Preparation method of perovskite battery with n-type doped electron transport layer and TiO2 layer
An electron transport layer, perovskite cell technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve problems such as poor stability of perovskite, and achieve the effect of reducing internal defects, slowing down the degradation process, and improving stability
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Embodiment 1
[0027] An n-type doped electron transport layer and TiO 2 The preparation method of the perovskite cell of layer comprises the following steps:
[0028] (1) FTO transparent conductive glass substrate cleaning and TiO 2 Film preparation: The FTO transparent conductive glass substrate was ultrasonically cleaned three times with deionized water, acetone, and ethanol, and then dried at 100°C until the solvent and moisture were completely removed. The treated FTO transparent conductive glass substrate was treated with a UV lamp and ozone for 25 min, and then deposited the electron transport layer TiO on the treated FTO transparent conductive glass substrate. 2 , placed in a 100°C oven for later use;
[0029] (2) Bis-PCBM and DMC composite film preparation: Dissolve 5mg Bis-PCBM in 2mL chlorobenzene, stir for 4h to get Bis-PCBM solution, then dissolve the dopant DMC in ethanol to prepare a precursor solution with a concentration of 0.2mg / mL, the precursor solution is doped in the...
Embodiment 2
[0036] An n-type doped electron transport layer and TiO 2 The preparation method of the perovskite cell of layer comprises the following steps:
[0037] (1) FTO transparent conductive glass substrate cleaning and TiO 2 Film preparation: The FTO transparent conductive glass substrate was ultrasonically cleaned three times with deionized water, acetone, and ethanol, and then dried at 100°C until the solvent and moisture were completely removed. The treated FTO transparent conductive glass substrate was treated with a UV lamp and ozone for 25 min, and then deposited the electron transport layer TiO on the treated FTO transparent conductive glass substrate. 2 , placed in a 100°C oven for later use;
[0038] (2) Bis-PCBM and DMC composite film preparation: Dissolve 5mg Bis-PCBM in 2mL chlorobenzene, stir for 4h to get Bis-PCBM solution, then dissolve the dopant DMC in ethanol to prepare a precursor solution with a concentration of 0.2mg / mL, the precursor solution is doped in the...
Embodiment 3
[0045] An n-type doped electron transport layer and TiO 2 The preparation method of the perovskite cell of layer comprises the following steps:
[0046] (1) FTO transparent conductive glass substrate cleaning and TiO 2 Film preparation: The FTO transparent conductive glass substrate was ultrasonically cleaned three times with deionized water, acetone, and ethanol, and then dried at 100°C until the solvent and moisture were completely removed. The treated FTO transparent conductive glass substrate was treated with a UV lamp and ozone for 25 min, and then deposited the electron transport layer TiO on the treated FTO transparent conductive glass substrate. 2 , placed in a 100°C oven for later use;
[0047] (2) Bis-PCBM and DMC composite film preparation: Dissolve 5mg Bis-PCBM in 2mL chlorobenzene, stir for 4h to get Bis-PCBM solution, then dissolve the dopant DMC in ethanol to prepare a precursor solution with a concentration of 0.2mg / mL, the precursor solution is doped in the...
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