767 results about "Evaporation (deposition)" patented technology

A method and system is described for reducing particle contamination in a vapor distribution system. The vapor distribution system comprises a housing and a vapor distribution head comprising a plurality of openings configured to introduce a film precursor vapor to a deposition system. The housing and vapor distribution head define a plenum coupled to a film precursor evaporation system, and configured to receive the film precursor vapor from the evaporation system and distribute the film precursor vapor within the deposition system through the plurality of openings. In order to reduce particle contamination, the vapor distribution system is designed to reduce the difference, or ratio, between the pressure in the plenum and the pressure in the deposition system. For example, the plenum pressure can be less than twice the pressure in the process space, or can be less than 50 mTorr, 30 mTorr or even 20 mTorr than the pressure in the process space.

The invention discloses a temperature control system-based evaporation temperature control method for an OLED (Organic Light Emitting Diode) organic layer. The evaporation temperature control method comprises a preheating process and an evaporation process, wherein the preheating process is divided into three temperature-rise processes with temperature gradients; the evaporation process comprises a step of controlling the temperature of an evaporation source by controlling the power of an evaporation power supply on the basis of an actually-measured deposition rate curve. According to the temperature control system-based evaporation temperature control method for the OLED organic layer, the stabilization time of the temperature of the evaporation source and the deposition rate is shortened, the use ratios of the organic materials of the evaporation source are improved, meanwhile, the degradation, the degeneration and the like of the organic materials caused when the temperature rise is too fast or the risen temperature is too high are avoided, and the production cost is lowered; by utilizing a characteristic that the evaporation rate is changed by 20-30% when the evaporation temperature is changed by 1%, the accuracy of the temperature control is improved, the stability of evaporation temperature is maintained, and the uniformity of evaporated films is improved.

A Kesterite film is vacuum deposited and annealed on a substrate. Deposition is conducted at low temperature to provide good composition control and efficient use of metals. Annealing is conducted at a high temperature for a short period of time. Thermal evaporation, E-beam evaporation or sputtering in a high vacuum environment may be employed as part of a deposition process.

The invention discloses a flexible electrochromic thermal insulating intelligent window film and a preparation technology thereof. The window film is prepared by adopting a vacuum physical vapor deposition process such as reel-to-reel magnetron sputtering or evaporation; the surface of a flexible substrate such as PET (Polyethylene Terephthalate) is sequentially coated with a transparent conductive film layer, an electrochromic functional film layer, a solid film electrolyte layer, an ion storage film layer and a transparent conductive film layer to obtain a flexible electrochromic functionalwindow film; a silver-containing multilayer thermal insulating window film is prepared on the surface of the flexible substrate such as the PET by adopting a reel-to-reel magnetron sputtering continuous coating technology; further, the electrochromic window film is compounded with the thermal insulating window film by using a laminating process, and finally, the multi-functional intelligent windowfilm with the characteristics of electrochromic property, thermal insulation, energy saving as well as explosion resistance and splash resistance is otained. Compared with a traditional low radiationthermal insulating window film, the flexible electrochromic thermal insulating intelligent window disclosed by the invention has the advantage that energy consumption of windows can be further reduced by 50 percent or above; compared with existing electrochromic glass products, the flexible electrochromic thermal insulating intelligent window disclosed by the invention has the advantages of lowercost, greater convenience in installation and higher safety; compared with an existing research and development technology of the flexible electrochromic film, the preparation technology has the advantages of more excellent stability, more excellent energy-saving and thermal insulation characteristics, higher suitability for batch production of large-size window films and the like.

The method for manufacturing a hydrogen permeation barrier comprises the steps ofa) depositing on a substrate (SUB) a layer system (LS) comprising at least one layer (L1,L2,L3);characterized in that step a) comprises the step ofb) depositing at least one hydrogen barrier layer (HPBL) comprising an at least ternary oxide.The apparatus comprises a sealable volume and a wall forming at least a portion of a boundary limiting said volume, wherein said wall comprises a hydrogen permeation barrier comprising a layer system (LS) comprising at least one layer, wherein said layer system comprises at least one hydrogen barrier layer (HPBL) comprising an at least ternary oxide.Preferably, said at least ternary oxide is substantially composed of Al, Cr and O, and said depositing said at least one hydrogen barrier layer (HPBL) is carried out using a physical vapor deposition method, in particular a cathodic arc evaporation method.Preferably, step a) comprises depositing on said substrate at least one of: an adhesion layer (AdhL), a hydrogen storage layer (HStL), a protective layer (ProtL), in particular a thermal barrier layer (ThBL), a diffusion barrier layer (DBL), an oxidation barrier layer (OxBL), a chemical barrier layer (ChBL), a wear resistance layer (WRL).Excellent hydrogen permeation barrier properties can be achieved, and the layer system can be tailored as required by an envisaged application.

The invention provides a black phosphorene-containing graphene flexible resistive random access memory and a preparation method thereof. The preparation method of the resistive random access memory comprises the steps of cleaning a Al2O3 substrate; depositing a Ni / Au composite thin film by an electron beam evaporation technology to obtain a bottom electrode layer; transferring a black phosphorene-containing graphene composite thin film material on the bottom electrode layer by a transfer method to obtain a resistive changing functional layer; forming a top electrode pattern by a photoresist patterning process, depositing a Ag, Cu or Ni thin film by the electron beam evaporation technology to form a top electrode layer, and removing and stripping photoresist to form a memory unit; and forming a coating layer pattern by the photoresist patterning process, depositing the Al2O3 thin film again by an atomic layer deposition technology to form a coating layer, and removing and striping the photoresist to form the black phosphorene-containing graphene flexible resistive random access memory. The resistive random access memory prepared according to the method is simple in structure, fast in erasure speed and small in operation voltage, non-destructive readout is achieved, and the resistive random access memory can be used for fabricating a large-area flexible device.

The invention relates to a method for preparing ternary-component AlxGaI-xN nanocone, realizing control in the full-ingredient range (x is larger than 0 and smaller than 1). The method for preparing the ternary-component AlxGaI-xN nanocone comprises the following steps of: making anhydrous GaCl3 as a gallium source and anhydrous AlCl3 as an aluminum source with a nitrogen source by adopting a chemical vapor deposition method under the condition that the evaporation temperatures of GaCl3 and AlCl3 are respectively 70-90 DEG C and 130-150 DEG C to generate single-phase AlxGaI-xN nanocone, wherein x is larger than 0 and smaller than 1, the preferred nitrogen source is NH3, and the deposition temperature is 650-800 DEG C. In the invention, the vapor partial pressure of reaction precursors GaCl3 and AlCl3 is finely controlled in a tube furnace of a three-segment temperature area to obtain a one-dimensional nano material with a single-crystal structure and uniformly distributed components, and the atom ratio of Al / Ga can be controlled in the full-ingredient range (x is larger than 0 and smaller than 1) by changing growth conditions.

The invention relates to a vacuum coating preparation method of an aviation organic glass (polymethylmethacrylate). A set of electronic beam evaporation and ion assisted vacuum coating device is used for continuously preparing a structure of three layers of (auxiliary-main-auxiliary) deposition film series, wherein two auxiliary film layers are respectively located on the bottom layer and the upper layer of a main film layer. The two auxiliary film layers are obtained by heating polytetrafluoroethylene resin liquid, evaporating and vaporizing, spraying into a vacuum chamber, ionizing under ion bombardment, and respectively depositing on the surface of the substrate and above the main film layer. The main film layer is deposited on a bottom layer film by film material (one of zirconium dioxide or hafnium oxide) under electronic beam evaporation and ion assisted bombardment so as to form an optical antireflection film. According to the invention, the structure of three layers of films, which is continuously prepared in vacuum, has the characteristics of high adhesion, high light transmissivity, low haze, friction resistance, weak acid and weak base corrosion resistance and the like. The preparation method provided by the invention is further suitable for vacuum coating of polycarbonate (PC) resin, and can be widely applied in industries of aviation, automobiles, car light outer covers and the like.