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Method for preparing high-performance doped diamond-like film

A diamond, DLC film technology, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve problems that have not been reported, and achieve the effect of improving comprehensive performance

Inactive Publication Date: 2010-06-23
CHINA UNIV OF GEOSCIENCES (BEIJING)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Doping metal elements and non-metal elements into the DLC film at the same time to realize the complementarity of different doping elements is an effective way to obtain high-performance DLC films, but research in this area has not yet been reported.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] First, use ultrasonic cleaning technology to remove the grease contamination layer on the surface of GCr15 bearings; then use the anode layer ion source to assist DC magnetron sputtering to deposit a gradient transition layer of Cr / CrN / CrCN / CrC, and the target material of magnetron sputtering is Cr, which is passed into the anode layer The gas of the ion source includes argon, nitrogen, and acetylene. The gradient transition of the transition layer is realized by gradually changing the flow of argon, nitrogen, and acetylene. The ion energy is -100~-800eV; finally, ion beam deposition + magnetron sputtering technology is used A DLC film doped with Cr, Si, and F is synthesized on the Cr / CrN / CrCN / CrC gradient transition layer. The ion source adopts the anode layer ion source, and the gas passed into the anode layer ion source includes argon, acetylene, silane and four. Carbon fluoride, the magnetron sputtering source adopts the DC magnetron sputtering method, and the target...

Embodiment 2

[0027] First, use ultrasonic cleaning technology to remove the grease contamination layer on the surface of the engine plunger; then use the anode layer ion source to assist DC magnetron sputtering to deposit a gradient transition layer of Cr / CrN / CrCN / CrC, the target material of the magnetron sputtering is Cr, and the The gas of the ion source of the anode layer includes argon, nitrogen, and benzene, and the gradient transition of the transition layer is realized by gradually changing the flow rate of argon, nitrogen, and benzene, and the ion energy is -100~-800eV; finally, ion beam deposition + magnetron sputtering is used Synthesize a DLC film doped with Cr, F, and N simultaneously on the Cr / CrN / CrCN / CrC gradient transition layer by means of radiation technology. Carbon fluoride, nitrogen, and magnetron sputtering adopt DC magnetron sputtering, and the target material is Cr; by changing the flow rate of argon, acetylene, carbon tetrafluoride, nitrogen, and the sputtering powe...

Embodiment 3

[0029] First, use ultrasonic cleaning technology to remove the grease contamination layer on the surface of high-speed steel tools; then use the anode layer ion source to assist cathodic arc deposition to prepare a Ti / TiN / TiCN / TiC gradient transition layer. Gases include argon, nitrogen, and methane. The gradient transition of the transition layer is achieved by gradually changing the flow of argon, nitrogen, and methane. The ion energy is -100~-800eV; Simultaneous doping of Ti, Si, F, SiO synthesized on TiN / TiCN / TiC gradient transition layer 2 DLC film, the ion source adopts the anode layer ion source, and the gas that passes into the anode layer ion source includes hydrogen, methane, silane, carbon tetrafluoride, and water vapor. The magnetron sputtering adopts the DC magnetron sputtering method, and the target material is Ti; by changing the flow of hydrogen, methane, silane, carbon tetrafluoride, water vapor, and the sputtering power of the titanium sputtering target to co...

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PUM

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Abstract

The invention discloses a method for preparing a high-performance doped diamond-like film. The method is characterized by comprising the following steps: firstly, utilizing ultrasonic cleaning technology to remove a polluted layer on the surface of a substrate; utilizing ion beam assisted deposition technology to prepare a gradient transition layer; and finally utilizing ion beam deposition and magnetron sputtering to synthesize a multi-element doped DLC film, wherein except any one of carbonaceous gases, such as methane, acetylene, benzene, ethanol, acetone and the like, any gas containing non-carbon elements, such as silicon hydride, boron hydride, phosphorane, carbon tetrafluoride and the like, is simultaneously introduced, and a metal sputtering source is opened for the doping of metal elements. The method has the advantages of synthesizing the multi-element doped DLC film which is simultaneously doped with the metal elements and the nonmetal elements, fully developing the complementary advantages of the doped metal elements and the doped nonmetal elements and remarkably improving the combination properties of the DLC film.

Description

Technical field: [0001] The patent of the invention relates to a preparation technology of a high-performance diamond-like carbon (DLC) film doped with various elements, which belongs to the composite preparation technology of DLC film materials. Background technique: [0002] Diamond-like carbon films have high hardness, high elastic modulus, excellent friction and wear properties, chemical stability and biocompatibility, and have very broad application prospects. However, large internal stress, poor film / substrate bonding force, poor thermal stability, and high brittleness limit the application of DLC films in harsh service conditions. [0003] The use of an optimized gradient transition layer can relieve the internal stress of the DLC film and improve the film / substrate bonding force of the DLC film; the formation of a multi-phase structure based on the amorphous carbon film by doping metal elements will improve the overall performance of the DLC film, but Doping metal w...

Claims

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Application Information

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IPC IPC(8): C23C16/27C23C16/455
Inventor 付志强王成彪岳文彭志坚于翔
Owner CHINA UNIV OF GEOSCIENCES (BEIJING)
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