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186 results about "Boranes" patented technology

Boranes is the name given to the class of synthetic hydrides of boron with generic formula BₓHy. In the past, borane molecules were often labeled "electron-deficient" because of their multicenter bonding (in which a pair of bonding electrons links more than two atoms, as in 3-center-2-electron bonds); this was done in order to distinguish such molecules from hydrocarbons and other classically bonded compounds. However, this usage is incorrect, as most boranes and related clusters such as carboranes are actually electron-precise, not electron-deficient. For example, the extremely stable icosahedral B₁₂H₁₂²⁻ dianion, whose 26 cluster valence electrons exactly fill the 13 bonding molecular orbitals, is in no actual sense deficient in electrons; indeed it is thermodynamically far more stable than benzene.

Method for preparing high-performance doped diamond-like film

The invention discloses a method for preparing a high-performance doped diamond-like film. The method is characterized by comprising the following steps: firstly, utilizing ultrasonic cleaning technology to remove a polluted layer on the surface of a substrate; utilizing ion beam assisted deposition technology to prepare a gradient transition layer; and finally utilizing ion beam deposition and magnetron sputtering to synthesize a multi-element doped DLC film, wherein except any one of carbonaceous gases, such as methane, acetylene, benzene, ethanol, acetone and the like, any gas containing non-carbon elements, such as silicon hydride, boron hydride, phosphorane, carbon tetrafluoride and the like, is simultaneously introduced, and a metal sputtering source is opened for the doping of metal elements. The method has the advantages of synthesizing the multi-element doped DLC film which is simultaneously doped with the metal elements and the nonmetal elements, fully developing the complementary advantages of the doped metal elements and the doped nonmetal elements and remarkably improving the combination properties of the DLC film.
Owner:CHINA UNIV OF GEOSCIENCES (BEIJING)

Control of particles on semiconductor wafers when implanting boron hydrides

A method for reducing particle contamination during implantation of ions comprises providing an implantation system (200) for implanting ions into a workpiece (228) via an ion beam (210), wherein one or more components are under selective vacuum and have one or more contaminants in a first state disposed thereon. A gas is introduced to the implantation system (at 200), wherein the gas generally reacts with at least a portion of the one or more contaminants, therein transforming the at least a portion of the one or more contaminants into a second state. The at least a portion of the one or more contaminants in the second state remain disposed on the one or more components, and wherein the at least a portion of the second state of the one or more contaminants generally does not produce particle contamination on the one or more workpieces.
Owner:AXCELIS TECHNOLOGIES

Catalyst and Process for the Production of Hydrogen from Ammonia Boranes

InactiveUS20160087295A1Eliminate needEnhanced dehydrogenation kineticsHydrogen productionHydrogen/synthetic gas productionDouble bondSolvent
The present invention relates to a process for the production of hydrogen comprising contacting at least one complex of formula (I), (I) wherein: Xis an anion; M is a metal selected from Ru, Os, Fe, Co and Ni; D is optionally present and is one or more monodentate or multidentate donor ligands; Y1 is selected from CR13, B and N; Z1 and Z2 are each independently selected from ═N, ═P, NR14, PR15, O, S and Se; or Z2 is a direct bond between carbocyclic ring B and substituent R4; each of A and B is independently a saturated, unsaturated or partially unsaturated carbocyclic hydrocarbon ring; R3 and R4 are each independently selected from H, C1-6-alkyl, aryl and C1-6-haloalkyl, and a linker group optionally attached to a solid support; or R3 and R4 together form the following moiety: (AB) Y2 is a direct single bond or double bond, or is CR18; R1, R2, R5-13 and R16-18 are each independently selected from H, C1-6-alkyl, C2-6-alkenyl, C2-6-alkynyl, aryl, C1-6-haloalkyl, NR19R20 and a linker group optionally attached to a solid support; or two or more of said R1-13 and R16-18 groups are linked, together with the carbons to which they are attached, to form a saturated or unsaturated hydrocarbon group; R14, R15, R19 and R20 are each independently selected from H, C1-6-alkyl, C2-6-alkenyl, C2-6-alkynyl, aryl, C1-6-haloalkyl, and a linker group optionally attached to a solid support; with at least one substrate of formula (II), R21R22NH—BHR23R24, wherein R21 to R24 are each independently selected from H, C1-6-alkyl, fluoro-substituted C1-6-alkyl, C6-14-aryl and C6-14-aralkyl, or any two of R21, R22, R23 and R24 are linked to form a C3-10-alkylene group or C3-10-alkenylene group, which together with the nitrogen and/or boron atoms to which they are attached, forms a cyclic group; or a substrate comprising two, three or four substrates of formula (II) linked via one or more bridging groups so as to form a dimeric, trimeric or tetrameric species, and wherein the bridging group is selected from straight or branched C1-6-alkylene optionally substituted by one or more fluoro groups, boron, C6-14-aryl and C6-14-aralkyl; or a substrate comprising two, three or four substrates of formula (II) which are joined so as to form a fused cyclic dimeric, trimeric or tetrameric species. Further aspects of the invention relate to a hydrogen generation system comprising a complex of formula (I), a substrate of formula (II) and a solvent, and to the use of complexes of formula (I) in fuel cells. Another aspect of the invention relates to novel complexes of formula (I).
Owner:UNIV COLLEGE DUBLIN NAT UNIV OF IRELAND DUBLIN

Electrolyte for lithium ion battery using silica-based material as negative electrode material and lithium ion battery

The invention discloses an electrolyte for a lithium ion battery using a silica-based material as a negative electrode material and the lithium ion battery. The electrolyte comprises a lithium salt, a non-aqueous organic solvent and a film formation additive, wherein the non-aqueous organic solvent comprises ethylene carbonate; the film formation additive comprises TPFPB Tris(pentafluorophenyl) borane. The TPFPB in the electrolyte is used as the film formation additive of an SEI film, can facilitate the formation of the stable and integral SEI film on the surface of the negative electrode material, and can weaken an efflorescence phenomenon caused by a silicon volume effect when the silica-based material is used as the negative electrode material; the TPFPB can release freely moving lithium ions through the SEI film, so that part of lithium ions consumed during the formation process of the SEI film can be offset, lithium ion consumption can be lowered, and the charging and discharging efficiency and the cycle performance can be improved. The structural characteristic of the TPFPB determines that the TPFPB is relatively stable and not easy to decompose, so that the service life of the electrolyte is prolonged.
Owner:CHERY AUTOMOBILE CO LTD

Preparation method of hydrogen storage material of borane ammonia compound

The invention relates to the field of hydrogen storage materials, in particular to a preparation method of a hydrogen storage material of a borane ammonia compound, which aims at resolving the problem in the prior art that the existing hydrogen storage material is complex in preparation process, utilizes toxic raw material B2H6, and is low in compounding rate, low in sample purity, not suitable for large-scale preparation and the like. The borane ammonia compound comprises boron, nitrogen and hydrogen, the molecular formula of the borane ammonia compound is [(NH3)2BH2](BH4), and the abbreviation is DADB. The special operation steps include utilizing the mixture of metal borohydride M(BH4)x and ammonium salt (NH4)yL as an initial raw material, adopting the mechanical ball milling method toprepare a mixture of DADB and MyLx; and (2) utilizing the mixture of the DADB and the MyLx as the initial raw material and adopting a liquid ammonia solvent to conduct dissolving, filtering and ammonia removing steps to remove by-product MyLx and obtain a pure DADB powder sample. The preparation method is simple and easy to implement, capable of preparing a high-purity DADB compound in high yieldand suitable for scale preparation, and the raw materials are low in cost and non-toxic.
Owner:INST OF METAL RESEARCH - CHINESE ACAD OF SCI

High-energy welding-cutting gas

The invention relates to high-energy welding-cutting gas, which relates to welding-cutting gas, and aims to solve the problems of environment pollution, high energy consumption and high cost existing when acetylene gas is used as welding-cutting gas. The high-energy welding-cutting gas is formed by mixing nano flame accelerator with natural gas, wherein the nano flame accelerator is formed by mixing jet fuel, ethanol, n-butyl alcohol, ethyl acetate, ethylene glycol monobutyl ether, tert-butyl hydroperoxide, 2-pentanone, nanometer aluminium oxide, nanocrystalline iron oxide and borane-pyridinecomplex. The high-energy welding-cutting gas has the advantages that: the nano flame accelerator is adopted, so that the flame of the natural gas is concentrated, the flame temperature rises, the useefficacy of acetylene gas is achieved, the cutting quality of workpieces is improved, safety is realized without tempering, the gas consumption and the oxygen consumption are greatly reduced, a bottle of high-energy welding-cutting gas with the volume being 3 cubic meters can replace a bottle of acetylene gas with the weight being 3 kg for use, the cost of the welding-cutting gas is one fifth of the cost of the acetylene gas, and the main component of the high-energy welding-cutting gas is the natural gas, so that the environment pollution is reduced compared with the acetylene gas. The invention is mainly used for preparing the welding-cutting gas.
Owner:李铁锁 +1

Groove type super junction epitaxial filling method

The invention discloses a groove type super junction epitaxial filling method. The groove type super junction epitaxial filling method comprises the following steps: a first step, providing a semiconductor substrate formed with an N type epitaxial layer; a second step, forming a plurality of grooves in the N type epitaxial layer; and a third step, filling a P type epitaxial layer with a hierarchical structure in the grooves by epitaxial growth, wherein the hierarchical structure is realized by adjusting the filling speed of a borane gas. By adopting the groove type super junction epitaxial filling method disclosed by the invention, the switching speed of a device formed by a super junction can be reduced, and external electromagnetic interference is reduced.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP

Chiral pyridine biimidazole ligand transition metal complex catalyst and preparation method thereof

The invention relates to a chiral pyridine biimidazole ligand transition metal complex catalyst and a preparation method thereof. The general structure of the compound is shown in the description, wherein M represents transition metal, R<1>, R<2>, R<3>, R<4>, R<5>, R<6>, R<7>, R<8> and R<9> represent hydrogen atoms or alkane groups of C1-C30 or aryl groups of C6-C30, X represents a halogen atom or halogenated metal salt ion, the asterisk place is racemization or chirality, and when the asterisk place is chirality, the asterisk place represents an R configuration or S configuration. An applied chiral pyridine biimidazole ligand can change the electronic property and steric hindrance of the ligand through functional group modification, and as a catalyst precursor, asymmetric hydroboration of alkenyl borane has medium catalytic activity and stereoselectivity. According to the chiral pyridine biimidazole ligand transition metal complex catalyst and the preparation method thereof, the preparation method is simple, the raw materials are cheap and easy to obtain, environmental friendliness is achieved, the reaction condition is mild, the yield is high, and synthetic operation is easy and convenient.
Owner:SHANGHAI UNIV
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