. The two phases are packaged in physical contact and remain separate and stable at ambient conditions for at least 180 days. These compositions and corresponding methods provide improved cosmetics, skin feel, and/or skin benefit efficacy.

An aqueous peroxide composition for coloring or lightening hair comprising (a) 1-99% of an aqueous phase containing (ii) 1-55% by weight of the total composition of water, (ii) 1-45% hydrogen peroxide, and (iii) a water soluble cosolvent; and (b) 0.1-60% of an oil phase; and (c) 1-65% of an organic, amphiphilic, surface active ingredient capable of interacting with the water phase and the oil phase to form lyotropic liquid crystals containing said water phase ingredients; a method for coloring or lightening hair using the peroxide composition, and a method for reducing the amount of time necessary to permanently color hair using the peroxide composition.

A method of cleaning the interior of a processing chamber first performs a halogenation treatment by supplying a treatment gas containing a halogenating gas into the processing chamber and heating a support member for a target substrate, thereby halogenating a metal element in a by-product film. A reduction treatment is then performed by supplying a treatment gas containing a reducing gas into the processing chamber, thereby reducing a halide of the metal element and liberating the metal element. An oxidation treatment is then performed by supplying a treatment gas containing an oxidizing gas into the processing chamber and heating the casing walls of the processing chamber, thereby passivating the liberated metal element by oxidation.

The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageously provide both cleaning efficiency and material compatibility.

A thin, flexible film which when applied to stained teeth is hydrated by saliva and is effective in such form to whiten teeth, the film comprising an anhydrous water hydratable ethylene oxide polymer matrix containing a solid peroxide whitening agent whereby upon application to stained tooth surfaces, the peroxide whitening agent is solublilized by saliva present in the oral cavity into active whitening activity when the film is positioned and placed on the teeth.

Alkaline aqueous cleaning compositions and processes for cleaning post-chemical mechanical polishing (CMP) residue, post-etch residue and/or contaminants from a microelectronic device having said residue and contaminants thereon. The alkaline aqueous cleaning compositions include amine, passivating agent, and water. The composition achieves highly efficacious cleaning of the residue and contaminant material from the microelectronic device while simultaneously passivating the metal interconnect material.

The invention relates to an aqueous fluoropolymer, and preferably polyvinylidene fluoride (PVDF), composition for manufacturing electrodes for use in non-aqueous-type electrochemical devices, such as batteries and electric double layer capacitors. The composition contains aqueous PVDF binder, and one or more powdery electrode-forming materials. In one embodiment, the composition is free of fluorinated surfactant In another embodiment, one or more fugitive adhesion promoters are added. The electrode formed from the composition of the invention exhibits interconnectivity and irreversibility that is achieved from the use of aqueous PVDF binder.

The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.

The present invention relates to improved sunscreen compositions, more preferably to improve sunscreen compositions containing at least one sunscreening agent (sunscreen) and a silicone-polyamide copolymer.

An antimicrobial composition that involves a synergistic mixture in terms of active agents, of a primary antimicrobial agent, such as polyhexamethylene biguanide (PHMB), a secondary antimicrobial agent, and optionally an organic acid against various kinds of microbes is described. Various additional processing aids, such as alcohols and surfactants, may also be incorporated within the mixture. The composition allows one to use a significantly less concentration of individual constituent antimicrobial agents to achieve the same or a better degree of antimicrobial efficacy. The antimicrobial composition can be applied to the surface of almost any kind of substrate material, and can achieve a killing-efficacy of about 3 Log₁₀ reduction in microbes within 30 minutes under ambient conditions.

Metallic vapor phase fuel compositions relating to a broad spectrum of pollution reducing, improved combustion performance, and enhanced stability fuel compositions for use in jet, aviation, turbine, diesel, gasoline, and other combustion applications include co-combustion agents preferably including trimethoxymethylsilane.