4913results about How to "Reduce variation" patented technology

Systems, including apparatus and methods, for performing assays. These systems may involve separating sample components by partitioning them into droplets or other partitions, amplifying or otherwise reacting the components within the droplets, detecting the amplified components, or characteristics thereof, and/or analyzing the resulting data, among others.

A tiled electro-optic display ( 100 ) comprises a plurality of display units ( 102 ) each of which can be individually removed from the display, and a controller ( 104, 110 ) arranged to supply drive signals to the plurality of display units ( 102 ) and thereby write images thereon, the electro-optic display ( 100 ) further comprising means ( 112 ) for modifying the drive signals supplied by the controller ( 104, 110 ) to reduce variation in electro-optic performance among the plurality of display units ( 102 ).

A method is provided for building improved calibration models or for improving modifications to these models or validation of the models used in the non-invasive spectroscopic measurement of an analyte or attribute of tissue. The method uses a matched reference sample and measurement of that sample to ensure that the correct relationship between the spectra and analyte is made during the model building, modification or calibration process. A matched reference sample is one in which the analyte of interest or attribute of interest in the reference sample is representative of the analyte or attribute at the site being non-invasively sampled or the agreement between the reference concentration and the non-invasively sampled concentration is clinically significant.

The purpose of the invention is to provide a light guide of a variety of forms having a uniform distribution of brightness in the plane and a planer light source device for a liquid crystal display device which uses such light guide. The light guide comprises a first surface which is a surface to which a natural polarization light is incident and a second surface other than the first surface which is an exit surface of a specific polarization light into which, said natural polarization light is modulated, wherein;said light guide has an interface of two materials of different indices of refraction oriented at an angle of thetaB+/-alpha degrees relative to the primary propagation direction of said incident light, said thetaB being an angle satisfying Brewster's condition, more than two orientations of said interface exist in a single light guide, and the difference between the indices of refraction of the two materials of different indices of refraction is between 0.001 and 1.0. thetaB is typically about 45 degrees. The light guide comprises a first transparent member having a plurality of upwardly convex right angle isosceles triangles on a first surface thereof and a first index of refraction and a second transparent member having a plurality of downwardly convex right angle isosceles triangles on a second surface thereof and a second index of refraction, and said first surface and said second surface contact each other.

An apparatus and method for determining tissue oxygenation such as arterial and venous oxygenation and cerebral oxygenation. In one embodiment the optical properties of tissue are determined using measured light attenuations at a set of wavelengths. By choosing distinct wavelengths and using light attenuation information, the influence of variables such as light scattering, absorption and other optical tissue properties can be minimized.

The invention provides a biosensor comprising a support; a conductive layer composed of a electrical conductive material such as a noble metal, for example gold or palladium, and carbon; slits parallel to and perpendicular to the side of the support; working, counter, and detecting electrodes; a spacer which covers the working, counter, and detecting electrodes on the support; a rectangular cutout in the spacer forming a specimen supply path; an inlet to the specimen supply path; a reagent layer formed by applying a reagent containing an enzyme to the working, counter, and detecting electrodes, which are exposed through the cutout in the spacer; and a cover over the spacer. The biosensor can be formed by a simple method, and provides a uniform reagent layer on the electrodes regardless of the reagent composition.

An imaging system incorporating adaptive compression which includes determining linear predictive differential residuals from an imager array pixel row. The differential residuals are classified into categories, each category having a range of differential residuals associated with it. The categories are analyzed to produce an ordered list having categories with most to least frequent residuals falling within a respective residual range associated with a respective category. The ordered list is then used to select a variable length encoding table with a matching ordered list. Variable length encoded category and range position offset data is output to a serializer unit, where the range position offset refers to a position in a range associated with a particular category.

Integrated circuits with dummy contacts and methods for fabricating such integrated circuits are provided. The method includes forming an interlayer dielectric overlying an electronic component and a substrate, wherein the interlayer dielectric has an interlayer dielectric top surface. An active contact is formed through the interlayer dielectric and forms an electrical connection with the electronic component. A dummy contact is formed within the interlayer dielectric where the dummy contact extends to a dummy contact termination point between the interlayer dielectric top surface and the substrate such that an insulator is positioned between the dummy contact termination point and the electronic component.

A method of receiving input from a user includes providing a surface within reach of a hand of the user. A plurality of locations on the surface that are touched by the user are sensed. An alphanumeric character having a shape most similar to the plurality of touched locations on the surface is determined. The user is audibly or visually informed of the alphanumeric character and/or a word in which the alphanumeric character is included. Feedback is received from the user regarding whether the alphanumeric character and/or word is an alphanumeric character and/or word that the user intended to be determined in the determining step.

A stepped reflector for being illuminated by at least one multiple-band feed is provided. The reflector includes a central region and a first annular region with an annular width of w. The first annular region is axially stepped a height h above the central region, where h is approximately equal to

where m is a positive odd integer, Φ is a desired amount of phase shift of an outer region of a phase front for reflecting off of the reflector, φ is a feed phase contribution for an angle Θ, and Θ₀ is an angle formed between an axis of the at least one feed and a line connecting a phase center of the at least one feed and an inner edge of the at least one annular region.

The central region and the annular region of the reflector may be parabolically curved or may alternately be shaped. The reflector may be fed by one or more multiple-band horn antennas.

A method for forming an optical fiber includes drawing the optical fiber from a glass supply and treating the fiber by maintaining the optical fiber within a treatment temperature range for a treatment time. Preferably also, the fiber is cooled at a specified cooling rate. The optical fiber treatment reduces the tendency of the optical fiber to increase in attenuation due to Rayleigh scattering, and/or over time following formation of the optical fiber due to heat aging. Apparatus are also provided.

After a mask is carried into a reserve room for temporarily storing before carrying into a mask room filled with specific gas that has an impurity concentration lower than a first concentration (e.g. 1 ppb) and that has a characteristic of absorbing little exposure light, gas-replacement mechanisms replace gas in the reserve room with specific gas having an oxygen concentration not lower than the first concentration. Therefore, when subsequently carrying the mask into the mask room, impurities from the outside (including absorbent gas) can be substantially prevented from getting into the optical path inside the mask room. When replacing a wafer, gas in a reserve room is also replaced in the same way as the above.

A method of forming a micro pattern in a semiconductor device, wherein a first polysilicon film, a buffer oxide film, a second polysilicon film, an anti-polishing film, and a first oxide film are sequentially laminated on a semiconductor substrate having a to-be-etched layer. The first oxide film, the anti-polishing film and the second polysilicon film are patterned. After nitride film spacers are formed on the patterned lateral portions, a second oxide film is formed on the entire structure. A Chemical Mechanical Polishing (CMP) process is performed using the anti-polishing film as a stopper. Thereafter, after the nitride film spacers are removed, the second oxide film and the second polysilicon film are removed using a difference in etch selective ratio between the oxide film and the polysilicon film. A hard mask for forming a micro pattern having a structure in which the first polysilicon film and the buffer oxide film are laminated is formed. The to-be-etched layer is etched using the hard mask as an etch barrier.

Described are systems, media, and methods for applying deep convolutional neural networks to medical images to generate a real-time or near real-time diagnosis.

Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.