577 results about "Alicyclic Hydrocarbons" patented technology

The present invention relates to a chemically amplified system, which is, sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a polymer that is insoluble an aqueous alkaline solution and comprises at least one acid labile group, b) a compound capable of producing an acid upon radiation. The present invention comprises a polymer that is made from a alicyclic hydrocarbon olefin, an acrylate with a pendant cyclic moeity, and a cyclic anhydride. The present invention also relates to a process for imaging such a photoresist.

An organic EL device comprises a substrate, an organic EL structure stacked on the substrate, a sealing plate located on the organic EL structure with a predetermined space therebetween, and a sealing adhesive agent for fixing the sealing plate on the substrate and thereby closing up the organic EL structure. The sealing adhesive agent is a photo-curing type adhesive agent which, upon photo-curing, generates gases under heating conditions of 85° C. and 60 minutes. In these gases, the total amount of a low-molecular straight-chain aliphatic hydrocarbon which may have a substituent, an aromatic hydrocarbon which may have a substituent, an alicyclic hydrocarbon which may have a substituent, and a heterocyclic compound and a siloxane which may have a substituent is 200 mug / g or lower calculated as benzene. The organic EL device of the invention is reduced as much as possible in terms of a deterioration with time, and can maintain its initial performance over a long period of time, so that it can have an ever longer service life.

A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

The present invention provides novel carboxylic acid derivatives useful as an insulin sensitizer, a salt thereof or a hydrate of them, and a medicament comprising the derivative as the active ingredient. Specifically, it provides a carboxylic acid derivative represented by the following formula: (wherein L represents a single bond, or a C1 to C6 alkylene group, a C2 to C6 alkenylene group or a C2 to C6 alkynylene group, each of which may have one or more substituent groups; M represents a single bond, or a C1 to C6 alkylene group, a C2 to C6 alkenylene group or a C2 to C6 alkynylene group, each of which may have one or more substituent groups; T represents a single bond, or a C1 to C3 alkylene group, a C2 to C3 alkenylene group or a C2 to C3 alkynylene group, each of which may have one or more substituent groups; W represents a carboxyl group; X represents a single bond, an oxygen atom, or a group represented by the various substituent groups including -NR<X1>CQ<1>O- (wherein Q<1 >represents an oxygen atom or a sulfur atom; R<X1 >represents a hydrogen atom, a cyano group, a formyl group, or various groups including a C1 to C6 alkyl group and a C1 to C6 hydroxyalkyl group, each of which may have one or more substituent groups), ONR<X1>CQ<1>-, -NR<X1>CQ<1>-, -CQ<1>NR<X1>-, -NR<X1a>CQ<1>NR<X1b>-, -Q<2>SO2- and -SO2Q<2>-; Y represents a 5 to 14-membered aromatic group which may have one or more substituent groups and one or more hetero atoms, or a C3 to C7 alicyclic hydrocarbon group; and the rings Z and U may be the same as or different from each other and each represents a 5 to 14-membered aromatic group which may have 1 to 4 substituent groups and one or more hetero atoms, and the ring may be partially saturated.), a salt thereof, an ester thereof or a hydrate of them.

The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.

In order to provide a resin composition which contains a polymer having a furan ring and a layer silicate composition and is excellent in heat resistance and mechanical strength, the present invention provides a resin composition which contains a layer silicate composition and a polymer having a repeating unit represented by the following formula (1).(wherein R represents a group having a valence of 2 or more and selected from the group consisting of an aromatic group, an aliphatic hydrocarbon group and an alicyclic hydrocarbon group.)

A positive photosensitive composition comprising (A) a specific acid generator that generates an acid upon irradiation of an actinic ray or radiation, and (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution.

An ultraviolet-curing resin composition of (a) 5 to 35 parts by mass of a chlorinated polyolefin with a chlorine content of 15 to 40 mass %, (b) 15 to 60 parts by mass of an alicyclic hydrocarbon mono(meth)acrylate, and (c) 5 to 80 parts by mass of a polypropylene glycol di(meth)acrylate; and, per 100 parts by mass of the total amount of components (a), (b) and (c), (d) 0 to 1100 parts by mass of an aliphatic hydrocarbon di(meth)acrylate and (e) 0 to 600 parts by mass of a polyfunctional monomer having 3 to 6 (meth)acryloyl groups in its molecule; and, per 100 parts by mass of the total amount of components (b), (c), (d) and (e), (f) 1 to 15 parts by mass of a photoinitiator; andthe composition as an active ingredient in paints, inks, adhesives, sealing agents and primers.

A composition containing a polycarbonate, a polycarbonate-polysiloxane copolymer, an alicyclic hydrocarbon resin flow promoter, an inorganic filler, a flame retardant and an impact modifier. The compositions may include polycarbonate in an amount of 40% by weight or more of the combined weights of the polycarbonate, polycarbonate-polysiloxane copolymer, inorganic filler, flame retardant, flow promoter, and impact modifier compound wherein a molded sample of the thermoplastic composition is capable of achieving UL94 V0 rating at a thickness of 1.2 mm (±10%); wherein the polymer composition has a melt viscosity of 185 Pa·sec or less, when measured at 270° C. and 1500 sec−1; and wherein a molded sample of the thermoplastic composition has a flexural modulus determined in accordance with ASTM D790 within 3800-8000 MPa; and wherein a 3.2-mm thick molded NII bar comprising the composition has a notched Izod impact strength of 40 to 200 J / m determined in accordance with ASTM D256 at 23° C.

Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula:wherein R1 is H or methyl; R2 is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, C1-4 alkyl or C1-4 alkoxy; R3 is a hydroxyl functionalized C1-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R4 is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [-R4O-]p; R5 is a C1-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-C14 aryl, or substituted or unsubstituted C7-C15 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.