582 results about "Alicyclic Hydrocarbons" patented technology

The present invention relates to a chemically amplified system, which is, sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a polymer that is insoluble an aqueous alkaline solution and comprises at least one acid labile group, b) a compound capable of producing an acid upon radiation. The present invention comprises a polymer that is made from a alicyclic hydrocarbon olefin, an acrylate with a pendant cyclic moeity, and a cyclic anhydride. The present invention also relates to a process for imaging such a photoresist.

A positive photosensitive composition comprising (A) a specific acid generator that generates an acid upon irradiation of an actinic ray or radiation, and (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution.

An organic EL device comprises a substrate, an organic EL structure stacked on the substrate, a sealing plate located on the organic EL structure with a predetermined space therebetween, and a sealing adhesive agent for fixing the sealing plate on the substrate and thereby closing up the organic EL structure. The sealing adhesive agent is a photo-curing type adhesive agent which, upon photo-curing, generates gases under heating conditions of 85° C. and 60 minutes. In these gases, the total amount of a low-molecular straight-chain aliphatic hydrocarbon which may have a substituent, an aromatic hydrocarbon which may have a substituent, an alicyclic hydrocarbon which may have a substituent, and a heterocyclic compound and a siloxane which may have a substituent is 200 mug / g or lower calculated as benzene. The organic EL device of the invention is reduced as much as possible in terms of a deterioration with time, and can maintain its initial performance over a long period of time, so that it can have an ever longer service life.

A polymerizable compound has a practical low melting point, excellent solubility in a general-purpose solvent, and can produce an optical film at low cost, exhibits low reflected luminance, and achieves uniform conversion of polarized light over a wide wavelength band, an optically anisotropic article. A carbonyl compound is useful as a raw material for producing the polymerizable compound. (In the formula (I), Y1 to Y8 represent —C(═O)—O—, G1 and G2 represent a C1-20 divalent linear aliphatic group, Z1 and Z2 represent a C2-10 alkenyl group that is unsubstituted, or substituted with a halogen atom, Ax represents a C2-30 organic group with at least one aromatic ring, Ay represents a hydrogen atom or C1-20 alkyl group, A1 represents a trivalent aromatic group, A2 and A3 represent a C3-30 divalent alicyclic hydrocarbon group, A4 and A5 represent a C6-30 divalent aromatic group or the like, and Q1 represents a hydrogen atom.)

A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

A photoresist composition containing: a polymer including an acid-labile group; a radiation-sensitive acid generator; and an acid diffusion control agent that contains a compound represented by a formula (1). In the formula (1), R1, R2 and R3 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. A represents a group having a valency of n that is obtained by combining: a hydrogen atom, a linear hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms or a combination thereof; —O—, —CO—, —COO—, —SO2O—, —NRSO2—, —NRSO2O—, —NRCO— or a combination thereof; and n nitrogen atoms as a binding site to the carbonyl group in the formula (1), in which a sum of atomic masses of the atoms constituting A is no less than 120. n is an integer of 1 to 4.

A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

The present invention provides novel carboxylic acid derivatives useful as an insulin sensitizer, a salt thereof or a hydrate of them, and a medicament comprising the derivative as the active ingredient. Specifically, it provides a carboxylic acid derivative represented by the following formula: (wherein L represents a single bond, or a C1 to C6 alkylene group, a C2 to C6 alkenylene group or a C2 to C6 alkynylene group, each of which may have one or more substituent groups; M represents a single bond, or a C1 to C6 alkylene group, a C2 to C6 alkenylene group or a C2 to C6 alkynylene group, each of which may have one or more substituent groups; T represents a single bond, or a C1 to C3 alkylene group, a C2 to C3 alkenylene group or a C2 to C3 alkynylene group, each of which may have one or more substituent groups; W represents a carboxyl group; X represents a single bond, an oxygen atom, or a group represented by the various substituent groups including -NR<X1>CQ<1>O- (wherein Q<1 >represents an oxygen atom or a sulfur atom; R<X1 >represents a hydrogen atom, a cyano group, a formyl group, or various groups including a C1 to C6 alkyl group and a C1 to C6 hydroxyalkyl group, each of which may have one or more substituent groups), ONR<X1>CQ<1>-, -NR<X1>CQ<1>-, -CQ<1>NR<X1>-, -NR<X1a>CQ<1>NR<X1b>-, -Q<2>SO2- and -SO2Q<2>-; Y represents a 5 to 14-membered aromatic group which may have one or more substituent groups and one or more hetero atoms, or a C3 to C7 alicyclic hydrocarbon group; and the rings Z and U may be the same as or different from each other and each represents a 5 to 14-membered aromatic group which may have 1 to 4 substituent groups and one or more hetero atoms, and the ring may be partially saturated.), a salt thereof, an ester thereof or a hydrate of them.

The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.

There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure:wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x≦1, 0≦y<1 and 0≦z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3):wherein R8 is a hydrogen atom or a methyl group, and R9 is a hydrocarbon group of 7 to 16 carbon atoms having an alicyclic lactone structure.

A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and radiation and (F) a specific surfactant containing a fluorine atom in an amount of from 30 to 60 mass %, and a pattern-forming method using the same.

An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.

The present invention provides a catalytic system that can be used to prepare by polymerization diene elastomers comprising polyisoprenes and polybutadienes. The invention also provides a process for the preparation of the catalytic system and to a process using the catalytic system to prepare diene elastomers comprising polyisoprenes having a high cis-1,4 linkage content and polybutadienes. The catalytic system according to the invention is based on (a) a conjugated diene monomer, (b) an organic phosphoric acid salt of a rare earth metal, (c) an alkylating agent consisting of an alkylaluminium of the formula AlR3 or HAlR2, and (d) a halogen donor consisting of an alkylaluminium halide, and is such that said salt is suspended in at least one inert and saturated aliphatic or alicyclic hydrocarbon solvent and, the “alkylating agent:rare earth salt” molar ratio ranges from 1 to 5.

In order to provide a resin composition which contains a polymer having a furan ring and a layer silicate composition and is excellent in heat resistance and mechanical strength, the present invention provides a resin composition which contains a layer silicate composition and a polymer having a repeating unit represented by the following formula (1).(wherein R represents a group having a valence of 2 or more and selected from the group consisting of an aromatic group, an aliphatic hydrocarbon group and an alicyclic hydrocarbon group.)

A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator,wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.

A resin composition for heat-shrinkable polypropylene shrink label, comprises: from 50 to 95% by weight of a crystalline propylene-α-olefin random copolymer mainly comprising propylene and from 5 to 50% by weight of an alicyclic hydrocarbon resin having a softening temperature of not lower than 110 degrees Celsius.

A positive photosensitive composition comprising (A) a specific acid generator that generates an acid upon irradiation of an actinic ray or radiation, and (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution.

The invention discloses a bridged polysilsesquioxane, a monomer thereof and a preparation method for the two. The structural general formula of the monomer is as shown in Formula I, wherein in the structural general formula of the Formula I, R is a structure of Formula II or Formula III, and R1, R2 and R3 are selected from the following groups of methoxyl, ethoxy, methyl and phenyl; R' is C1-C10 aliphatic hydrocarbon, C4-C12 alicyclic hydrocarbon or C4-C12 aromatic hydrocarbon; and n is an integral number ranging from 0 to 10. The preparation method comprises the following step: in the inert atmosphere, making the silane monomer containing an epoxy group shown in the structural general formula of Formula IV react with the silane monomer containing amino shown in the structural general formula of Formula V or diamine shown in the structural general formula of Formula VI. The preparation method has the advantages of easy procuration of raw materials, simple synthetic method and moderate process and can prepare the bridged monomer with 6-12 alkoxy groups, the number of the alkoxy groups can be controlled by the selection of initial raw materials, and high product yield can be realized. H2N-R'-NH2 (Formula VI).

The present invention relates to a catalytic system usable for the preparation of polybutadienes by polymerisation, to a process for the preparation of said catalytic system and to a process for the preparation of polybutadienes by means of this catalytic system.A catalytic system according to the invention is based on at least:a conjugated diene monomer,an organic phosphoric acid salt of one or more rare earth metals, said salt being in suspension in at least one inert, saturated and aliphatic or alicyclic hydrocarbon solvent,an alkylating agent consisting of an alkylaluminium of formula AlR3 or HAlR2, the “alkylating agent:rare earth salt” molar ratio being greater than 5, anda halogen donor which belongs to the family of alkylaluminium halides with the exception of alkylaluminium sesquihalides,and, according to the invention, said catalytic system comprises said rare earth metal(s) in a concentration equal to or greater than 0.005 mol / l.

The invention discloses a benzoxazine intermediate, composition and method for preparation, phenolphthalein type benzoxazine intermediate has a structural formula disclosed in the specification, wherein R is C3-C20 alicyclic hydrocarbon and its derivative, C3-C20 aliphatic hydrocarbon and its derivative, or C3-C20 unsaturated aliphatic hydrocarbon and its derivative. The intermediate is prepared by using phenothalin, primary amine and aldehyde as raw material through through solution synthesizing process or melting synthesizing process.

A compound having GSK-3 inhibiting function. A1 and A3 are a single bond, an aliphatic hydrocarbon group; A2 and A4 are a single bond, CO, COO, CONR, O, OCO, NR, NRCO, NRCOO, etc.; G1 is a single bond, an aliphatic hydrocarbon, aromatic hydrocarbon, heterocyclic; G2 is a hydrogen atom, an aliphatic hydrocarbon, an alicyclic hydrocarbon, an aromatic hydrocarbon, heterocyclic; A5 is a single bond, NR; R2 is H, halogen, an aliphatic hydrocarbon, alicyclic hydrocarbon, aromatic hydrocarbon, heterocyclic; A6 is a single bond, NR, CO, NRCO, NRCONR, CONR, COO, O, etc.; R3 is H, halogen, nitro, saturated aliphatic hydrocarbon, alicyclic hydrocarbon, aromatic hydrocarbon, heterocyclic; and when A6 is CR═CR or C≡C; R3 may be a trimethylsilyl, formyl, acyl, carboxyl, alkoxylcarbonyl, carbamoyl, alkylcarbamoyl or cyano group; and R is H or an aliphatic hydrocarbon group.

Disclosed are: a polymer electrolyte which comprises, as the main component, a block / graft copolymer comprising, as constituent components, polymer blocks (A), (B) and (C) which cause phase-separation from one another, wherein the polymer block (A) comprises a vinyl compound unit as the main repeating unit and has an ion-conductive group, the polymer block (B) comprises a vinyl compound unit capable of forming a flexible phase as the main repeating unit and forms a flexible phase, and the polymer block (C) comprises a styrene derivative unit carrying an alicyclic hydrocarbon group having a polycyclic structure as the main repeating unit and forms a restrained phase; a membrane; a membrane-electrode assembly; and a solid polymer fuel cell. The polymer electrolyte has excellent durability and heat resistance, and shows little change in properties, such as the change in dimension between a dried state and a wet state, the change in mechanical properties and the change in methanol cross-over before and after the immersion in a methanol solution. The polymer electrolyte can be used stably in a solid polymer fuel cell during the long-term operation of the solid polymer fuel cell and enables excellent start-up performance of the solid polymer fuel cell.

A composition containing a polycarbonate, a polycarbonate-polysiloxane copolymer, an alicyclic hydrocarbon resin flow promoter, an inorganic filler, a flame retardant and an impact modifier. The compositions may include polycarbonate in an amount of 40% by weight or more of the combined weights of the polycarbonate, polycarbonate-polysiloxane copolymer, inorganic filler, flame retardant, flow promoter, and impact modifier compound wherein a molded sample of the thermoplastic composition is capable of achieving UL94 V0 rating at a thickness of 1.2 mm (±10%); wherein the polymer composition has a melt viscosity of 185 Pa·sec or less, when measured at 270° C. and 1500 sec−1; and wherein a molded sample of the thermoplastic composition has a flexural modulus determined in accordance with ASTM D790 within 3800-8000 MPa; and wherein a 3.2-mm thick molded NII bar comprising the composition has a notched Izod impact strength of 40 to 200 J / m determined in accordance with ASTM D256 at 23° C.

Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula:wherein R1 is H or methyl; R2 is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, C1-4 alkyl or C1-4 alkoxy; R3 is a hydroxyl functionalized C1-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R4 is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [-R4O-]p; R5 is a C1-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-C14 aryl, or substituted or unsubstituted C7-C15 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.

A composition containing a polycarbonate, a polycarbonate-polysiloxane copolymer, an alicyclic hydrocarbon resin flow promoter, an inorganic filler, a flame retardant and an impact modifier. The compositions may include polycarbonate in an amount of 40% by weight or more of the combined weights of the polycarbonate, polycarbonate-polysiloxane copolymer, inorganic filler, flame retardant, flow promoter, and impact modifier compound wherein a molded sample of the thermoplastic composition is capable of achieving UL94 V0 rating at a thickness of 1.2 mm (±10%); wherein the polymer composition has a melt viscosity of 185 Pa·sec or less, when measured at 270° C. and 1500 sec−1; and wherein a molded sample of the thermoplastic composition has a flexural modulus determined in accordance with ASTM D790 within 3800-8000 MPa; and wherein a 3.2-mm thick molded NII bar comprising the composition has a notched Izod impact strength of 40 to 200 J / m determined in accordance with ASTM D256 at 23° C.

A positive photosensitive composition comprises: (A) an acid generator capable of generating an acid upon irradiation with one of an actinic ray and a radiation; and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkali developer, wherein the acid generator (A) comprises at least two compounds of a sulfonium salt compound not having an aromatic ring, a triarylsulfonium salt compound, and a compound having a phenacylsulfonium salt structure.