3595results about How to "Easy to polish" patented technology

The invention relates to an ultraviolet light curing offset printing ink and a preparation method thereof. The ultraviolet light curing offset printing ink is made of 25.0-50.0% of polyfunctional polyester acrylic resin or polyfunctional chlorinated polyester acrylate, 0.0-15.0% of epoxy acrylate oligopolymer, 0.0-20.0% of polyfunctional urethane acrylate, 0.0-15.0% of difunctional or polyfunctional acrylic monomer, 0.0-20.0% of grinding-type resin, 2.0-10.0% of polyether acrylate modified by nano silicon dioxide, 0.0-5.0% of adhesion promoter, 3.0-5.0% of photoinitiator, 0.1-2.0% of polymerization inhibitor, 0.0-10.0% of filler, 16.0-55.0% of paint or dye and 0.2-5.0% of accessory ingredient. The prepared offset printing ink has high transparency as well as good adhesive attraction and flexility, and can be widely applied to packages printing industry and the printing of various transfer paper.

The invention provides an automobile gear end surface polishing device, and relates to the technical field of automobile gear polishing. The automobile gear end surface polishing device comprises a working table, standing columns are fixedly installed on both sides of the top of the working table, and motor mounting blocks are fixedly installed on both sides of the inner wall of each standing column. According to the automobile gear end surface polishing device, through arrangement of telescopic motors, threaded rods, telescopic blocks, sliding rods, a strip-shaped sliding groove and a cross plate, a polishing device body on the bottom of the cross plate can vertically move between the two standing columns under driving of the telescopic motors; through arrangement of the cross plate, the sliding groove and supports, the polishing device body on the bottom of the cross plate can transversely move on the bottom of the cross plate; through arrangement of a polishing table, a rotating rod and a clamping base, a gear to be polished which is fixed to the top of the clamping base in a clamped mode can conduct circular motion on the bottom of a polishing motor under driving of the rotating rod. In sum, by means of the automobile gear end surface polishing device, the effect that adjustment is convenient is achieved, it is convenient for people to polish the end surface of the gear from different angles, and the quality of the gear after polished is better.

A electro-optical device and manufacturing method are provided for an electro-optical device that has the step of forming a light shielding layer on one side of a light transmissive substrate, patterning the light shielding layer, forming an insulating layer on the patterned light shielding layer, planarizing the insulating layer, bonding a model crystalline silicon layer on the surface of the planarized insulating layer, and forming a transistor element from the monocrystalline silicon layer, wherein the patterned light shielding layer is arranged in an area facing the transistor element and in a peripheral area surrounding the transistor element.

The invention discloses a nanometer level polishing solution and a preparation method thereof. The polishing solution is prepared from the following components in percentage by mass: 0.1 to 10 percent of monocrystal artificial diamond micro powder, 0.1 to 5 percent of aluminum oxide micro powder, 0.1 to 10 percent of silica gel, 0.3 to 10 percent of surfactant, 0.05 to 4 percent of dispersing agent, 0.5 to 1 percent of lubricant, 0.01 to 1 percent of chemical PH value regulator and 60 to 98.2 percent of solvent. The invention also discloses the preparation method for the nanometer level polishing solution. By the method, mixed serous fluid is prepared from the nanometer level diamond, the aluminum oxide and the silica gel, so an ideal polishing effect is achieved, the requirement of a process for thinning and grinding substrates (silicon carbide and sapphire) for GaN extension is met, and a technical means is provided for a polishing process for semiconductors.

The invention provides an acidic chemical and mechanical polishing composition. The pH value of the acidic chemical and mechanical polishing composition is 2-7, and the acidic chemical and mechanical polishing composition comprises 1-20% by weight of abrasive material, 0.5-10% by weight of oxidant, 0.1-10% by weight of complexing agent, 0.001-1% by weight of corrosion inhibitor, 0.001-5% by weight of organic film-forming auxiliaries and the balance of pH regulator and deionized or distilled water, wherein the abrasive material is of colloidal silica sol after modification in the special step, and the average particle size is of 10-200nm. According to the chemical and mechanical polishing composition provided by the invention, the abrasive material is refined and modified; by using the method, the stability of the abrasive material in polishing slurry can be effectively upgraded, and polishing removal rate and surface roughness degree are respectively optimized to a certain extent; and the unique adding effect of the organic film-forming auxiliaries can well balance the strength of chemical corrosion action and the strength of mechanical grinding action, and achieve the effects of improving polishing removal efficiency and performing global planarization.

The invention discloses a corrosion sample inlaying method. The method comprises the following steps of: based on an epoxy resin inlay, which is composed of 60-80% of matrix resin, 10-25% of conductive powder, 2-10% of dispersing agent and 7-15% of curing agent by weight, orderly arranging the sample to be inlaid, namely the corrosion sample, completely covering the sample with a die, and then, pouring the epoxy resin inlay into the die until submerging the corrosion sample; curing 3-12h at room temperature, uncovering flat surface paper, taking out the sample from the die, respectively sanding the sample with 120#, 240#, 400#, 600#, 800# and 1000# sand paper stage by stage, and then, polishing the sample. With the method disclosed by the invention, the processed corrosion sample can be used for metallomicroscopy observation or electron microscopy scanning observation, so that organization, structure and form of the cross section of the corrosion sample are shown integrally and really.